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TN-MSP500S-2DC-1RF
TN
three target magnetron sputtering coater with UPS for multi-layer ferroelectric thin films
Three target magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment independently developed by our company. It is standardized, modular and customizable
Application fields of Three target magnetron sputtering coater:
This device can be used for preparing single-layer or multi-layer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, oxide films, hard films, PTFE films, and the like. Compared with similar equipment, this three-target magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation, and is an ideal equipment for preparing material films in a laboratory.
Three target magnetron sputtering coater Technical Parameters:
Supply Voltage | l VAC 220, 60Hz |
UPS | l 20KVA 16KW, 1 hour delay l 16 batteries, with capacity of 38AH |
Vacuum Chamber | l Dimension: Dia. 325 mm * H 385 mm l Material: 304 stainless steel l Viewport (Window): ~4'' (100mm) with shutter |
Sample Stage | l Top sample holder l Sample table: Dia. 150mm l Sample size: Max. 4'' diameter l Rotary speed: 0-40rpm adjustable l Heating temperature: up to 700oC l |
Water Chiller | l Water flow rate: 2.3m3/h l Power: 3P l Cooling Capacity: 8250Kcal/h l Compressor output power: 2.25KW |
Magnetron Sputtering Gun | l 3× 2'' magnetron sputter guns, with automatic shutter l Sputtering orientation upwards l Target diameter: 2'' l Magnets: rare earth magnet |
RF Generator | l 3 × RF 300W power supply with auto match l Power output range: 5W~300W l Maximum reflected power: 100W l Power stability: ±0.1% l Harmonic component: ≤-50dbc l Power supply: Single phase 187-253 VAC, 50/60HZ l Efficiency: ≥70% l Power factor: ≥90% l Reflected power (at maximum power): <3W l Maximum load current: 30ARMS l Maximum load voltage: 7500VRMS l RF output connector: 50 Ω, L29 or customized l Match time: 1~3s l Real part range of matched impedance: 0~80Ω l Imaginary part range of matched impedance:﹣200j~ ﹢200j l Cooling method: forced cooling |
Mass Flow Meter | l 3 × MFC mass flow control (Ar, O2 and N2) l Measuring ranges: up to 20sccm l With pneumatic isolation valve(s) and filter. |
Full Automatic control by PC or PLC, to control | l Store for minimum 100 recipe l 19'' Flat controller |
three target magnetron sputtering coater with UPS for multi-layer ferroelectric thin films
Three target magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment independently developed by our company. It is standardized, modular and customizable
Application fields of Three target magnetron sputtering coater:
This device can be used for preparing single-layer or multi-layer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, oxide films, hard films, PTFE films, and the like. Compared with similar equipment, this three-target magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation, and is an ideal equipment for preparing material films in a laboratory.
Three target magnetron sputtering coater Technical Parameters:
Supply Voltage | l VAC 220, 60Hz |
UPS | l 20KVA 16KW, 1 hour delay l 16 batteries, with capacity of 38AH |
Vacuum Chamber | l Dimension: Dia. 325 mm * H 385 mm l Material: 304 stainless steel l Viewport (Window): ~4'' (100mm) with shutter |
Sample Stage | l Top sample holder l Sample table: Dia. 150mm l Sample size: Max. 4'' diameter l Rotary speed: 0-40rpm adjustable l Heating temperature: up to 700oC l |
Water Chiller | l Water flow rate: 2.3m3/h l Power: 3P l Cooling Capacity: 8250Kcal/h l Compressor output power: 2.25KW |
Magnetron Sputtering Gun | l 3× 2'' magnetron sputter guns, with automatic shutter l Sputtering orientation upwards l Target diameter: 2'' l Magnets: rare earth magnet |
RF Generator | l 3 × RF 300W power supply with auto match l Power output range: 5W~300W l Maximum reflected power: 100W l Power stability: ±0.1% l Harmonic component: ≤-50dbc l Power supply: Single phase 187-253 VAC, 50/60HZ l Efficiency: ≥70% l Power factor: ≥90% l Reflected power (at maximum power): <3W l Maximum load current: 30ARMS l Maximum load voltage: 7500VRMS l RF output connector: 50 Ω, L29 or customized l Match time: 1~3s l Real part range of matched impedance: 0~80Ω l Imaginary part range of matched impedance:﹣200j~ ﹢200j l Cooling method: forced cooling |
Mass Flow Meter | l 3 × MFC mass flow control (Ar, O2 and N2) l Measuring ranges: up to 20sccm l With pneumatic isolation valve(s) and filter. |
Full Automatic control by PC or PLC, to control | l Store for minimum 100 recipe l 19'' Flat controller |
