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TN-MSP300S-2DC1RF
TN
Introducing the DC Three Target Magnetron Sputtering Coater with High Vacuum Stainless Steel Chamber, the ultimate solution for precision film preparation. Designed for professionals in the field, this cutting-edge coater offers unparalleled performance and reliability.
This advanced system is specifically engineered for the deposition of various films, including single or multilayer ferroelectric film, conductive film, alloy film, semiconductor film, ceramic film, dielectric film, optical film, oxide film, hard film, and PTFE film. With its versatile capabilities, it caters to a wide range of applications, making it an indispensable tool for researchers and industry experts alike.
Featuring a high vacuum stainless steel chamber, this coater ensures a pristine environment for film deposition, minimizing contamination and maximizing film quality. The chamber's robust construction guarantees excellent durability, allowing for long-term, uninterrupted operation.
Equipped with magnetron sputtering technology, this coater delivers precise and uniform film deposition, ensuring exceptional film thickness control and uniformity. This enables researchers to achieve consistent and reproducible results, critical for accurate analysis and experimentation.
The DC Three Target Magnetron Sputtering Coater is designed with user-friendliness in mind. Its intuitive interface and easy-to-use controls make operation a breeze, even for those new to the technology. Additionally, its compact size and efficient design optimize space utilization, making it a valuable asset in any laboratory or production facility.
Invest in the DC Three Target Magnetron Sputtering Coater with High Vacuum Stainless Steel Chamber today and unlock a world of possibilities in film preparation. Experience unrivaled precision, reliability, and versatility, and take your research or production to new heights. Trust in our professional-grade equipment to deliver exceptional results every time.
Three target magnetron sputtering coater technical paremeters:
Product name | DC three target magnetron sputtering coater |
Product model | TN-MSP300S-2DC1RF |
Sputtering power supply | Installed two DC power supply DC power: 500W |
Vacuum chamber | Vacuum chamber: 450 mm Diameter x 450 mm height，stainless steel observation window: 100 mm diameter |
Magnetron sputtering head | The instrument is equipped with three 3-inch target magnetron sputtering target guns(one of which is a strong magnetic target and two permanent magnet targets ),and all have water-cooled interlayer, which can be cooled by cooling water to target material |
The sample table | The sample table size：150mm dia.(the sample table can rotate, with adjustable speed range:1-20rpm) The maximum heating temperature of the sample table is 750℃, and the temperature control accuracy is +/- 1.0 °C |
Gas flow controller | A mass flow meter is installed inside the instrument Range :0-200sccm (argon) Gas flow can be set in 15.6 inch screen intelligent control system |
Vacuum pump | Equipped with a set of molecular pump system, using one-clickoperation600L/S |
Vacuum gauge | EF Kompirani vacuum gauge MPG400 Measurement range: 5 x 10-9 mbar -- Atmospheric pressure |
Film thickness gauge | The quartz vibration film thickness gauge is mounted on the equipment and can monitor the film thickness in real time with a resolution of 0.1A. |
Voltage | 220V 50HZ |
Notes | 1.three 3-inch sputtering target (one strong magnetic target and two permanent magnetic targets) 2.one flow meter 3.stainless steel vacuum chamber 4.molecular pump group 5.film thickness gauge 6.two DC power supply and one RF power supply 7.water chilling unit 8.with rotary heating sample table 9.15.6 inch screen intelligent control system 10.air compressor 11.electrically controlled pneumatic gate valve 12.electrically controlled cut-off valve 13.electrically controlled pneumatic side pumping valve 14. EF kang vacuum gauge MPG 400 measuring range |
Introducing the DC Three Target Magnetron Sputtering Coater with High Vacuum Stainless Steel Chamber, the ultimate solution for precision film preparation. Designed for professionals in the field, this cutting-edge coater offers unparalleled performance and reliability.
This advanced system is specifically engineered for the deposition of various films, including single or multilayer ferroelectric film, conductive film, alloy film, semiconductor film, ceramic film, dielectric film, optical film, oxide film, hard film, and PTFE film. With its versatile capabilities, it caters to a wide range of applications, making it an indispensable tool for researchers and industry experts alike.
Featuring a high vacuum stainless steel chamber, this coater ensures a pristine environment for film deposition, minimizing contamination and maximizing film quality. The chamber's robust construction guarantees excellent durability, allowing for long-term, uninterrupted operation.
Equipped with magnetron sputtering technology, this coater delivers precise and uniform film deposition, ensuring exceptional film thickness control and uniformity. This enables researchers to achieve consistent and reproducible results, critical for accurate analysis and experimentation.
The DC Three Target Magnetron Sputtering Coater is designed with user-friendliness in mind. Its intuitive interface and easy-to-use controls make operation a breeze, even for those new to the technology. Additionally, its compact size and efficient design optimize space utilization, making it a valuable asset in any laboratory or production facility.
Invest in the DC Three Target Magnetron Sputtering Coater with High Vacuum Stainless Steel Chamber today and unlock a world of possibilities in film preparation. Experience unrivaled precision, reliability, and versatility, and take your research or production to new heights. Trust in our professional-grade equipment to deliver exceptional results every time.
Three target magnetron sputtering coater technical paremeters:
Product name | DC three target magnetron sputtering coater |
Product model | TN-MSP300S-2DC1RF |
Sputtering power supply | Installed two DC power supply DC power: 500W |
Vacuum chamber | Vacuum chamber: 450 mm Diameter x 450 mm height，stainless steel observation window: 100 mm diameter |
Magnetron sputtering head | The instrument is equipped with three 3-inch target magnetron sputtering target guns(one of which is a strong magnetic target and two permanent magnet targets ),and all have water-cooled interlayer, which can be cooled by cooling water to target material |
The sample table | The sample table size：150mm dia.(the sample table can rotate, with adjustable speed range:1-20rpm) The maximum heating temperature of the sample table is 750℃, and the temperature control accuracy is +/- 1.0 °C |
Gas flow controller | A mass flow meter is installed inside the instrument Range :0-200sccm (argon) Gas flow can be set in 15.6 inch screen intelligent control system |
Vacuum pump | Equipped with a set of molecular pump system, using one-clickoperation600L/S |
Vacuum gauge | EF Kompirani vacuum gauge MPG400 Measurement range: 5 x 10-9 mbar -- Atmospheric pressure |
Film thickness gauge | The quartz vibration film thickness gauge is mounted on the equipment and can monitor the film thickness in real time with a resolution of 0.1A. |
Voltage | 220V 50HZ |
Notes | 1.three 3-inch sputtering target (one strong magnetic target and two permanent magnetic targets) 2.one flow meter 3.stainless steel vacuum chamber 4.molecular pump group 5.film thickness gauge 6.two DC power supply and one RF power supply 7.water chilling unit 8.with rotary heating sample table 9.15.6 inch screen intelligent control system 10.air compressor 11.electrically controlled pneumatic gate valve 12.electrically controlled cut-off valve 13.electrically controlled pneumatic side pumping valve 14. EF kang vacuum gauge MPG 400 measuring range |
