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TN-MSP300S-2DC
TN
The Dual-target DC Magnetron Sputtering Coater for Multi-layer Ferroelectric Thin Films is a highly advanced and efficient solution for the preparation of single-layer or multi-layer ferroelectric thin films, conductive films, and alloy films. This cutting-edge coater utilizes dual-target DC magnetron sputtering technology, ensuring precise and uniform deposition of films.
With its versatile capabilities, this coater is ideal for various applications in the fields of electronics, materials science, and research. Whether you need to create complex multi-layer structures or single-layer films, this coater guarantees exceptional results with its superior performance and reliability.
The dual-target feature allows for simultaneous deposition of different materials, enabling the creation of intricate multi-layer structures with ease. This flexibility opens up a world of possibilities for researchers and scientists, as they can explore and experiment with various material combinations and compositions.
Equipped with state-of-the-art technology, this coater ensures excellent film quality, uniformity, and thickness control. Its advanced control system allows for precise adjustment of deposition parameters, ensuring reproducibility and accuracy in every experiment or production run.
In addition to its exceptional performance, this coater boasts a user-friendly interface, making it easy to operate and control. Its intuitive design and comprehensive safety features ensure a hassle-free and secure working environment.
Investing in the Dual-target DC Magnetron Sputtering Coater for Multi-layer Ferroelectric Thin Films is a wise choice for professionals seeking a reliable and efficient solution for their thin film deposition needs. With its advanced features, superior performance, and professional-grade construction, this coater is a valuable asset for any laboratory or research facility.
Dual-target DC magnetron sputtering coater technical parameters:
product name | Dual-target DC magnetron sputtering coater |
Sputtering power supply | DC power supply×2 DC power supply：500W |
Vacuum chamber | Chamber size：φ300mm×300mm，Chamber materia：Stainless steel Watch window： φ100mm The cavity opening method adopts top opening, which makes it easier to change the target |
Magnetron Sputtering target head | There are 2 magnetron sputtering heads installed in the instrument, and they are all equipped with a water-cooled interlayer, which can pass in cooling water to cool the target material. The two sputtering heads are connected with a DC power supply, and the main sputtering conductive |
Sample stage | Sample carrier size: 140mm dia. (Maximum 4" substrate can be placed) The sample carrier can be rotated at a speed of: 1-20 rpm (adjustable) The highest heating temperature of the sample carrier is 500℃, and the temperature control accuracy is +/- 1.0 °C |
Gas flow controller | There are 2 mass flow meters installed inside the instrument, the range is: 0-200sccm |
Vacuum pump | Equipped with a set of molecular pump system, using one-button operation 80L/S |
Cooling system | 16L/min. |
Voltage | 220V 50HZ |
The Dual-target DC Magnetron Sputtering Coater for Multi-layer Ferroelectric Thin Films is a highly advanced and efficient solution for the preparation of single-layer or multi-layer ferroelectric thin films, conductive films, and alloy films. This cutting-edge coater utilizes dual-target DC magnetron sputtering technology, ensuring precise and uniform deposition of films.
With its versatile capabilities, this coater is ideal for various applications in the fields of electronics, materials science, and research. Whether you need to create complex multi-layer structures or single-layer films, this coater guarantees exceptional results with its superior performance and reliability.
The dual-target feature allows for simultaneous deposition of different materials, enabling the creation of intricate multi-layer structures with ease. This flexibility opens up a world of possibilities for researchers and scientists, as they can explore and experiment with various material combinations and compositions.
Equipped with state-of-the-art technology, this coater ensures excellent film quality, uniformity, and thickness control. Its advanced control system allows for precise adjustment of deposition parameters, ensuring reproducibility and accuracy in every experiment or production run.
In addition to its exceptional performance, this coater boasts a user-friendly interface, making it easy to operate and control. Its intuitive design and comprehensive safety features ensure a hassle-free and secure working environment.
Investing in the Dual-target DC Magnetron Sputtering Coater for Multi-layer Ferroelectric Thin Films is a wise choice for professionals seeking a reliable and efficient solution for their thin film deposition needs. With its advanced features, superior performance, and professional-grade construction, this coater is a valuable asset for any laboratory or research facility.
Dual-target DC magnetron sputtering coater technical parameters:
product name | Dual-target DC magnetron sputtering coater |
Sputtering power supply | DC power supply×2 DC power supply：500W |
Vacuum chamber | Chamber size：φ300mm×300mm，Chamber materia：Stainless steel Watch window： φ100mm The cavity opening method adopts top opening, which makes it easier to change the target |
Magnetron Sputtering target head | There are 2 magnetron sputtering heads installed in the instrument, and they are all equipped with a water-cooled interlayer, which can pass in cooling water to cool the target material. The two sputtering heads are connected with a DC power supply, and the main sputtering conductive |
Sample stage | Sample carrier size: 140mm dia. (Maximum 4" substrate can be placed) The sample carrier can be rotated at a speed of: 1-20 rpm (adjustable) The highest heating temperature of the sample carrier is 500℃, and the temperature control accuracy is +/- 1.0 °C |
Gas flow controller | There are 2 mass flow meters installed inside the instrument, the range is: 0-200sccm |
Vacuum pump | Equipped with a set of molecular pump system, using one-button operation 80L/S |
Cooling system | 16L/min. |
Voltage | 220V 50HZ |
