| Quantity: | |
|---|---|
TN
Desktop single target magnetron coater is equipped with a reciprocating sample table, allowing for precise and uniform coating.
This high-quality desktop single target magnetron sputtering coater is perfect for researchers and professionals in the field of thin film deposition. With its advanced technology and reliable performance, it ensures accurate and efficient preparation of various thin films.
The coater is specifically designed for the deposition of single-layer or multi-layer ferroelectric thin films, conductive films, alloy films, and other thin films. Its magnetron sputtering technique guarantees excellent film quality and uniformity.
Equipped with a reciprocating sample table, this coater offers precise control over the coating process. The sample table moves back and forth, ensuring an even distribution of the sputtered material on the substrate. This feature is essential for achieving consistent and reproducible results.
The desktop single target magnetron sputtering coater is user-friendly, with a simple interface and intuitive controls. It allows for easy adjustment of deposition parameters such as sputtering power, deposition time, and gas flow rate. This makes it suitable for both experienced researchers and newcomers in the field.
The compact design of this coater makes it ideal for laboratories with limited space. It can easily fit on a standard laboratory bench, without compromising its performance. Its robust construction ensures durability and long-term reliability.
In conclusion, the desktop single target magnetron sputtering coater with a reciprocating sample table is a professional-grade tool for preparing high-quality thin films. Its advanced features, user-friendly interface, and compact design make it a valuable addition to any research or production facility.
Technical parameters of single target magnetron sputtering coater:
Reciprocating sample table | size | 50*100mm | |
Reciprocating speed | 0~50mm/s | ||
Magnetron target gun | Target plane | Circular flat target | |
Sputtering vacuum | 10Pa～0.2Pa | ||
Target diameter | 2 inches | ||
Target thickness | Recommended 2 ～ 5mm | ||
Target temperature | ≦65℃ | ||
Vacuum chamber | Cavity size | About Φ180mm × H 215mm | |
Cavity material | High purity quartz | ||
Observation window | Omnidirectional transparency | ||
Opening method | Removable top cover | ||
power supply | DC power supply | 150W max | |
Quantity | 1 | ||
Molecular pump system | Foreline pump | Rotary vane pump | VRD-4 |
Pumping speed | 1.1L/S | ||
Ultimate vacuum | 5*10-1Pa | ||
Molecular pump | Molecular pumping speed | 600L/S | |
Rated speed | 24000rpm | ||
Ultimate vacuum | 5*10-5Pa | ||
Vibration value | ≦0.1um | ||
Start Time | ≦4.5min | ||
Downtime | <7min | ||
cooling method | Water cooling + air cooling | ||
Water cooler | Cooling water temperature | ≦37℃ | |
Cooling water flow rate | 10L/min | ||
Supply voltage | AC220V 50Hz | ||
Desktop single target magnetron coater is equipped with a reciprocating sample table, allowing for precise and uniform coating.
This high-quality desktop single target magnetron sputtering coater is perfect for researchers and professionals in the field of thin film deposition. With its advanced technology and reliable performance, it ensures accurate and efficient preparation of various thin films.
The coater is specifically designed for the deposition of single-layer or multi-layer ferroelectric thin films, conductive films, alloy films, and other thin films. Its magnetron sputtering technique guarantees excellent film quality and uniformity.
Equipped with a reciprocating sample table, this coater offers precise control over the coating process. The sample table moves back and forth, ensuring an even distribution of the sputtered material on the substrate. This feature is essential for achieving consistent and reproducible results.
The desktop single target magnetron sputtering coater is user-friendly, with a simple interface and intuitive controls. It allows for easy adjustment of deposition parameters such as sputtering power, deposition time, and gas flow rate. This makes it suitable for both experienced researchers and newcomers in the field.
The compact design of this coater makes it ideal for laboratories with limited space. It can easily fit on a standard laboratory bench, without compromising its performance. Its robust construction ensures durability and long-term reliability.
In conclusion, the desktop single target magnetron sputtering coater with a reciprocating sample table is a professional-grade tool for preparing high-quality thin films. Its advanced features, user-friendly interface, and compact design make it a valuable addition to any research or production facility.
Technical parameters of single target magnetron sputtering coater:
Reciprocating sample table | size | 50*100mm | |
Reciprocating speed | 0~50mm/s | ||
Magnetron target gun | Target plane | Circular flat target | |
Sputtering vacuum | 10Pa～0.2Pa | ||
Target diameter | 2 inches | ||
Target thickness | Recommended 2 ～ 5mm | ||
Target temperature | ≦65℃ | ||
Vacuum chamber | Cavity size | About Φ180mm × H 215mm | |
Cavity material | High purity quartz | ||
Observation window | Omnidirectional transparency | ||
Opening method | Removable top cover | ||
power supply | DC power supply | 150W max | |
Quantity | 1 | ||
Molecular pump system | Foreline pump | Rotary vane pump | VRD-4 |
Pumping speed | 1.1L/S | ||
Ultimate vacuum | 5*10-1Pa | ||
Molecular pump | Molecular pumping speed | 600L/S | |
Rated speed | 24000rpm | ||
Ultimate vacuum | 5*10-5Pa | ||
Vibration value | ≦0.1um | ||
Start Time | ≦4.5min | ||
Downtime | <7min | ||
cooling method | Water cooling + air cooling | ||
Water cooler | Cooling water temperature | ≦37℃ | |
Cooling water flow rate | 10L/min | ||
Supply voltage | AC220V 50Hz | ||
