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TN-MSP500S-2DC
TN
Dual-target DC magnetron sputtering coater is equipped with a film thickness gauge table specifically designed for semiconductor applications. This desktop coater offers precise and efficient sputtering capabilities, making it an ideal choice for research and development laboratories in the semiconductor industry.
The dual-target DC magnetron sputtering coater is designed to meet the demanding requirements of semiconductor film deposition. It enables the preparation of high-quality single-layer or multi-layer films with excellent uniformity and adhesion. This coater is capable of depositing ferroelectric thin films, conductive films, alloy films, and composite films, providing researchers with a versatile tool for their material synthesis and characterization needs.
Equipped with a film thickness gauge table, this coater allows for accurate monitoring and control of film thickness during the deposition process. This is particularly crucial in semiconductor applications, where precise film thickness is essential for device performance. The gauge table enables researchers to achieve the desired film thickness with high precision and repeatability, ensuring consistent results and facilitating the optimization of film properties.
The desktop design of this coater makes it compact and space-saving, making it suitable for laboratories with limited space. Despite its small footprint, it offers powerful sputtering capabilities, thanks to the dual-target DC magnetron configuration. This allows for efficient and uniform deposition of films, resulting in high-quality coatings with excellent electrical and optical properties.
With its professional and reliable performance, the desktop dual-target DC magnetron sputtering coater with film thickness gauge table is an indispensable tool for semiconductor research and development. It empowers researchers to explore new materials, optimize film properties, and advance the development of cutting-edge semiconductor devices.
Dual-target DC magnetron sputtering coater technical parameters:
product name | Dual-target magnetron sputtering coater |
Sputtering power supply | power supply×2 power supply：500W |
Vacuum chamber | Chamber size：φ300mm×300mm，Chamber materia：Stainless steel Watch window： φ100mm The cavity opening method adopts top opening, which makes it easier to change the target |
Magnetron Sputtering target head | There are 2 magnetron sputtering heads installed in the instrument, and they are all equipped with a water-cooled interlayer, which can pass in cooling water to cool the target material. The two sputtering heads are connected with a DC power supply, and the main sputtering conductive |
Sample stage | Sample carrier size: 140mm dia. (Maximum 4" substrate can be placed) The sample carrier can be rotated at a speed of: 1-20 rpm (adjustable) The highest heating temperature of the sample carrier is 500℃, and the temperature control accuracy is +/- 1.0 °C |
Gas flow controller | There are 2 mass flow meters installed inside the instrument, the range is: 0-200sccm |
Vacuum pump | Equipped with a set of molecular pump system, using one-button operation 80L/S |
Cooling system | 16L/min. |
Voltage | 220V 50HZ |
Dual-target DC magnetron sputtering coater is equipped with a film thickness gauge table specifically designed for semiconductor applications. This desktop coater offers precise and efficient sputtering capabilities, making it an ideal choice for research and development laboratories in the semiconductor industry.
The dual-target DC magnetron sputtering coater is designed to meet the demanding requirements of semiconductor film deposition. It enables the preparation of high-quality single-layer or multi-layer films with excellent uniformity and adhesion. This coater is capable of depositing ferroelectric thin films, conductive films, alloy films, and composite films, providing researchers with a versatile tool for their material synthesis and characterization needs.
Equipped with a film thickness gauge table, this coater allows for accurate monitoring and control of film thickness during the deposition process. This is particularly crucial in semiconductor applications, where precise film thickness is essential for device performance. The gauge table enables researchers to achieve the desired film thickness with high precision and repeatability, ensuring consistent results and facilitating the optimization of film properties.
The desktop design of this coater makes it compact and space-saving, making it suitable for laboratories with limited space. Despite its small footprint, it offers powerful sputtering capabilities, thanks to the dual-target DC magnetron configuration. This allows for efficient and uniform deposition of films, resulting in high-quality coatings with excellent electrical and optical properties.
With its professional and reliable performance, the desktop dual-target DC magnetron sputtering coater with film thickness gauge table is an indispensable tool for semiconductor research and development. It empowers researchers to explore new materials, optimize film properties, and advance the development of cutting-edge semiconductor devices.
Dual-target DC magnetron sputtering coater technical parameters:
product name | Dual-target magnetron sputtering coater |
Sputtering power supply | power supply×2 power supply：500W |
Vacuum chamber | Chamber size：φ300mm×300mm，Chamber materia：Stainless steel Watch window： φ100mm The cavity opening method adopts top opening, which makes it easier to change the target |
Magnetron Sputtering target head | There are 2 magnetron sputtering heads installed in the instrument, and they are all equipped with a water-cooled interlayer, which can pass in cooling water to cool the target material. The two sputtering heads are connected with a DC power supply, and the main sputtering conductive |
Sample stage | Sample carrier size: 140mm dia. (Maximum 4" substrate can be placed) The sample carrier can be rotated at a speed of: 1-20 rpm (adjustable) The highest heating temperature of the sample carrier is 500℃, and the temperature control accuracy is +/- 1.0 °C |
Gas flow controller | There are 2 mass flow meters installed inside the instrument, the range is: 0-200sccm |
Vacuum pump | Equipped with a set of molecular pump system, using one-button operation 80L/S |
Cooling system | 16L/min. |
Voltage | 220V 50HZ |
