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TN-MSP180G-PST
TN
Introducing our Planetary Single Target Magnetron Sputtering Coater with Quartz Cavity for Conductive Films. This advanced coating system is designed for professionals in need of precise and efficient film preparation.
With its innovative planetary design, our sputtering coater allows for the creation of single-layer or multi-layer ferroelectric thin films, conductive films, and alloy films. This versatility makes it an invaluable tool for a wide range of applications in industries such as electronics, optics, and research.
Equipped with a quartz cavity, our coater ensures optimal film quality and uniformity. The quartz material provides excellent thermal stability and allows for high deposition rates, ensuring consistent and reliable results every time.
Designed with professionals in mind, our sputtering coater offers unparalleled ease of use and control. The user-friendly interface allows for precise adjustments of parameters such as deposition time, power, and gas flow, ensuring the perfect conditions for your specific film requirements.
In addition, our coater boasts a robust magnetron sputtering source, which enables efficient and uniform film deposition. This ensures high productivity and minimizes material waste, saving you time and resources.
Built with the highest quality materials and cutting-edge technology, our Planetary Single Target Magnetron Sputtering Coater with Quartz Cavity for Conductive Films is built to last. Its durable construction and reliable performance make it a valuable asset for any professional seeking exceptional film preparation capabilities.
Invest in our sputtering coater and unlock the potential for precise and efficient film preparation. Experience the difference that our advanced technology and user-friendly design can make in your work. Trust in our commitment to delivering professional-grade equipment that meets the highest standards of quality and performance.
Technical parameters of planetary single target magnetron sputtering coater:
TN-MSP180G-PST (Planetary sample table) single target magnetron sputtering coater | ||||
Sample stage | Size | φ50mm x4 | Rotation speed | The revolution speed is adjustable from 0-10rpm, and the revolution and rotation speed ratio is 1:5 |
Magnetron sputtering target | Quantity | 2” x1 | ||
Vacuum chamber | Chamber size | Φ180mm x 100mm | Observation window | Omnidirectional visibility |
Chamber material | High purity quartz | Opening method | Top cover removable | |
Lower flange | Contains planetary transmission mechanism, welded vacuum interface and intake valve | |||
Vacuum system | Mechanical pump | Two-stage rotary vane pump | Pumping interface | KF16 |
Molecular pump | Turbomolecular pump | Pumping interface | KF40 | |
Vacuum measurement | Resistance gauge + ionization gauge | Exhaust interface | KF40 | |
Ultimate vacuum | 1.0E-3Pa | Power supply | AC 220V 50/60Hz | |
Pumping rate | Backing pump:1.1L/s Molecular pump: 60L/S | |||
Power configuration | Quantity | DC power supply x1 | Maximum output power | DC power supply 300W |
Other | Supply voltage | AC220V, 50Hz | Overall size | 500mm x 320mm x620mm |
Total power | 2kW | |||
Introducing our Planetary Single Target Magnetron Sputtering Coater with Quartz Cavity for Conductive Films. This advanced coating system is designed for professionals in need of precise and efficient film preparation.
With its innovative planetary design, our sputtering coater allows for the creation of single-layer or multi-layer ferroelectric thin films, conductive films, and alloy films. This versatility makes it an invaluable tool for a wide range of applications in industries such as electronics, optics, and research.
Equipped with a quartz cavity, our coater ensures optimal film quality and uniformity. The quartz material provides excellent thermal stability and allows for high deposition rates, ensuring consistent and reliable results every time.
Designed with professionals in mind, our sputtering coater offers unparalleled ease of use and control. The user-friendly interface allows for precise adjustments of parameters such as deposition time, power, and gas flow, ensuring the perfect conditions for your specific film requirements.
In addition, our coater boasts a robust magnetron sputtering source, which enables efficient and uniform film deposition. This ensures high productivity and minimizes material waste, saving you time and resources.
Built with the highest quality materials and cutting-edge technology, our Planetary Single Target Magnetron Sputtering Coater with Quartz Cavity for Conductive Films is built to last. Its durable construction and reliable performance make it a valuable asset for any professional seeking exceptional film preparation capabilities.
Invest in our sputtering coater and unlock the potential for precise and efficient film preparation. Experience the difference that our advanced technology and user-friendly design can make in your work. Trust in our commitment to delivering professional-grade equipment that meets the highest standards of quality and performance.
Technical parameters of planetary single target magnetron sputtering coater:
TN-MSP180G-PST (Planetary sample table) single target magnetron sputtering coater | ||||
Sample stage | Size | φ50mm x4 | Rotation speed | The revolution speed is adjustable from 0-10rpm, and the revolution and rotation speed ratio is 1:5 |
Magnetron sputtering target | Quantity | 2” x1 | ||
Vacuum chamber | Chamber size | Φ180mm x 100mm | Observation window | Omnidirectional visibility |
Chamber material | High purity quartz | Opening method | Top cover removable | |
Lower flange | Contains planetary transmission mechanism, welded vacuum interface and intake valve | |||
Vacuum system | Mechanical pump | Two-stage rotary vane pump | Pumping interface | KF16 |
Molecular pump | Turbomolecular pump | Pumping interface | KF40 | |
Vacuum measurement | Resistance gauge + ionization gauge | Exhaust interface | KF40 | |
Ultimate vacuum | 1.0E-3Pa | Power supply | AC 220V 50/60Hz | |
Pumping rate | Backing pump:1.1L/s Molecular pump: 60L/S | |||
Power configuration | Quantity | DC power supply x1 | Maximum output power | DC power supply 300W |
Other | Supply voltage | AC220V, 50Hz | Overall size | 500mm x 320mm x620mm |
Total power | 2kW | |||
