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Dual Target Magnetron Sputtering Caoter with Reciprocating Sample Stage for Graphite on Copper Foil And Aliminium Foil

laboratory-specific magnetron sputtering coater with two target positions developed by our company. The equipment is equipped with a DC power supply and a radio frequency power supply, which can be used to prepare single or multilayer iron Electrical film, conductive film, alloy film, semiconductor film, ceramic film, dielectric film, optical film, etc.
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TN-MSP500S-DCRF-RE is a laboratory-specific magnetron sputtering coater with two target positions developed by our company. The equipment is equipped with a DC power supply and a radio frequency power supply, which can be used to prepare single or multilayer iron Electrical film, conductive film, alloy film, semiconductor film, ceramic film, dielectric film, optical film, etc.

Features:

a.      Compared with ordinary plasma sputtering, magnetron sputtering has the advantages of high energy and speed, high coating rate, low sample temperature rise, and is a typical high-speed low-temperature sputtering.

b.      The magnetron sputter target is equipped with a water-cooled interlayer. The water-cooled machine can effectively take away the heat and avoid the heat accumulation on the target surface, so that the magnetron sputter can work stably for a long time.

c.       The sample stage adopts a reciprocating design, and the left side is equipped with a magnetic coupling push rod, which can push the sample stage left and right.

d.      The whole machine adopts touch screen control, built-in one-button coating program, easy to operate, it is an ideal equipment for laboratory preparation of films

Technical parameter:

Model

TN-MSP500S-DCRF-RE

Input

AC220V,50Hz

Total power

6KW

Ultimate vacuum degree

5x10-4Pa

Sample table parameters

Size

100mm x 100mm

Reciprocating stroke

200mm

Magnetron sputtering head parameters

Quantity

2-set,2-inch

Cooling mode

Water cooled,required   flow rate10L/min

Water chiller

10L/min circulating water cooling

Vacuum chamber

Size

φ500mm X 490mm H

Material

Stainless steel

Watch window

φ100mm

Open mode

front opening door

Gas flow controller

1channel 200sccm Ar;

Vacuum pump

Molecular pump system pumping600L/S

Film thickness gauge

Quartz vibrating film   thickness gauge ,one set,Resolution   0.10 Å

Sputter power supply

DC power supply:one   set,500W,for preparing metal   films

RF power supply:one   set,500W,for non - metallic   coating

Operating mode

All-in-one computer operation

Overall dimensions

1090mm X 900mm X 1250mm

Total weight

350kg



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Zhengzhou Tainuo Thin Film Materials Co., Ltd.
Which is a manufacturer specializing in the production of laboratory scientific instruments. Our products are widely used in colleges, research institutions and laboratories.

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