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Dual-target DC Magnetron Sputtering Coater for Alloy Films

Dual-target DC magnetron sputtering coater can be used for preparing single-layer or multi-layer ferroelectric thin films, conductive films, alloy films, and the like. Compared with similar equipment, the dual-target magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation, and is an ideal equipment for preparing material films in a laboratory
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  • TN-MSP500S-2DC

  • TN

Introducing our Dual-target DC Magnetron Sputtering Coater for Alloy Films - the ultimate solution for all your thin film coating needs. Designed with precision and efficiency in mind, this cutting-edge coater is perfect for preparing single-layer or multi-layer ferroelectric thin films, conductive films, and alloy films.


With its dual-target DC magnetron sputtering technology, this coater ensures exceptional coating uniformity and deposition control, allowing you to achieve the desired film properties with utmost accuracy. Whether you require uniform thickness, high adhesion, or superior conductivity, our coater delivers outstanding results every time.


Equipped with advanced features, this coater offers unparalleled versatility. Its dual-target configuration allows for simultaneous deposition of different materials, enabling the creation of complex alloy films with tailored properties. This flexibility opens up endless possibilities for research and development in various fields, including electronics, optics, and material science.


Our Dual-target DC Magnetron Sputtering Coater boasts a user-friendly interface, making it easy to operate even for those new to thin film deposition. The intuitive control panel allows for precise adjustment of parameters such as deposition rate, substrate temperature, and gas flow, ensuring optimal coating conditions for your specific applications.

Dual-target DC magnetron sputtering coater technical parameters:

product name

Dual-target DC magnetron sputtering coater

Sputtering   power supply

DC power supply×2 DC power   supply:500W

Vacuum chamber

Chamber size:φ300mm×300mm,Chamber materia:Stainless steel

Watch window: φ100mm

The   cavity opening method adopts top opening, which makes it easier to change the   target

Magnetron Sputtering   target head

There are 2 magnetron sputtering heads installed   in the instrument, and they are all equipped with a water-cooled interlayer,   which can pass in cooling water to cool the target material. The two   sputtering heads are connected with a DC power supply, and the main   sputtering conductive

Sample stage

Sample   carrier size: 140mm dia. (Maximum 4" substrate can be placed) The sample   carrier can be rotated at a speed of: 1-20 rpm (adjustable) The highest   heating temperature of the sample carrier is 500℃, and the temperature   control accuracy is +/- 1.0 °C

Gas flow controller

There   are 2 mass flow meters installed inside the instrument, the range is:   0-200sccm

Vacuum pump

Equipped   with a set of molecular pump system, using one-button operation 80L/S

Cooling system

16L/min.

Voltage

220V 50HZ


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Zhengzhou Tainuo Thin Film Materials Co., Ltd.
Which is a manufacturer specializing in the production of laboratory scientific instruments. Our products are widely used in colleges, research institutions and laboratories.

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