| Quantity: | |
|---|---|
TN-MSP180G-DC
TN
Introducing our Desktop Single Sputter Head Magnetron Sputtering Coater with Quartz Cavity. This professional-grade coater is designed to meet all your thin film deposition needs.
Crafted with a stainless steel chamber, this sputtering coater guarantees durability and longevity. Its robust construction ensures a stable and reliable performance, allowing you to prepare single-layer or multi-layer ferroelectric thin films, conductive films, and alloy films with ease.
The Desktop Single Sputter Head Magnetron Sputtering Coater with Quartz Cavity is perfect for research laboratories, universities, and industrial settings. Its compact size makes it suitable for desktop use, saving valuable space in your workspace.
Equipped with a high-quality quartz cavity, this coater provides excellent uniformity and control during the sputtering process. Achieve precise and reproducible results every time, thanks to the advanced technology integrated into this coater.
With its user-friendly interface and intuitive controls, operating this sputtering coater is a breeze. The professional tone of voice ensures that you can present your work with confidence and credibility.
Invest in our Desktop Single Sputter Head Magnetron Sputtering Coater with Quartz Cavity and elevate your thin film deposition capabilities. Experience the convenience, efficiency, and precision that this cutting-edge equipment offers.
Technical parameters:
Sample stage | Size | φ100mm |
Heating | Max. 500℃ | |
Rotating speed | 0-20rpm adjustable | |
Magnetron sputtering head | Quantity | 2" x1 |
Vacuum chamber | Chamber size | φ180mm x 215mm |
Observation window | Omnidirectional transparent | |
Chamber material | High purity quartz | |
Open method | Upper cover removable | |
Vacuum system | Mechanical pump | Rotary vane pump |
Pumping port | KF16 | |
Exhaust interface | KF16 | |
Molecular pump | Turbomolecular pump | |
Pumping port | KF40 | |
Exhaust interface | KF40 | |
Vacuum measurement | Resistance gauge + ionization gauge | |
Ultimate vacuum | 1.0E-4Pa | |
Power supply | AC 220V 50/60Hz | |
Pumping rate | Mechanical pump 1.1L/s Molecular pump 600L/s | |
Power configuration | Quantity | DC power supply x1 |
Max. output power | DC power supply 150W | |
Supply voltage | AC220V, 50Hz | |
Others | Total power | 2kW |
Overall size | 550mm x 350mm x 400mm |
Introducing our Desktop Single Sputter Head Magnetron Sputtering Coater with Quartz Cavity. This professional-grade coater is designed to meet all your thin film deposition needs.
Crafted with a stainless steel chamber, this sputtering coater guarantees durability and longevity. Its robust construction ensures a stable and reliable performance, allowing you to prepare single-layer or multi-layer ferroelectric thin films, conductive films, and alloy films with ease.
The Desktop Single Sputter Head Magnetron Sputtering Coater with Quartz Cavity is perfect for research laboratories, universities, and industrial settings. Its compact size makes it suitable for desktop use, saving valuable space in your workspace.
Equipped with a high-quality quartz cavity, this coater provides excellent uniformity and control during the sputtering process. Achieve precise and reproducible results every time, thanks to the advanced technology integrated into this coater.
With its user-friendly interface and intuitive controls, operating this sputtering coater is a breeze. The professional tone of voice ensures that you can present your work with confidence and credibility.
Invest in our Desktop Single Sputter Head Magnetron Sputtering Coater with Quartz Cavity and elevate your thin film deposition capabilities. Experience the convenience, efficiency, and precision that this cutting-edge equipment offers.
Technical parameters:
Sample stage | Size | φ100mm |
Heating | Max. 500℃ | |
Rotating speed | 0-20rpm adjustable | |
Magnetron sputtering head | Quantity | 2" x1 |
Vacuum chamber | Chamber size | φ180mm x 215mm |
Observation window | Omnidirectional transparent | |
Chamber material | High purity quartz | |
Open method | Upper cover removable | |
Vacuum system | Mechanical pump | Rotary vane pump |
Pumping port | KF16 | |
Exhaust interface | KF16 | |
Molecular pump | Turbomolecular pump | |
Pumping port | KF40 | |
Exhaust interface | KF40 | |
Vacuum measurement | Resistance gauge + ionization gauge | |
Ultimate vacuum | 1.0E-4Pa | |
Power supply | AC 220V 50/60Hz | |
Pumping rate | Mechanical pump 1.1L/s Molecular pump 600L/s | |
Power configuration | Quantity | DC power supply x1 |
Max. output power | DC power supply 150W | |
Supply voltage | AC220V, 50Hz | |
Others | Total power | 2kW |
Overall size | 550mm x 350mm x 400mm |
