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TN-MSP500S-DCRF-B
TN
Dual target DC RF magnetron sputtering coater with bottom target type for for Noble Metal Coating
Dual target DC RF magnetron sputtering coater is equipped with a dual target DC RF magnetron sputtering system, allowing for efficient and precise coating of noble metals. The bottom target type ensures uniform coating across the substrate, resulting in high-quality and consistent film deposition.
With its advanced technology, this coater offers excellent film adhesion, high deposition rates, and low film stress. It also provides a wide range of process parameters, allowing for customization and optimization of coating conditions. The user-friendly interface and intuitive controls make it easy to operate and monitor the coating process.
This sputtering coater is suitable for research and development laboratories, universities, and industrial applications. It is ideal for various applications such as optical coatings, electronic devices, solar cells, sensors, and more. Its robust construction and reliable performance ensure long-lasting and efficient operation.
Overall, the Dual Target DC RF Magnetron Sputtering Coater with Bottom Target Type for Noble Metal Coating is a versatile and reliable solution for precise and high-quality film deposition. Its advanced features and user-friendly design make it an excellent choice for professionals in the field.
magnetron sputtering coater Technical parameter:
Model | TN-MSP500S-DCRF-B | |
Input | AC220V，50Hz | |
Total power | 6KW | |
Ultimate vacuum degree | 5x10-4Pa | |
Sample table parameters | Size | 150 Dia. |
Height | 70 mm adjustable | |
Heating | ≤500℃ | |
Rotation speed | 1-20 rpm | |
Magnetron sputtering head parameters | Quantity | 2-set，2-inch |
Cooling mode | Water cooled，required flow rate10L/min | |
Water chiller | 10L/min circulating water cooling | |
Vacuum chamber | Size | |
Material | Stainless steel | |
Watch window | 100mm Dia. | |
Open mode | front opening door | |
Gas flow controller | 1channel 200sccm Ar； | |
Vacuum pump | Molecular pump system pumping,600L/S | |
Film thickness gauge | Quartz vibrating film thickness gauge ， one set，Resolution 0.10 Å | |
Sputter power supply | DC power supply：one set，500W，for metal films RF power supply：one set，500W，for non-metallic films | |
Operating mode | All-in-one computer operation | |
Overall dimensions | 1090mm X 900mm X 1250mm | |
Total weight | 350kg | |
Dual target DC RF magnetron sputtering coater with bottom target type for for Noble Metal Coating
Dual target DC RF magnetron sputtering coater is equipped with a dual target DC RF magnetron sputtering system, allowing for efficient and precise coating of noble metals. The bottom target type ensures uniform coating across the substrate, resulting in high-quality and consistent film deposition.
With its advanced technology, this coater offers excellent film adhesion, high deposition rates, and low film stress. It also provides a wide range of process parameters, allowing for customization and optimization of coating conditions. The user-friendly interface and intuitive controls make it easy to operate and monitor the coating process.
This sputtering coater is suitable for research and development laboratories, universities, and industrial applications. It is ideal for various applications such as optical coatings, electronic devices, solar cells, sensors, and more. Its robust construction and reliable performance ensure long-lasting and efficient operation.
Overall, the Dual Target DC RF Magnetron Sputtering Coater with Bottom Target Type for Noble Metal Coating is a versatile and reliable solution for precise and high-quality film deposition. Its advanced features and user-friendly design make it an excellent choice for professionals in the field.
magnetron sputtering coater Technical parameter:
Model | TN-MSP500S-DCRF-B | |
Input | AC220V，50Hz | |
Total power | 6KW | |
Ultimate vacuum degree | 5x10-4Pa | |
Sample table parameters | Size | 150 Dia. |
Height | 70 mm adjustable | |
Heating | ≤500℃ | |
Rotation speed | 1-20 rpm | |
Magnetron sputtering head parameters | Quantity | 2-set，2-inch |
Cooling mode | Water cooled，required flow rate10L/min | |
Water chiller | 10L/min circulating water cooling | |
Vacuum chamber | Size | |
Material | Stainless steel | |
Watch window | 100mm Dia. | |
Open mode | front opening door | |
Gas flow controller | 1channel 200sccm Ar； | |
Vacuum pump | Molecular pump system pumping,600L/S | |
Film thickness gauge | Quartz vibrating film thickness gauge ， one set，Resolution 0.10 Å | |
Sputter power supply | DC power supply：one set，500W，for metal films RF power supply：one set，500W，for non-metallic films | |
Operating mode | All-in-one computer operation | |
Overall dimensions | 1090mm X 900mm X 1250mm | |
Total weight | 350kg | |
