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TN-MSP180S-DC-AR
TN
This equipment is a single-target magnetron sputtering coater is equipped with a quartz cavity, which ensures high purity and uniformity of the deposited films. This coater utilizes magnetron sputtering technology, allowing for precise control of film thickness and composition. It is particularly suitable for noble metal coating applications, providing excellent adhesion and durability. With its offset target design, this coater offers enhanced deposition efficiency and reduced material waste. Its user-friendly interface and advanced control system enable easy operation and accurate parameter adjustment. The Offset Target Single Target Magnetron Sputtering Coater with Quartz Cavity is a reliable and efficient solution for various thin film coating needs in research and industrial settings.
magnetron sputtering coater technical parameters：
TN-MSP180S-DC-GU | ||||
Sample stage | Size | Φ60mm | Rotating speed | 0-20 adjustable |
Magnetron sputtering target | Quantity | 2” x1 | ||
Vacuum chamber | Chamber size | Φ180mm x 150mm | Observation window | Omnidirectional visibility |
Chamber material | High purity quartz | Opening method | Top cover removable | |
Lower flange | Including sample table tilt mechanism and rotation mechanism | |||
Vacuum system | Mechanical pump | Two-stage rotary vane pump | Pumping interface | KF16 |
Molecular pump | Turbomolecular pump | Pumping interface | KF40 | |
Vacuum measurement | Resistance gauge + ionization gauge | Exhaust interface | KF40 | |
Ultimate vacuum | 1.0E-3Pa | Power supply | AC 220V 50/60Hz | |
Pumping rate | Backing pump: 1.1L/s Molecular pump: 60L/S | |||
Power configuration | Quantity | DC power supply x1 | Maximum output power | DC power supply 300W |
Other | Supply voltage | AC220V, 50Hz | Dimensions | 500mm x 320mm x620mm |
Total power | 2kW | |||
This equipment is a single-target magnetron sputtering coater is equipped with a quartz cavity, which ensures high purity and uniformity of the deposited films. This coater utilizes magnetron sputtering technology, allowing for precise control of film thickness and composition. It is particularly suitable for noble metal coating applications, providing excellent adhesion and durability. With its offset target design, this coater offers enhanced deposition efficiency and reduced material waste. Its user-friendly interface and advanced control system enable easy operation and accurate parameter adjustment. The Offset Target Single Target Magnetron Sputtering Coater with Quartz Cavity is a reliable and efficient solution for various thin film coating needs in research and industrial settings.
magnetron sputtering coater technical parameters：
TN-MSP180S-DC-GU | ||||
Sample stage | Size | Φ60mm | Rotating speed | 0-20 adjustable |
Magnetron sputtering target | Quantity | 2” x1 | ||
Vacuum chamber | Chamber size | Φ180mm x 150mm | Observation window | Omnidirectional visibility |
Chamber material | High purity quartz | Opening method | Top cover removable | |
Lower flange | Including sample table tilt mechanism and rotation mechanism | |||
Vacuum system | Mechanical pump | Two-stage rotary vane pump | Pumping interface | KF16 |
Molecular pump | Turbomolecular pump | Pumping interface | KF40 | |
Vacuum measurement | Resistance gauge + ionization gauge | Exhaust interface | KF40 | |
Ultimate vacuum | 1.0E-3Pa | Power supply | AC 220V 50/60Hz | |
Pumping rate | Backing pump: 1.1L/s Molecular pump: 60L/S | |||
Power configuration | Quantity | DC power supply x1 | Maximum output power | DC power supply 300W |
Other | Supply voltage | AC220V, 50Hz | Dimensions | 500mm x 320mm x620mm |
Total power | 2kW | |||
