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TN-MSP500S-2DC
TN
Introducing our Dual-target DC Magnetron Sputtering Coater for Alloy Films - the ultimate solution for all your thin film coating needs. Designed with precision and efficiency in mind, this cutting-edge coater is perfect for preparing single-layer or multi-layer ferroelectric thin films, conductive films, and alloy films.
With its dual-target DC magnetron sputtering technology, this coater ensures exceptional coating uniformity and deposition control, allowing you to achieve the desired film properties with utmost accuracy. Whether you require uniform thickness, high adhesion, or superior conductivity, our coater delivers outstanding results every time.
Equipped with advanced features, this coater offers unparalleled versatility. Its dual-target configuration allows for simultaneous deposition of different materials, enabling the creation of complex alloy films with tailored properties. This flexibility opens up endless possibilities for research and development in various fields, including electronics, optics, and material science.
Our Dual-target DC Magnetron Sputtering Coater boasts a user-friendly interface, making it easy to operate even for those new to thin film deposition. The intuitive control panel allows for precise adjustment of parameters such as deposition rate, substrate temperature, and gas flow, ensuring optimal coating conditions for your specific applications.
Dual-target DC magnetron sputtering coater technical parameters:
product name | Dual-target DC magnetron sputtering coater |
Sputtering power supply | DC power supply×2 DC power supply：500W |
Vacuum chamber | Chamber size：φ300mm×300mm，Chamber materia：Stainless steel Watch window： φ100mm The cavity opening method adopts top opening, which makes it easier to change the target |
Magnetron Sputtering target head | There are 2 magnetron sputtering heads installed in the instrument, and they are all equipped with a water-cooled interlayer, which can pass in cooling water to cool the target material. The two sputtering heads are connected with a DC power supply, and the main sputtering conductive |
Sample stage | Sample carrier size: 140mm dia. (Maximum 4" substrate can be placed) The sample carrier can be rotated at a speed of: 1-20 rpm (adjustable) The highest heating temperature of the sample carrier is 500℃, and the temperature control accuracy is +/- 1.0 °C |
Gas flow controller | There are 2 mass flow meters installed inside the instrument, the range is: 0-200sccm |
Vacuum pump | Equipped with a set of molecular pump system, using one-button operation 80L/S |
Cooling system | 16L/min. |
Voltage | 220V 50HZ |
Introducing our Dual-target DC Magnetron Sputtering Coater for Alloy Films - the ultimate solution for all your thin film coating needs. Designed with precision and efficiency in mind, this cutting-edge coater is perfect for preparing single-layer or multi-layer ferroelectric thin films, conductive films, and alloy films.
With its dual-target DC magnetron sputtering technology, this coater ensures exceptional coating uniformity and deposition control, allowing you to achieve the desired film properties with utmost accuracy. Whether you require uniform thickness, high adhesion, or superior conductivity, our coater delivers outstanding results every time.
Equipped with advanced features, this coater offers unparalleled versatility. Its dual-target configuration allows for simultaneous deposition of different materials, enabling the creation of complex alloy films with tailored properties. This flexibility opens up endless possibilities for research and development in various fields, including electronics, optics, and material science.
Our Dual-target DC Magnetron Sputtering Coater boasts a user-friendly interface, making it easy to operate even for those new to thin film deposition. The intuitive control panel allows for precise adjustment of parameters such as deposition rate, substrate temperature, and gas flow, ensuring optimal coating conditions for your specific applications.
Dual-target DC magnetron sputtering coater technical parameters:
product name | Dual-target DC magnetron sputtering coater |
Sputtering power supply | DC power supply×2 DC power supply：500W |
Vacuum chamber | Chamber size：φ300mm×300mm，Chamber materia：Stainless steel Watch window： φ100mm The cavity opening method adopts top opening, which makes it easier to change the target |
Magnetron Sputtering target head | There are 2 magnetron sputtering heads installed in the instrument, and they are all equipped with a water-cooled interlayer, which can pass in cooling water to cool the target material. The two sputtering heads are connected with a DC power supply, and the main sputtering conductive |
Sample stage | Sample carrier size: 140mm dia. (Maximum 4" substrate can be placed) The sample carrier can be rotated at a speed of: 1-20 rpm (adjustable) The highest heating temperature of the sample carrier is 500℃, and the temperature control accuracy is +/- 1.0 °C |
Gas flow controller | There are 2 mass flow meters installed inside the instrument, the range is: 0-200sccm |
Vacuum pump | Equipped with a set of molecular pump system, using one-button operation 80L/S |
Cooling system | 16L/min. |
Voltage | 220V 50HZ |
