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TN-MSP325S-2DCRF
TN
This DC/RF Three Head High Vacuum Magnetron Sputtering Coater offers advanced technology and precision control for efficient and accurate film deposition. With its high vacuum environment, it ensures a clean and contamination-free coating process.
The coater is equipped with three magnetron sputtering heads, allowing for simultaneous deposition of multiple layers. This enables the production of complex multilayer films with precise control over thickness and composition.
Featuring a high-quality vacuum system, this coater ensures excellent film uniformity and adhesion. The sputtering heads provide a stable and consistent plasma discharge, resulting in high film density and low porosity.
The equipment is user-friendly and comes with a user interface that allows for easy operation and control. It offers various deposition modes, including DC and RF sputtering, enabling flexibility in film preparation.
With its robust construction and reliable performance, this coater is suitable for research and development laboratories, as well as industrial production facilities. It provides a cost-effective solution for the fabrication of SiO2/Ta2O5 multilayer optical films with excellent optical properties.
In summary, the DC/RF Three Head High Vacuum Magnetron Sputtering Coater is a professional-grade equipment that offers precise and efficient deposition of SiO2/Ta2O5 multilayer optical films. Its advanced features and user-friendly interface make it an ideal choice for various thin film applications.
Magnetron Sputtering Coater Technical Parameters：
Sample stage | Size | Dia.140mm |
Heating temperature | Max 500℃ | |
Temperature accuracy | ±1℃ | |
Rotational speed | 1-20rpm adjustable | |
Magnetron Sputtering head | Quantity | 2”×3 (1”,2” optional) |
Cooling mode | Water cooling | |
Water chiller | Circulating water chiller with flow rate of 10L/min | |
Vacuum chamber | Chamber size | Dia.300mm×300mm |
Chamber material | Stainless steel | |
Watch window | Dia.100mm | |
Opening mode | Top cover open | |
Mass flowmeter | 2 channels; measuring range 100SCCM; 100SCCM (can be customized according to customer needs) | |
Vacuum system | Model | TN-GZK103-A |
Molecular pump | TN-600 | |
Backing pump | Rotary vane pump | |
Ultimate vacuum | 1.0E-5Pa | |
Pumping interface | CF160 | |
Exhaust interface | KF40 | |
Vacuum measurement | Compound vacuum gauge | |
Power supply | AC;220V 50/60Hz | |
Pumping rate | Molecular pump: 600L/S rotary vane pump: 1.1L/S Comprehensive gas pumping performance: vacuum up to 1.0E-3Pa in 20 minutes | |
Power configuration | Quantity | DC power supply x2 RF power supply x1 |
Max output power | DC 500 W, RF 500W | |
Other parameters | Supply voltage | AC220V,50Hz |
Total power | 4KW | |
Overall size | 600mm×650mm×1280mm | |
Total Weight | About 300kg | |
This DC/RF Three Head High Vacuum Magnetron Sputtering Coater offers advanced technology and precision control for efficient and accurate film deposition. With its high vacuum environment, it ensures a clean and contamination-free coating process.
The coater is equipped with three magnetron sputtering heads, allowing for simultaneous deposition of multiple layers. This enables the production of complex multilayer films with precise control over thickness and composition.
Featuring a high-quality vacuum system, this coater ensures excellent film uniformity and adhesion. The sputtering heads provide a stable and consistent plasma discharge, resulting in high film density and low porosity.
The equipment is user-friendly and comes with a user interface that allows for easy operation and control. It offers various deposition modes, including DC and RF sputtering, enabling flexibility in film preparation.
With its robust construction and reliable performance, this coater is suitable for research and development laboratories, as well as industrial production facilities. It provides a cost-effective solution for the fabrication of SiO2/Ta2O5 multilayer optical films with excellent optical properties.
In summary, the DC/RF Three Head High Vacuum Magnetron Sputtering Coater is a professional-grade equipment that offers precise and efficient deposition of SiO2/Ta2O5 multilayer optical films. Its advanced features and user-friendly interface make it an ideal choice for various thin film applications.
Magnetron Sputtering Coater Technical Parameters：
Sample stage | Size | Dia.140mm |
Heating temperature | Max 500℃ | |
Temperature accuracy | ±1℃ | |
Rotational speed | 1-20rpm adjustable | |
Magnetron Sputtering head | Quantity | 2”×3 (1”,2” optional) |
Cooling mode | Water cooling | |
Water chiller | Circulating water chiller with flow rate of 10L/min | |
Vacuum chamber | Chamber size | Dia.300mm×300mm |
Chamber material | Stainless steel | |
Watch window | Dia.100mm | |
Opening mode | Top cover open | |
Mass flowmeter | 2 channels; measuring range 100SCCM; 100SCCM (can be customized according to customer needs) | |
Vacuum system | Model | TN-GZK103-A |
Molecular pump | TN-600 | |
Backing pump | Rotary vane pump | |
Ultimate vacuum | 1.0E-5Pa | |
Pumping interface | CF160 | |
Exhaust interface | KF40 | |
Vacuum measurement | Compound vacuum gauge | |
Power supply | AC;220V 50/60Hz | |
Pumping rate | Molecular pump: 600L/S rotary vane pump: 1.1L/S Comprehensive gas pumping performance: vacuum up to 1.0E-3Pa in 20 minutes | |
Power configuration | Quantity | DC power supply x2 RF power supply x1 |
Max output power | DC 500 W, RF 500W | |
Other parameters | Supply voltage | AC220V,50Hz |
Total power | 4KW | |
Overall size | 600mm×650mm×1280mm | |
Total Weight | About 300kg | |
