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Three Target Stainless Steel Magnetron Sputtering Coater with Film Thickness Gauge for ITO Indium Tin Oxide Film

Three Targets Magnetron Sputtering Coater can be used for preparing single-layer or multi-layer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, oxide films, hard films, PTFE films
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  • CY-MSP325S-2DC-1RF

  • TN

Three Target Stainless Steel Magnetron Sputtering Coater is equipped with a stainless steel chamber and three magnetron sputtering targets, allowing for efficient and precise deposition of materials. The coater also includes a film thickness gauge, ensuring accurate control of film thickness during the coating process.


With its advanced magnetron sputtering technology, this coater is capable of producing high-quality thin films with excellent adhesion and uniformity. The stainless steel chamber provides a clean and stable environment for film deposition, minimizing contamination and ensuring consistent results.


Whether you need to prepare ITO (Indium Tin Oxide) thin films or other functional films, this three-target magnetron sputtering coater is a reliable and versatile solution. Its user-friendly interface and intuitive controls make it easy to operate, even for users with limited experience.


The coater is designed with professional-grade components and built to withstand continuous use in a laboratory or production environment. Its robust construction and reliable performance ensure long-term durability and minimal maintenance requirements.


Invest in the Three Target Stainless Steel Magnetron Sputtering Coater with Film Thickness Gauge for ITO Indium T and experience efficient and precise film deposition for a wide range of applications. With its professional-grade features and user-friendly design, this coater is the perfect choice for researchers, engineers, and manufacturers seeking high-quality thin film coatings.


Sample stage

Size

Dia.140mm

Heating temperature

Max 500℃

Temperature accuracy

±1℃

Rotational speed

1-20rpm adjustable

Magnetron Sputtering head

Quantity

2”×3 (1”,2” optional)

Cooling mode

Water cooling

Water chiller

Circulating water chiller with flow rate of 10L/min

Vacuum chamber

Chamber size

Dia.300mm×300mm

Chamber material

Stainless steel

Watch window

Dia.100mm

Opening mode

Top cover open

Mass flowmeter

2 channels; measuring range 100SCCM; 100SCCM (can be customized according to customer needs)

Vacuum system

Model

TN-GZK103-A

Molecular pump

TN-600

Backing pump

Rotary vane pump

Ultimate vacuum

1.0E-5Pa

Pumping interface

CF160

Exhaust interface

KF40

Vacuum measurement

Compound vacuum gauge

Power supply

AC;220V   50/60Hz

Pumping rate

Molecular pump: 600L/S rotary vane pump: 1.1L/S  

Comprehensive gas pumping performance: vacuum up to 1.0E-3Pa in 20 minutes

Power configuration

Quantity

DC power supply x2

RF power supply x1

Max output power

DC 500 W, RF 500W

Other parameters

Supply voltage

AC220V,50Hz

Total power

4KW

Overall size

600mm×650mm×1200mm

Total Weight

About 350kg


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Zhengzhou Tainuo Thin Film Materials Co., Ltd.
Which is a manufacturer specializing in the production of laboratory scientific instruments. Our products are widely used in colleges, research institutions and laboratories.

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