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TN-MSP190S-1T-A
TN
Introducing our Desktop Single Target Magnetron Sputtering Coater with Stainless Steel Cavity for Electronic Film. This advanced coater is designed to meet the needs of professionals in the field, offering exceptional performance and reliability.
Our Magnetron Sputtering Coater is capable of preparing both single-layer and multi-layer ferroelectric thin films, conductive films, and alloy films. With its cutting-edge technology, this coater ensures precise and uniform deposition of films, resulting in high-quality and consistent results.
The stainless steel cavity of our coater provides excellent durability and resistance to corrosion, ensuring a long lifespan and optimal performance. Its compact desktop design allows for easy installation and integration into any laboratory or research facility.
Equipped with state-of-the-art magnetron sputtering technology, this coater offers enhanced efficiency and productivity. It allows for quick and efficient film deposition, saving valuable time and resources. The adjustable parameters and intuitive controls make it easy to customize the coating process according to specific requirements.
Our Desktop Single Target Magnetron Sputtering Coater is the perfect choice for professionals in the electronic film industry. Its professional and sleek design, combined with its exceptional features, makes it an essential tool for any laboratory or research facility. Trust in our coater to deliver outstanding results and elevate your film deposition processes to new heights.
Single target magnetron sputtering coater Technical Parameters：
Product Name | Desktop single-target magnetron sputtering coater with stainless steel cavity |
Product Model | TN-MSP190S-1T-A |
Installation Condition | 1,Working environment temperature: 25℃±15℃,humidity: 55%Rh±10%Rh； 2,Equipment power supply：AC220V,50Hz, must be well grounded； 3,Rated power：1000w； 4,Equipment for gas：The equipment chamber should be filled with argon gas for cleaning. The customer should prepare argon gas with purity ≥99.99%. 5,Table size requirements: 600mm×600mm×700mm,bearing capacity ≥ 50kg； 6,The position should be well ventilated and cooled. |
Technical Indicators | 1、 Sputtering power supply：DC power supply 300W；maximum output voltage 600V,limited current output 500mA 2、 Magnetron target：2 inch balance target,magnetic coupling baffle； 3、 Suitable target material： φ50mm x 3mm in thickness 4、 Cavity size ：outside diameter194,inside diameter186mm x height 230mm 5、 Cavity material： 304 stainless steel 6、 Rotating heating sample table：rotate speed 1~20rpm continuously adjustable；maximum heating temperature 500℃,the lowest recommended heating rate 10℃/min,the highest recommended heating rate 20℃/min. 7、 Cooling mode ：magnetic target and molecular pump require circulating water cooler 8、 Water-cooling machine：the tank volume 9L,flow rate 10L/min 9、 Gas supply system：mass flow meter, type of gas Argon,flow 1~30sccm（customizable） 10、 Accuracy of flow meter ：±1.5% measuring range 11、 The air pumping interface of the vacuum chamber is KF25 12、 Air intake interface is 1/4 inch double ferrule joint 13、 Touch screen is 7inch color touch screen 14、 Adjustable sputtering current,sputtering safety current value and safety vacuum value can be set； 15、 safety protection: over current, vacuum is too low automatically cut off the sputtering current 16、 Ultimate vacuum：5E-4Pa(matching molecular pump)； 17、 Vacuum measurement is Parana vacuum gauge ,the range is：1～105Pa |
Notice | 1,Magnetron sputtering has a high working vacuum, generally within 2Pa, and needs to be used with molecular pump. 2,In order to achieve a high oxygen free environment, the vacuum chamber should be cleaned at least 3 times with high purity inert gas。 3,Magnetron sputtering is sensitive to the air intake, so mass flow meter is needed to control the air intake |
Optional accessory | |
Film thickness Monitor | 1,Film thickness resolution：0.0136Å（aluminum） 2,Accuracy of film thickness ：±0.5%,it depends on process conditions, especially sensor position, material stress, temperature and density 3,Measuring speed：100ms-1s/times,measurement range can be set ：500000Å（aluminum） 4,Standard sensor crystal：6MHz 5,Suitable for wafer frequency：6MHz suitable for wafer size：Φ14mm mounting flange：CF35 |
Another Accessory | · 1,CY-CZK103 series high performance molecular pump set(including composite vacuum gauge, measuring range 10-5Pa~105Pa) CY-GZK60 series small molecular pump set(including composite vacuum gauge, measuring range 10-5Pa~102Pa) VRD-4 bipolar rotary vane vacuum pump 2,KF25 Vacuum bellows; The length can be 0.5m, 1m or 1.5m. KF40 clamp bracket 3,Film thickness meter crystal oscillator; |
Introducing our Desktop Single Target Magnetron Sputtering Coater with Stainless Steel Cavity for Electronic Film. This advanced coater is designed to meet the needs of professionals in the field, offering exceptional performance and reliability.
Our Magnetron Sputtering Coater is capable of preparing both single-layer and multi-layer ferroelectric thin films, conductive films, and alloy films. With its cutting-edge technology, this coater ensures precise and uniform deposition of films, resulting in high-quality and consistent results.
The stainless steel cavity of our coater provides excellent durability and resistance to corrosion, ensuring a long lifespan and optimal performance. Its compact desktop design allows for easy installation and integration into any laboratory or research facility.
Equipped with state-of-the-art magnetron sputtering technology, this coater offers enhanced efficiency and productivity. It allows for quick and efficient film deposition, saving valuable time and resources. The adjustable parameters and intuitive controls make it easy to customize the coating process according to specific requirements.
Our Desktop Single Target Magnetron Sputtering Coater is the perfect choice for professionals in the electronic film industry. Its professional and sleek design, combined with its exceptional features, makes it an essential tool for any laboratory or research facility. Trust in our coater to deliver outstanding results and elevate your film deposition processes to new heights.
Single target magnetron sputtering coater Technical Parameters：
Product Name | Desktop single-target magnetron sputtering coater with stainless steel cavity |
Product Model | TN-MSP190S-1T-A |
Installation Condition | 1,Working environment temperature: 25℃±15℃,humidity: 55%Rh±10%Rh； 2,Equipment power supply：AC220V,50Hz, must be well grounded； 3,Rated power：1000w； 4,Equipment for gas：The equipment chamber should be filled with argon gas for cleaning. The customer should prepare argon gas with purity ≥99.99%. 5,Table size requirements: 600mm×600mm×700mm,bearing capacity ≥ 50kg； 6,The position should be well ventilated and cooled. |
Technical Indicators | 1、 Sputtering power supply：DC power supply 300W；maximum output voltage 600V,limited current output 500mA 2、 Magnetron target：2 inch balance target,magnetic coupling baffle； 3、 Suitable target material： φ50mm x 3mm in thickness 4、 Cavity size ：outside diameter194,inside diameter186mm x height 230mm 5、 Cavity material： 304 stainless steel 6、 Rotating heating sample table：rotate speed 1~20rpm continuously adjustable；maximum heating temperature 500℃,the lowest recommended heating rate 10℃/min,the highest recommended heating rate 20℃/min. 7、 Cooling mode ：magnetic target and molecular pump require circulating water cooler 8、 Water-cooling machine：the tank volume 9L,flow rate 10L/min 9、 Gas supply system：mass flow meter, type of gas Argon,flow 1~30sccm（customizable） 10、 Accuracy of flow meter ：±1.5% measuring range 11、 The air pumping interface of the vacuum chamber is KF25 12、 Air intake interface is 1/4 inch double ferrule joint 13、 Touch screen is 7inch color touch screen 14、 Adjustable sputtering current,sputtering safety current value and safety vacuum value can be set； 15、 safety protection: over current, vacuum is too low automatically cut off the sputtering current 16、 Ultimate vacuum：5E-4Pa(matching molecular pump)； 17、 Vacuum measurement is Parana vacuum gauge ,the range is：1～105Pa |
Notice | 1,Magnetron sputtering has a high working vacuum, generally within 2Pa, and needs to be used with molecular pump. 2,In order to achieve a high oxygen free environment, the vacuum chamber should be cleaned at least 3 times with high purity inert gas。 3,Magnetron sputtering is sensitive to the air intake, so mass flow meter is needed to control the air intake |
Optional accessory | |
Film thickness Monitor | 1,Film thickness resolution：0.0136Å（aluminum） 2,Accuracy of film thickness ：±0.5%,it depends on process conditions, especially sensor position, material stress, temperature and density 3,Measuring speed：100ms-1s/times,measurement range can be set ：500000Å（aluminum） 4,Standard sensor crystal：6MHz 5,Suitable for wafer frequency：6MHz suitable for wafer size：Φ14mm mounting flange：CF35 |
Another Accessory | · 1,CY-CZK103 series high performance molecular pump set(including composite vacuum gauge, measuring range 10-5Pa~105Pa) CY-GZK60 series small molecular pump set(including composite vacuum gauge, measuring range 10-5Pa~102Pa) VRD-4 bipolar rotary vane vacuum pump 2,KF25 Vacuum bellows; The length can be 0.5m, 1m or 1.5m. KF40 clamp bracket 3,Film thickness meter crystal oscillator; |
