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TN-MSP325G-2T-DVC-2DC
TN
The Double Target Magnetron Sputtering Coater is designed to provide even and uniform coating on laboratory SEM samples. With its dual target system, it allows for simultaneous deposition of different materials, enabling the creation of complex multi-layer structures. This feature is particularly useful for studying the properties and behavior of various thin films.
The coater utilizes DC magnetron sputtering technology, which ensures high deposition rates and excellent film quality. The sputtering process involves bombarding a target material with high-energy ions, causing the atoms to be ejected and deposited onto the substrate. This results in a dense and adherent film with precise control over thickness and composition.
The transition chamber included in this coater facilitates the transfer of coated samples to a SEM without exposure to air, minimizing the risk of contamination. This is crucial for maintaining the integrity of the samples and obtaining accurate analysis results. The chamber is designed with a user-friendly interface, allowing for easy loading and unloading of samples.
With its robust construction and advanced features, the Double Target Magnetron Sputtering Coater with Transition Chamber is an essential tool for researchers and scientists working with thin films. It offers precise and reliable coating capabilities, enabling the production of high-quality samples for a wide range of applications. Whether in academia or industry, this coater is a valuable asset for any laboratory seeking to advance their research in materials science and related fields.
Double target magnetron sputtering coater Technical Parameters:
Product name | Double target magnetron sputtering coater with transition chamber |
Product model | TN-MSP325G-2T-DVC-2DC（double vacuum chamber） |
Installation conditions | 1. Operating environment temperature 25℃±15℃, humidity 55%Rh±10%Rh; 2. Equipment power supply: AC220V, 50Hz, must be well grounded; 3. Rated power: 5000w; 4. Equipment gas: the equipment chamber needs to be filled with argon for cleaning, and the customer needs to prepare argon, with a purity of ≥99.99%; 5. The size of the venue is 1200mm×1200mm×2000mm; 6. The placement position requires good ventilation and heat dissipation. |
Technical parameters | 1. Sputtering power supply: DC power supply 500W x2; maximum output voltage 600V, limit output current 1000mA 2. Magnetron target: 2-inch balanced target with magnetic coupling baffle; 3. Applicable target material for magnetron target: φ50mm x 3mm thick conductive metal target material 4. Cavity size: main cavity φ325mm x 410mm; transition cavity 150x150x150mm 5. Chamber function: The main chamber is equipped with a side door sealed by a sealing ring, a quartz observation window with a baffle, and a manual operating rod for transferring samples. The transition chamber is equipped with an upper cover with a quartz window sealed by a sealing ring, a magnetic coupling push rod for transporting samples into the main chamber, and an independent vacuum system. 6. Cavity material: stainless steel 304 7. Rotating heating sample table: The speed is continuously adjustable from 1 to 20 rpm; the heating temperature is up to 500°C, and the heating rate is recommended to be 10°C/min, and the maximum temperature is 20°C/min. 8. Cooling method: Magnetron target and molecular pump need circulating water cooler; 9. Water cooler: water tank volume 9L, flow rate 10L/min 10. Gas supply system: mass flow meter, gas type AR gas, flow rate 1~200sccm (customizable); 11. Flow meter accuracy: ±1.5% range 12. The pumping interface of the vacuum chamber is CF160; 13. The air inlet interface is a 1/4 inch double ferrule joint; 14. The display is 14 industrial computer all-in-one computers; 15. The sputtering current can be adjusted, and the sputtering safe current value and safe vacuum value can be set; 16. Safety protection: Sputtering current will be automatically cut off when overcurrent and vacuum are too low; 17. Vacuum system: the main chamber is equipped with a CY-GZK103 high vacuum molecular pump set with a pumping speed of 600L/s; the transition chamber is equipped with a small molecular pump set with a pumping speed of 60L/s. The two sets of vacuum systems can work and control independently, and the pneumatic valves between the chambers and in the vacuum system are all controlled by programs, which can realize one-key action, which is convenient and quick. 18. Ultimate vacuum: 5E-4Pa (with molecular pump); 19. The vacuum measurement is a composite vacuum gauge, and its range is: 10-5Pa~105Pa |
Precautions | 1. In order to achieve a higher oxygen-free environment, the vacuum chamber must be cleaned with high-purity inert gas at least 3 times. 2. Magnetron sputtering is more sensitive to the intake air volume, and a mass flow meter needs to be used to control the intake air volume. 3. Keep the cavity in a vacuum when the equipment is not in use. 4. If it has not been vacuumed for a long time, it should be degassed when it is used again to improve the vacuum performance. |
Optional accessories | |
Film thickness monitor | 1. Film thickness resolution: 0.0136Å (aluminum) 2. Film thickness accuracy: ±0.5%, depending on the process conditions, especially the position of the sensor, material stress, temperature and density 3. Measurement speed: 100ms-1s/time, the measurement range can be set: 500000Å (aluminum) 4. Standard sensor crystal: 6MHz 5. Applicable chip frequency: 6MHz Applicable chip size: Φ14mm Mounting flange: CF35 |
Other accessories | 1. TN-CZK103 series high-performance molecular pump set (including compound vacuum gauge, measuring range 10-5Pa~105Pa); TN-GZK60 series small molecular pump set (including compound vacuum gauge, measuring range 10-5Pa~102Pa) VRD-4 bipolar rotary vane vacuum pump; 2. KF25/40 vacuum bellows; length can be 0.5m, 1m, 1.5m; KF25 clamp bracket 3. Crystal oscillator of film thickness meter; |
The Double Target Magnetron Sputtering Coater is designed to provide even and uniform coating on laboratory SEM samples. With its dual target system, it allows for simultaneous deposition of different materials, enabling the creation of complex multi-layer structures. This feature is particularly useful for studying the properties and behavior of various thin films.
The coater utilizes DC magnetron sputtering technology, which ensures high deposition rates and excellent film quality. The sputtering process involves bombarding a target material with high-energy ions, causing the atoms to be ejected and deposited onto the substrate. This results in a dense and adherent film with precise control over thickness and composition.
The transition chamber included in this coater facilitates the transfer of coated samples to a SEM without exposure to air, minimizing the risk of contamination. This is crucial for maintaining the integrity of the samples and obtaining accurate analysis results. The chamber is designed with a user-friendly interface, allowing for easy loading and unloading of samples.
With its robust construction and advanced features, the Double Target Magnetron Sputtering Coater with Transition Chamber is an essential tool for researchers and scientists working with thin films. It offers precise and reliable coating capabilities, enabling the production of high-quality samples for a wide range of applications. Whether in academia or industry, this coater is a valuable asset for any laboratory seeking to advance their research in materials science and related fields.
Double target magnetron sputtering coater Technical Parameters:
Product name | Double target magnetron sputtering coater with transition chamber |
Product model | TN-MSP325G-2T-DVC-2DC（double vacuum chamber） |
Installation conditions | 1. Operating environment temperature 25℃±15℃, humidity 55%Rh±10%Rh; 2. Equipment power supply: AC220V, 50Hz, must be well grounded; 3. Rated power: 5000w; 4. Equipment gas: the equipment chamber needs to be filled with argon for cleaning, and the customer needs to prepare argon, with a purity of ≥99.99%; 5. The size of the venue is 1200mm×1200mm×2000mm; 6. The placement position requires good ventilation and heat dissipation. |
Technical parameters | 1. Sputtering power supply: DC power supply 500W x2; maximum output voltage 600V, limit output current 1000mA 2. Magnetron target: 2-inch balanced target with magnetic coupling baffle; 3. Applicable target material for magnetron target: φ50mm x 3mm thick conductive metal target material 4. Cavity size: main cavity φ325mm x 410mm; transition cavity 150x150x150mm 5. Chamber function: The main chamber is equipped with a side door sealed by a sealing ring, a quartz observation window with a baffle, and a manual operating rod for transferring samples. The transition chamber is equipped with an upper cover with a quartz window sealed by a sealing ring, a magnetic coupling push rod for transporting samples into the main chamber, and an independent vacuum system. 6. Cavity material: stainless steel 304 7. Rotating heating sample table: The speed is continuously adjustable from 1 to 20 rpm; the heating temperature is up to 500°C, and the heating rate is recommended to be 10°C/min, and the maximum temperature is 20°C/min. 8. Cooling method: Magnetron target and molecular pump need circulating water cooler; 9. Water cooler: water tank volume 9L, flow rate 10L/min 10. Gas supply system: mass flow meter, gas type AR gas, flow rate 1~200sccm (customizable); 11. Flow meter accuracy: ±1.5% range 12. The pumping interface of the vacuum chamber is CF160; 13. The air inlet interface is a 1/4 inch double ferrule joint; 14. The display is 14 industrial computer all-in-one computers; 15. The sputtering current can be adjusted, and the sputtering safe current value and safe vacuum value can be set; 16. Safety protection: Sputtering current will be automatically cut off when overcurrent and vacuum are too low; 17. Vacuum system: the main chamber is equipped with a CY-GZK103 high vacuum molecular pump set with a pumping speed of 600L/s; the transition chamber is equipped with a small molecular pump set with a pumping speed of 60L/s. The two sets of vacuum systems can work and control independently, and the pneumatic valves between the chambers and in the vacuum system are all controlled by programs, which can realize one-key action, which is convenient and quick. 18. Ultimate vacuum: 5E-4Pa (with molecular pump); 19. The vacuum measurement is a composite vacuum gauge, and its range is: 10-5Pa~105Pa |
Precautions | 1. In order to achieve a higher oxygen-free environment, the vacuum chamber must be cleaned with high-purity inert gas at least 3 times. 2. Magnetron sputtering is more sensitive to the intake air volume, and a mass flow meter needs to be used to control the intake air volume. 3. Keep the cavity in a vacuum when the equipment is not in use. 4. If it has not been vacuumed for a long time, it should be degassed when it is used again to improve the vacuum performance. |
Optional accessories | |
Film thickness monitor | 1. Film thickness resolution: 0.0136Å (aluminum) 2. Film thickness accuracy: ±0.5%, depending on the process conditions, especially the position of the sensor, material stress, temperature and density 3. Measurement speed: 100ms-1s/time, the measurement range can be set: 500000Å (aluminum) 4. Standard sensor crystal: 6MHz 5. Applicable chip frequency: 6MHz Applicable chip size: Φ14mm Mounting flange: CF35 |
Other accessories | 1. TN-CZK103 series high-performance molecular pump set (including compound vacuum gauge, measuring range 10-5Pa~105Pa); TN-GZK60 series small molecular pump set (including compound vacuum gauge, measuring range 10-5Pa~102Pa) VRD-4 bipolar rotary vane vacuum pump; 2. KF25/40 vacuum bellows; length can be 0.5m, 1m, 1.5m; KF25 clamp bracket 3. Crystal oscillator of film thickness meter; |
