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TN-MSZ194-I-DC-SS
TN
Our Desktop Single Target DC Magnetron Sputtering Coater is a cutting-edge piece of equipment designed for thin film deposition in a variety of applications. This coater is ideal for microelectronics fabrication, optical coatings, hard and wear-resistant coatings, magnetic films, solar cells, and energy devices.
With its advanced technology and precision engineering, this sputtering coater offers unparalleled control over the deposition process, resulting in high-quality thin films with exceptional uniformity and adhesion. Its single target design allows for efficient and cost-effective coating of substrates, making it an ideal choice for research and development labs, universities, and small-scale production facilities.
Whether you are working on next-generation microelectronics, developing advanced optical coatings, or exploring new materials for energy devices, our Desktop Single Target DC Magnetron Sputtering Coater is the perfect tool to help you achieve your goals. Trust in our expertise and experience to provide you with a reliable and efficient solution for all your thin film deposition needs.
product name | Desktop stainless steel cavity single target DC magnetron sputtering coater apparatus | |
Product number | TN-MSZ194-I-DC-SS | |
sample stage | Dimensions | φ100mm |
Heating temperature | ≦500℃ | |
Adjustable speed | ≦20rpm | |
Magnetic target gun | Equipped with a two-inch magnetic control target, target size: diameter 50.8mm, thickness ≦3mm | |
vacuum chamber | Cavity size | φ194mm X 263mm |
observation window | omnidirectionally transparent | |
Cavity material | 304 stainless steel | |
Opening method | Removable top cover | |
Vacuum system | Backing pump | Low noise bipolar rotary vane pump |
Molecular pump | Low noise and high pumping speed turbomolecular pump | |
Vacuum measurement | Composite vacuum gauge, range: 1*10-4Pa | |
Air extraction interface | KF16 | |
Air extraction interface | KF40 | |
Exhaust interface | KF16 | |
System vacuum | 1.0×10-4Pa | |
Power supply | AC 220V 50/60Hz | |
Pumping rate | The pumping speed of the molecular pump is 60L/s, and the pumping speed of the backing pump is 1.1L/s. | |
Power configuration | Number of power supplies | A set of DC power supply |
Output Power | DC power supply 500W | |
Other parameters | Supply voltage | AC220V,50Hz |
Total power | 2kW | |
weight | 80kg | |
Overall size | 550mm X 450mm X750mm | |
Our Desktop Single Target DC Magnetron Sputtering Coater is a cutting-edge piece of equipment designed for thin film deposition in a variety of applications. This coater is ideal for microelectronics fabrication, optical coatings, hard and wear-resistant coatings, magnetic films, solar cells, and energy devices.
With its advanced technology and precision engineering, this sputtering coater offers unparalleled control over the deposition process, resulting in high-quality thin films with exceptional uniformity and adhesion. Its single target design allows for efficient and cost-effective coating of substrates, making it an ideal choice for research and development labs, universities, and small-scale production facilities.
Whether you are working on next-generation microelectronics, developing advanced optical coatings, or exploring new materials for energy devices, our Desktop Single Target DC Magnetron Sputtering Coater is the perfect tool to help you achieve your goals. Trust in our expertise and experience to provide you with a reliable and efficient solution for all your thin film deposition needs.
product name | Desktop stainless steel cavity single target DC magnetron sputtering coater apparatus | |
Product number | TN-MSZ194-I-DC-SS | |
sample stage | Dimensions | φ100mm |
Heating temperature | ≦500℃ | |
Adjustable speed | ≦20rpm | |
Magnetic target gun | Equipped with a two-inch magnetic control target, target size: diameter 50.8mm, thickness ≦3mm | |
vacuum chamber | Cavity size | φ194mm X 263mm |
observation window | omnidirectionally transparent | |
Cavity material | 304 stainless steel | |
Opening method | Removable top cover | |
Vacuum system | Backing pump | Low noise bipolar rotary vane pump |
Molecular pump | Low noise and high pumping speed turbomolecular pump | |
Vacuum measurement | Composite vacuum gauge, range: 1*10-4Pa | |
Air extraction interface | KF16 | |
Air extraction interface | KF40 | |
Exhaust interface | KF16 | |
System vacuum | 1.0×10-4Pa | |
Power supply | AC 220V 50/60Hz | |
Pumping rate | The pumping speed of the molecular pump is 60L/s, and the pumping speed of the backing pump is 1.1L/s. | |
Power configuration | Number of power supplies | A set of DC power supply |
Output Power | DC power supply 500W | |
Other parameters | Supply voltage | AC220V,50Hz |
Total power | 2kW | |
weight | 80kg | |
Overall size | 550mm X 450mm X750mm | |
