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TN-MSP300S-2DC1RF
TN
Introducing our Three Target Magnetron Sputtering Coater - the perfect solution for all your film preparation needs. This professional-grade coater is designed to deliver exceptional performance and precision, making it an indispensable tool for researchers, scientists, and engineers.
With its advanced technology, our Three Target Magnetron Sputtering Coater enables the preparation of single or multilayer films with ease. Whether you're working on ferroelectric films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, oxide films, hard films, or PTFE films, this coater has got you covered.
Featuring three targets, this coater allows for simultaneous deposition of multiple materials, saving you time and effort. The magnetron sputtering process ensures uniform and controlled film deposition, resulting in high-quality and reproducible results.
Our Three Target Magnetron Sputtering Coater is equipped with state-of-the-art features to enhance your productivity and efficiency. The user-friendly interface and intuitive controls make operation a breeze, even for those new to sputtering technology. Additionally, the coater boasts a robust construction and reliable performance, ensuring long-lasting durability and consistent output.
Invest in our Three Target Magnetron Sputtering Coater today and unlock endless possibilities in film preparation. Experience the power of advanced technology and precision, backed by our commitment to delivering professional-grade equipment. Take your research and development to new heights with our reliable and versatile coater.
Three target magnetron sputtering coater technical paremeters:
Product name | Three-target magnetron sputtering coater---lower position of target gun(English operation interface) |
Product model | TN-MSP300S-2DC1RF |
Sputtering power supply | Installed two DC power supply and one RF power supply DC power: 500W RF power: 300W |
Vacuum chamber | Vacuum chamber: 450 mm Diameter x 450 mm height，stainless steel observation window: 100 mm diameter |
Magnetron sputtering head | The instrument is equipped with three 3-inch target magnetron sputtering target guns(one of which is a strong magnetic target and two permanent magnet targets ),and all have water-cooled interlayer, which can be cooled by cooling water to target material |
The sample table | The sample table size：150mm dia.(the sample table can rotate, with adjustable speed range:1-20rpm) The maximum heating temperature of the sample table is 750℃, and the temperature control accuracy is +/- 1.0 °C |
Gas flow controller | A mass flow meter is installed inside the instrument Range :0-200sccm (argon) Gas flow can be set in 15.6 inch screen intelligent control system |
Vacuum pump | Equipped with a set of molecular pump system, using one-clickoperation600L/S |
Vacuum gauge | EF Kompirani vacuum gauge MPG400 Measurement range: 5 x 10-9 mbar -- Atmospheric pressure |
Film thickness gauge | The quartz vibration film thickness gauge is mounted on the equipment and can monitor the film thickness in real time with a resolution of 0.1A. |
Voltage | 220V 50HZ |
Notes | 1.three 3-inch sputtering target (one strong magnetic target and two permanent magnetic targets) 2.one flow meter 3.stainless steel vacuum chamber 4.molecular pump group 5.film thickness gauge 6.two DC power supply and one RF power supply 7.water chilling unit 8.with rotary heating sample table 9.15.6 inch screen intelligent control system 10.air compressor 11.electrically controlled pneumatic gate valve 12.electrically controlled cut-off valve 13.electrically controlled pneumatic side pumping valve 14. EF kang vacuum gauge MPG 400 measuring range |
Introducing our Three Target Magnetron Sputtering Coater - the perfect solution for all your film preparation needs. This professional-grade coater is designed to deliver exceptional performance and precision, making it an indispensable tool for researchers, scientists, and engineers.
With its advanced technology, our Three Target Magnetron Sputtering Coater enables the preparation of single or multilayer films with ease. Whether you're working on ferroelectric films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, oxide films, hard films, or PTFE films, this coater has got you covered.
Featuring three targets, this coater allows for simultaneous deposition of multiple materials, saving you time and effort. The magnetron sputtering process ensures uniform and controlled film deposition, resulting in high-quality and reproducible results.
Our Three Target Magnetron Sputtering Coater is equipped with state-of-the-art features to enhance your productivity and efficiency. The user-friendly interface and intuitive controls make operation a breeze, even for those new to sputtering technology. Additionally, the coater boasts a robust construction and reliable performance, ensuring long-lasting durability and consistent output.
Invest in our Three Target Magnetron Sputtering Coater today and unlock endless possibilities in film preparation. Experience the power of advanced technology and precision, backed by our commitment to delivering professional-grade equipment. Take your research and development to new heights with our reliable and versatile coater.
Three target magnetron sputtering coater technical paremeters:
Product name | Three-target magnetron sputtering coater---lower position of target gun(English operation interface) |
Product model | TN-MSP300S-2DC1RF |
Sputtering power supply | Installed two DC power supply and one RF power supply DC power: 500W RF power: 300W |
Vacuum chamber | Vacuum chamber: 450 mm Diameter x 450 mm height，stainless steel observation window: 100 mm diameter |
Magnetron sputtering head | The instrument is equipped with three 3-inch target magnetron sputtering target guns(one of which is a strong magnetic target and two permanent magnet targets ),and all have water-cooled interlayer, which can be cooled by cooling water to target material |
The sample table | The sample table size：150mm dia.(the sample table can rotate, with adjustable speed range:1-20rpm) The maximum heating temperature of the sample table is 750℃, and the temperature control accuracy is +/- 1.0 °C |
Gas flow controller | A mass flow meter is installed inside the instrument Range :0-200sccm (argon) Gas flow can be set in 15.6 inch screen intelligent control system |
Vacuum pump | Equipped with a set of molecular pump system, using one-clickoperation600L/S |
Vacuum gauge | EF Kompirani vacuum gauge MPG400 Measurement range: 5 x 10-9 mbar -- Atmospheric pressure |
Film thickness gauge | The quartz vibration film thickness gauge is mounted on the equipment and can monitor the film thickness in real time with a resolution of 0.1A. |
Voltage | 220V 50HZ |
Notes | 1.three 3-inch sputtering target (one strong magnetic target and two permanent magnetic targets) 2.one flow meter 3.stainless steel vacuum chamber 4.molecular pump group 5.film thickness gauge 6.two DC power supply and one RF power supply 7.water chilling unit 8.with rotary heating sample table 9.15.6 inch screen intelligent control system 10.air compressor 11.electrically controlled pneumatic gate valve 12.electrically controlled cut-off valve 13.electrically controlled pneumatic side pumping valve 14. EF kang vacuum gauge MPG 400 measuring range |
