The three-target magnetron sputtering coater with a vibrating sample stage for optical film

The three-target magnetron sputtering coater with vibrating sample table is a special coater for processing powder and particle samples in the laboratory with three target sites developed by our company. The equipment is equipped with two DC power sources and one RF power source, which can be used to prepare single or multi-layer ferroelectric film, conductive film, alloy film, semiconductor film, ceramic film, dielectric film, optical film, etc.

Compared with ordinary plasma sputtering, magnetron sputtering has the advantages of high energy and fast speed, high coating rate and low sample temperature rise. It is a typical high-speed and low temperature sputtering. The magnetron target is equipped with a water-cooled

interlayer, and the water cooler can effectively take away heat to avoid heat accumulation on the target surface, so that the magnetron coating can work stably for a long time.

The equipment is equipped with a vibration sample table with frequency conversion vibration, which can be placed on the powder or particles irregularly flip to ensure that the surface of all particles can be coated with the coating during the coating process, to avoid the  situation of uneven coating. It is a PVD equipment designed for granular samples.

magnetron sputtering coater Technical Parameters: