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TN-VTC-3DC
TN
TN-VTC-3DC is a three head 2" RF Plasma magnetron sputtering system designed for non-metallic thin film coating, mainly for multilayer oxide thin films. It is the most cost-effective coater for researching in the new generation of oxide thin films. DC magnetron sputtering option is available upon request for metallic film deposition, enabling three DC, one RF / two DC, and two RF / one DC sputtering head configurations.
This device can be used for preparing single-layer or multi-layer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, oxide films, hard films, PTFE films, and the like. Compared with similar equipment, this three-target magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation, and is an ideal equipment for preparing material films in a laboratory
RF Plasma magnetron sputtering system Technical Parameters：
Input Power | ·Single phase 110 VAC, 50 / 60 Hz |
Magnetron Sputtering Head | ·Three 2" magnetron sputtering heads with water cooling jackets are included and inserted into quartz chamber via quick clamps |
Sputtering Target | ·Target size requirement: 2" diameter x 1/8" thickness max |
Vacuum Chamber | ·Vacuum chamber: 300 mm OD x 500 mm Height, made of stainless steel |
Sample Holder | ·Sample holder is a rotatable and heatable stage made of ceramic heater with stainless steel cover |
Vacuum Pump | ·KF40 vacuum port is built in for connecting to a vacuum pump. |
Size | 540 mm L x 540 mm W x 1000 mm H |
Packing Weight | About 145 kg |
Warranty | One years limited warranty with lifetime support |
Whether to support customization | yes |
TN-VTC-3DC is a three head 2" RF Plasma magnetron sputtering system designed for non-metallic thin film coating, mainly for multilayer oxide thin films. It is the most cost-effective coater for researching in the new generation of oxide thin films. DC magnetron sputtering option is available upon request for metallic film deposition, enabling three DC, one RF / two DC, and two RF / one DC sputtering head configurations.
This device can be used for preparing single-layer or multi-layer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, oxide films, hard films, PTFE films, and the like. Compared with similar equipment, this three-target magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation, and is an ideal equipment for preparing material films in a laboratory
RF Plasma magnetron sputtering system Technical Parameters：
Input Power | ·Single phase 110 VAC, 50 / 60 Hz |
Magnetron Sputtering Head | ·Three 2" magnetron sputtering heads with water cooling jackets are included and inserted into quartz chamber via quick clamps |
Sputtering Target | ·Target size requirement: 2" diameter x 1/8" thickness max |
Vacuum Chamber | ·Vacuum chamber: 300 mm OD x 500 mm Height, made of stainless steel |
Sample Holder | ·Sample holder is a rotatable and heatable stage made of ceramic heater with stainless steel cover |
Vacuum Pump | ·KF40 vacuum port is built in for connecting to a vacuum pump. |
Size | 540 mm L x 540 mm W x 1000 mm H |
Packing Weight | About 145 kg |
Warranty | One years limited warranty with lifetime support |
Whether to support customization | yes |
