You are here: Home / Products / Magnetron Sputtering Coater / Desktop single sputter head magnetron sputtering coater for ITO Indium Tin Oxide Film with transition chamber

Desktop single sputter head magnetron sputtering coater for ITO Indium Tin Oxide Film with transition chamber

Desktop Single Sputter Head Magnetron Sputtering Coater with Stainless Steel Chamber can be used for preparing single-layer or multi-layer ferroelectric thin films, conductive films, alloy films, and the like. Compared with similar equipment, the dual-target magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation, and is an ideal equipment for preparing material films in a laboratory
Availability:
Quantity:
facebook sharing button
twitter sharing button
line sharing button
wechat sharing button
linkedin sharing button
pinterest sharing button
whatsapp sharing button
sharethis sharing button
  • TN-MSP180G-DC

  • TN

Introducing our Desktop Single Sputter Head Magnetron Sputtering Coater for ITO Indium Tin Oxide Film. This state-of-the-art coater is designed with a professional tone and is perfect for various applications.


Our Desktop Single Sputter Head Magnetron Sputtering Coater features a robust stainless steel chamber, ensuring durability and longevity. This allows for the preparation of single-layer or multi-layer ferroelectric thin films, conductive films, and alloy films.


With its advanced technology, this coater delivers precise and uniform sputtering, resulting in high-quality ITO Indium Tin Oxide Films. Whether you need to enhance the conductivity of your materials or improve their optical properties, our coater is the ideal solution.


The Desktop Single Sputter Head Magnetron Sputtering Coater offers easy operation and control, making it suitable for both research and production environments. Its compact size allows for placement on a desktop, saving valuable space in your lab or facility.


Invest in our Desktop Single Sputter Head Magnetron Sputtering Coater for efficient and reliable film deposition. Experience the benefits of its professional-grade performance and achieve exceptional results in your thin film applications.

Technical parameters:

Sample stage

Size

φ100mm

Heating

Max. 500℃

Rotating speed

0-20rpm adjustable

Magnetron   sputtering head

Quantity  

2"   x1

Vacuum   chamber

Chamber   size

φ180mm   x 215mm

Observation   window

Omnidirectional   transparent

Chamber   material

High   purity quartz

Open   method

Upper   cover removable

Vacuum   system

Mechanical   pump

Rotary   vane pump

Pumping   port

KF16

Exhaust   interface

KF16

Molecular   pump

Turbomolecular   pump

Pumping   port

KF40

Exhaust   interface

KF40

Vacuum   measurement

Resistance   gauge + ionization gauge

Ultimate   vacuum

1.0E-4Pa

Power   supply

AC   220V 50/60Hz

Pumping   rate

Mechanical   pump 1.1L/s Molecular pump 600L/s

Power   configuration

Quantity

DC   power supply x1

Max.   output power

DC   power supply 150W

Supply   voltage

AC220V,   50Hz

Others

Total   power

2kW

Overall   size

550mm   x 350mm x 400mm



Previous: 
Next: 
PRODUCT INQUIRE
Zhengzhou Tainuo Thin Film Materials Co., Ltd.
Which is a manufacturer specializing in the production of laboratory scientific instruments. Our products are widely used in colleges, research institutions and laboratories.

QUICK LINKS

PRODUCTS CATEGORY

CONTACT US

 +86-371-5536-5392 
 +86-185-3800-8121
 Room 401, 4th Floor, Building 5, Zhengzhou Yida Technology New City, Jinzhan Street, High-tech Zone, Zhengzhou City
Copyright ©2023 Zhengzhou Tainuo Thin Film Materials Co., Ltd. | Support By leadong.com