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CY-MSP325S-2DC-1RF
TN
Three Target Stainless Steel Magnetron Sputtering Coater is equipped with a stainless steel chamber and three magnetron sputtering targets, allowing for efficient and precise deposition of materials. The coater also includes a film thickness gauge, ensuring accurate control of film thickness during the coating process.
With its advanced magnetron sputtering technology, this coater is capable of producing high-quality thin films with excellent adhesion and uniformity. The stainless steel chamber provides a clean and stable environment for film deposition, minimizing contamination and ensuring consistent results.
Whether you need to prepare ITO (Indium Tin Oxide) thin films or other functional films, this three-target magnetron sputtering coater is a reliable and versatile solution. Its user-friendly interface and intuitive controls make it easy to operate, even for users with limited experience.
The coater is designed with professional-grade components and built to withstand continuous use in a laboratory or production environment. Its robust construction and reliable performance ensure long-term durability and minimal maintenance requirements.
Invest in the Three Target Stainless Steel Magnetron Sputtering Coater with Film Thickness Gauge for ITO Indium T and experience efficient and precise film deposition for a wide range of applications. With its professional-grade features and user-friendly design, this coater is the perfect choice for researchers, engineers, and manufacturers seeking high-quality thin film coatings.
Sample stage | Size | Dia.140mm |
Heating temperature | Max 500℃ | |
Temperature accuracy | ±1℃ | |
Rotational speed | 1-20rpm adjustable | |
Magnetron Sputtering head | Quantity | 2”×3 (1”,2” optional) |
Cooling mode | Water cooling | |
Water chiller | Circulating water chiller with flow rate of 10L/min | |
Vacuum chamber | Chamber size | Dia.300mm×300mm |
Chamber material | Stainless steel | |
Watch window | Dia.100mm | |
Opening mode | Top cover open | |
Mass flowmeter | 2 channels; measuring range 100SCCM; 100SCCM (can be customized according to customer needs) | |
Vacuum system | Model | TN-GZK103-A |
Molecular pump | TN-600 | |
Backing pump | Rotary vane pump | |
Ultimate vacuum | 1.0E-5Pa | |
Pumping interface | CF160 | |
Exhaust interface | KF40 | |
Vacuum measurement | Compound vacuum gauge | |
Power supply | AC;220V 50/60Hz | |
Pumping rate | Molecular pump: 600L/S rotary vane pump: 1.1L/S Comprehensive gas pumping performance: vacuum up to 1.0E-3Pa in 20 minutes | |
Power configuration | Quantity | DC power supply x2 RF power supply x1 |
Max output power | DC 500 W, RF 500W | |
Other parameters | Supply voltage | AC220V,50Hz |
Total power | 4KW | |
Overall size | 600mm×650mm×1200mm | |
Total Weight | About 350kg |
Three Target Stainless Steel Magnetron Sputtering Coater is equipped with a stainless steel chamber and three magnetron sputtering targets, allowing for efficient and precise deposition of materials. The coater also includes a film thickness gauge, ensuring accurate control of film thickness during the coating process.
With its advanced magnetron sputtering technology, this coater is capable of producing high-quality thin films with excellent adhesion and uniformity. The stainless steel chamber provides a clean and stable environment for film deposition, minimizing contamination and ensuring consistent results.
Whether you need to prepare ITO (Indium Tin Oxide) thin films or other functional films, this three-target magnetron sputtering coater is a reliable and versatile solution. Its user-friendly interface and intuitive controls make it easy to operate, even for users with limited experience.
The coater is designed with professional-grade components and built to withstand continuous use in a laboratory or production environment. Its robust construction and reliable performance ensure long-term durability and minimal maintenance requirements.
Invest in the Three Target Stainless Steel Magnetron Sputtering Coater with Film Thickness Gauge for ITO Indium T and experience efficient and precise film deposition for a wide range of applications. With its professional-grade features and user-friendly design, this coater is the perfect choice for researchers, engineers, and manufacturers seeking high-quality thin film coatings.
Sample stage | Size | Dia.140mm |
Heating temperature | Max 500℃ | |
Temperature accuracy | ±1℃ | |
Rotational speed | 1-20rpm adjustable | |
Magnetron Sputtering head | Quantity | 2”×3 (1”,2” optional) |
Cooling mode | Water cooling | |
Water chiller | Circulating water chiller with flow rate of 10L/min | |
Vacuum chamber | Chamber size | Dia.300mm×300mm |
Chamber material | Stainless steel | |
Watch window | Dia.100mm | |
Opening mode | Top cover open | |
Mass flowmeter | 2 channels; measuring range 100SCCM; 100SCCM (can be customized according to customer needs) | |
Vacuum system | Model | TN-GZK103-A |
Molecular pump | TN-600 | |
Backing pump | Rotary vane pump | |
Ultimate vacuum | 1.0E-5Pa | |
Pumping interface | CF160 | |
Exhaust interface | KF40 | |
Vacuum measurement | Compound vacuum gauge | |
Power supply | AC;220V 50/60Hz | |
Pumping rate | Molecular pump: 600L/S rotary vane pump: 1.1L/S Comprehensive gas pumping performance: vacuum up to 1.0E-3Pa in 20 minutes | |
Power configuration | Quantity | DC power supply x2 RF power supply x1 |
Max output power | DC 500 W, RF 500W | |
Other parameters | Supply voltage | AC220V,50Hz |
Total power | 4KW | |
Overall size | 600mm×650mm×1200mm | |
Total Weight | About 350kg |