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TN-MSH325-III-DCDCRF-SS
TN
Introducing our state-of-the-art three-target magnetron sputtering coater, designed for advanced thin film deposition applications in various industries. This cutting-edge equipment is equipped with a range of features that make it ideal for producing high-quality alloy thin films, complex optical coatings, magnetic alloy films, thin-film solar cells, hard alloy coatings, corrosion-resistant layers, and more.
Our three-target magnetron sputtering coater is a versatile tool that is essential for material science and nanotechnology research, as well as for prototyping and experimentation purposes. With precise control over deposition parameters, including film thickness, composition, and uniformity, this coater allows for the creation of custom coatings tailored to specific requirements.
Whether you are working on developing new materials, improving existing products, or conducting research in the field of thin film technology, our three-target magnetron sputtering coater offers the reliability, flexibility, and performance you need to achieve your goals. Invest in this advanced equipment today and take your thin film deposition capabilities to the next level.
Product name | Horizontal high vacuum three-target magnetron sputtering coater | |
Product model | TN-MSH325-III-DCDCRF-SS | |
Power supply voltage | AC220V，50Hz | |
Complete power | 6KW | |
System vacuum | ≦5×10-4Pa | |
Sample stage | Dimensions | φ150mm |
Heating temperature | ≦850℃ | |
Temperature control accuracy | ±1℃ | |
Adjustable speed | ≦20rpm | |
Magnetron Sputtering Target | Target size | Diameter Φ50.8mm, thickness ≦3mm |
Cooling mode | Circulating water cooling | |
Water flow size | Not less than 10L/Min | |
Quantity | 3 | |
Vacuum chamber | Cavity size | Diameter φ325mm |
Cavity material | SUU304 stainless steel | |
Observation window | Diameter φ100mm | |
Opening method | Top opening | |
Gas control | 1 mass flow meter is used to control Ar flow, with a range of 200SCCM | |
Vacuum system | Equipped with 1 molecular pump system, gas pumping speed 600L/S | |
Film thickness measurement | Optional quartz crystal film thickness meter, resolution 0.10 Å | |
Sputtering power supply | Equipped with DC power supply, power 500W*2 RF power supply 300W | |
Control system | CYKY self-developed professional control system | |
Equipment dimensions | 570mm×1040mm×1700mm | |
Equipment weight | 250kg | |
three-target magnetron sputtering coater for alloy thin films is a specialized piece of equipment designed to deposit complex alloy compositions and multilayer coatings using three different target materials. This configuration allows for a wide range of applications, particularly in areas where precise control over the composition and properties of thin films is crucial. Here are the primary areas where a three-target magnetron sputtering coater is commonly used:
Advanced Microelectronics and Semiconductor Manufacturing:
Alloy Thin Films: The machine is ideal for depositing alloy thin films, which are crucial in advanced semiconductor devices. By simultaneously sputtering from three different targets, it is possible to create complex alloy compositions that are essential for next-generation microelectronics.
Multilayer and Gradient Films: This equipment is used to create multilayer films with different materials, enabling the fabrication of devices with enhanced electrical, optical, and mechanical properties.
Optoelectronics and Photonics:
Complex Optical Coatings: In the field of optoelectronics, the three-target system is used to deposit complex optical coatings, such as filters, mirrors, and anti-reflective coatings, with tailored refractive indices and optical properties.
Transparent Conductive Oxides (TCOs): The machine can deposit TCOs with specific alloy compositions, which are used in displays, touch screens, and photovoltaic devices.
Magnetic Storage and Spintronics:
Magnetic Alloy Films: The coater is used to deposit magnetic alloy films, such as those used in hard disk drives and magnetic random-access memory (MRAM). The ability to control the composition of magnetic alloys is crucial for optimizing the performance of these devices.
Spintronic Devices: In spintronics, alloy thin films with specific magnetic properties are essential. A three-target system allows for the precise tuning of these properties by adjusting the composition of the deposited alloys.
Energy Storage and Conversion:
Battery and Fuel Cell Components: The machine is used to deposit thin films for energy storage devices, such as batteries and fuel cells. Alloy thin films can be tailored for use as electrode materials, protective coatings, or catalytic layers.
Thin-Film Solar Cells: In the production of thin-film solar cells, the three-target coater is used to deposit complex alloy layers that serve as absorber materials or buffer layers, improving the efficiency and stability of the solar cells.
Wear-Resistant and Protective Coatings:
Hard Alloy Coatings: The coater is used to deposit hard alloy coatings, such as those combining elements like titanium, aluminum, and chromium. These coatings are applied to tools, molds, and mechanical components to enhance wear resistance and extend lifespan.
Corrosion-Resistant Layers: Alloy thin films that provide corrosion resistance are used in various industrial applications, including aerospace, automotive, and marine environments.
Decorative and Functional Coatings:
Aesthetic Coatings: The machine can be used to create decorative coatings with alloy compositions that provide both visual appeal and functional properties, such as scratch resistance or conductivity, for consumer electronics, jewelry, and automotive trim.
Functional Layers in Architecture: Alloy coatings on architectural glass can provide energy efficiency, UV protection, and other functional benefits while also contributing to the aesthetic appearance of buildings.
Research and Development:
Material Science and Nanotechnology: The three-target system is extensively used in R&D to explore new materials and develop novel alloy compositions with tailored properties for specific applications. It is particularly useful in studying the relationships between composition, structure, and performance in thin films.
Prototyping and Experimentation: Researchers use the machine to prototype new devices and materials, experimenting with different alloy combinations and deposition conditions to achieve desired outcomes.
Superconducting Films:
Superconductor Research: The machine is used to deposit superconducting alloy films, such as those based on niobium-tin (Nb₃Sn) or other high-temperature superconductors. These films are critical in research and applications involving superconductivity.
Biomedical Applications:
Biocompatible Coatings: Alloy thin films are used to create biocompatible coatings on medical implants and devices. The three-target system allows for the precise control of the alloy composition to achieve the desired biological and mechanical properties.
Overall, a three-target magnetron sputtering coater for alloy thin films offers tremendous versatility, enabling the development of complex materials with specific compositions and properties. It is a vital tool in industries ranging from electronics and energy to healthcare and advanced research
Introducing our state-of-the-art three-target magnetron sputtering coater, designed for advanced thin film deposition applications in various industries. This cutting-edge equipment is equipped with a range of features that make it ideal for producing high-quality alloy thin films, complex optical coatings, magnetic alloy films, thin-film solar cells, hard alloy coatings, corrosion-resistant layers, and more.
Our three-target magnetron sputtering coater is a versatile tool that is essential for material science and nanotechnology research, as well as for prototyping and experimentation purposes. With precise control over deposition parameters, including film thickness, composition, and uniformity, this coater allows for the creation of custom coatings tailored to specific requirements.
Whether you are working on developing new materials, improving existing products, or conducting research in the field of thin film technology, our three-target magnetron sputtering coater offers the reliability, flexibility, and performance you need to achieve your goals. Invest in this advanced equipment today and take your thin film deposition capabilities to the next level.
Product name | Horizontal high vacuum three-target magnetron sputtering coater | |
Product model | TN-MSH325-III-DCDCRF-SS | |
Power supply voltage | AC220V，50Hz | |
Complete power | 6KW | |
System vacuum | ≦5×10-4Pa | |
Sample stage | Dimensions | φ150mm |
Heating temperature | ≦850℃ | |
Temperature control accuracy | ±1℃ | |
Adjustable speed | ≦20rpm | |
Magnetron Sputtering Target | Target size | Diameter Φ50.8mm, thickness ≦3mm |
Cooling mode | Circulating water cooling | |
Water flow size | Not less than 10L/Min | |
Quantity | 3 | |
Vacuum chamber | Cavity size | Diameter φ325mm |
Cavity material | SUU304 stainless steel | |
Observation window | Diameter φ100mm | |
Opening method | Top opening | |
Gas control | 1 mass flow meter is used to control Ar flow, with a range of 200SCCM | |
Vacuum system | Equipped with 1 molecular pump system, gas pumping speed 600L/S | |
Film thickness measurement | Optional quartz crystal film thickness meter, resolution 0.10 Å | |
Sputtering power supply | Equipped with DC power supply, power 500W*2 RF power supply 300W | |
Control system | CYKY self-developed professional control system | |
Equipment dimensions | 570mm×1040mm×1700mm | |
Equipment weight | 250kg | |
three-target magnetron sputtering coater for alloy thin films is a specialized piece of equipment designed to deposit complex alloy compositions and multilayer coatings using three different target materials. This configuration allows for a wide range of applications, particularly in areas where precise control over the composition and properties of thin films is crucial. Here are the primary areas where a three-target magnetron sputtering coater is commonly used:
Advanced Microelectronics and Semiconductor Manufacturing:
Alloy Thin Films: The machine is ideal for depositing alloy thin films, which are crucial in advanced semiconductor devices. By simultaneously sputtering from three different targets, it is possible to create complex alloy compositions that are essential for next-generation microelectronics.
Multilayer and Gradient Films: This equipment is used to create multilayer films with different materials, enabling the fabrication of devices with enhanced electrical, optical, and mechanical properties.
Optoelectronics and Photonics:
Complex Optical Coatings: In the field of optoelectronics, the three-target system is used to deposit complex optical coatings, such as filters, mirrors, and anti-reflective coatings, with tailored refractive indices and optical properties.
Transparent Conductive Oxides (TCOs): The machine can deposit TCOs with specific alloy compositions, which are used in displays, touch screens, and photovoltaic devices.
Magnetic Storage and Spintronics:
Magnetic Alloy Films: The coater is used to deposit magnetic alloy films, such as those used in hard disk drives and magnetic random-access memory (MRAM). The ability to control the composition of magnetic alloys is crucial for optimizing the performance of these devices.
Spintronic Devices: In spintronics, alloy thin films with specific magnetic properties are essential. A three-target system allows for the precise tuning of these properties by adjusting the composition of the deposited alloys.
Energy Storage and Conversion:
Battery and Fuel Cell Components: The machine is used to deposit thin films for energy storage devices, such as batteries and fuel cells. Alloy thin films can be tailored for use as electrode materials, protective coatings, or catalytic layers.
Thin-Film Solar Cells: In the production of thin-film solar cells, the three-target coater is used to deposit complex alloy layers that serve as absorber materials or buffer layers, improving the efficiency and stability of the solar cells.
Wear-Resistant and Protective Coatings:
Hard Alloy Coatings: The coater is used to deposit hard alloy coatings, such as those combining elements like titanium, aluminum, and chromium. These coatings are applied to tools, molds, and mechanical components to enhance wear resistance and extend lifespan.
Corrosion-Resistant Layers: Alloy thin films that provide corrosion resistance are used in various industrial applications, including aerospace, automotive, and marine environments.
Decorative and Functional Coatings:
Aesthetic Coatings: The machine can be used to create decorative coatings with alloy compositions that provide both visual appeal and functional properties, such as scratch resistance or conductivity, for consumer electronics, jewelry, and automotive trim.
Functional Layers in Architecture: Alloy coatings on architectural glass can provide energy efficiency, UV protection, and other functional benefits while also contributing to the aesthetic appearance of buildings.
Research and Development:
Material Science and Nanotechnology: The three-target system is extensively used in R&D to explore new materials and develop novel alloy compositions with tailored properties for specific applications. It is particularly useful in studying the relationships between composition, structure, and performance in thin films.
Prototyping and Experimentation: Researchers use the machine to prototype new devices and materials, experimenting with different alloy combinations and deposition conditions to achieve desired outcomes.
Superconducting Films:
Superconductor Research: The machine is used to deposit superconducting alloy films, such as those based on niobium-tin (Nb₃Sn) or other high-temperature superconductors. These films are critical in research and applications involving superconductivity.
Biomedical Applications:
Biocompatible Coatings: Alloy thin films are used to create biocompatible coatings on medical implants and devices. The three-target system allows for the precise control of the alloy composition to achieve the desired biological and mechanical properties.
Overall, a three-target magnetron sputtering coater for alloy thin films offers tremendous versatility, enabling the development of complex materials with specific compositions and properties. It is a vital tool in industries ranging from electronics and energy to healthcare and advanced research
