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TN-MSP300S-DCRF
TN
The Desktop Single Target Magnetron Sputtering Coater with Reciprocating Sample Table is a highly efficient and versatile tool for coating single-layer or multi-layer ferroelectric thin films, conductive films, and alloy films.
This professional-grade coater is designed to deliver exceptional performance and precision in a compact desktop size. With its advanced magnetron sputtering technology, it offers a reliable and efficient method for depositing thin films onto a variety of substrates.
The reciprocating sample table ensures uniform coating distribution and allows for precise control over the deposition process. This feature is particularly useful when coating single samples, as it guarantees consistent results across the entire surface.
Whether you are conducting research, developing new materials, or manufacturing electronic devices, this desktop coater is an essential tool for your laboratory or production facility. Its user-friendly interface and intuitive controls make it easy to operate, while its robust construction ensures long-lasting performance.
Invest in the Desktop Single Target Magnetron Sputtering Coater with Reciprocating Sample Table and experience the benefits of high-quality thin film coatings. Achieve superior film adhesion, excellent uniformity, and precise control over film thickness. Take your coating capabilities to the next level with this professional-grade magnetron sputtering coater.
Technical parameters of single target magnetron sputtering coater:
Reciprocating sample table | size | 50*100mm | |
Reciprocating speed | 0~50mm/s | ||
Magnetron target gun | Target plane | Circular flat target | |
Sputtering vacuum | 10Pa～0.2Pa | ||
Target diameter | 2 inches | ||
Target thickness | Recommended 2 ～ 5mm | ||
Target temperature | ≦65℃ | ||
Vacuum chamber | Cavity size | About Φ180mm × H 215mm | |
Cavity material | High purity quartz | ||
Observation window | Omnidirectional transparency | ||
Opening method | Removable top cover | ||
power supply | DC power supply | 150W max | |
Quantity | 1 | ||
Molecular pump system | Foreline pump | Rotary vane pump | VRD-4 |
Pumping speed | 1.1L/S | ||
Ultimate vacuum | 5*10-1Pa | ||
Molecular pump | Molecular pumping speed | 600L/S | |
Rated speed | 24000rpm | ||
Ultimate vacuum | 5*10-5Pa | ||
Vibration value | ≦0.1um | ||
Start Time | ≦4.5min | ||
Downtime | <7min | ||
cooling method | Water cooling + air cooling | ||
Water cooler | Cooling water temperature | ≦37℃ | |
Cooling water flow rate | 10L/min | ||
Supply voltage | AC220V 50Hz | ||
The Desktop Single Target Magnetron Sputtering Coater with Reciprocating Sample Table is a highly efficient and versatile tool for coating single-layer or multi-layer ferroelectric thin films, conductive films, and alloy films.
This professional-grade coater is designed to deliver exceptional performance and precision in a compact desktop size. With its advanced magnetron sputtering technology, it offers a reliable and efficient method for depositing thin films onto a variety of substrates.
The reciprocating sample table ensures uniform coating distribution and allows for precise control over the deposition process. This feature is particularly useful when coating single samples, as it guarantees consistent results across the entire surface.
Whether you are conducting research, developing new materials, or manufacturing electronic devices, this desktop coater is an essential tool for your laboratory or production facility. Its user-friendly interface and intuitive controls make it easy to operate, while its robust construction ensures long-lasting performance.
Invest in the Desktop Single Target Magnetron Sputtering Coater with Reciprocating Sample Table and experience the benefits of high-quality thin film coatings. Achieve superior film adhesion, excellent uniformity, and precise control over film thickness. Take your coating capabilities to the next level with this professional-grade magnetron sputtering coater.
Technical parameters of single target magnetron sputtering coater:
Reciprocating sample table | size | 50*100mm | |
Reciprocating speed | 0~50mm/s | ||
Magnetron target gun | Target plane | Circular flat target | |
Sputtering vacuum | 10Pa～0.2Pa | ||
Target diameter | 2 inches | ||
Target thickness | Recommended 2 ～ 5mm | ||
Target temperature | ≦65℃ | ||
Vacuum chamber | Cavity size | About Φ180mm × H 215mm | |
Cavity material | High purity quartz | ||
Observation window | Omnidirectional transparency | ||
Opening method | Removable top cover | ||
power supply | DC power supply | 150W max | |
Quantity | 1 | ||
Molecular pump system | Foreline pump | Rotary vane pump | VRD-4 |
Pumping speed | 1.1L/S | ||
Ultimate vacuum | 5*10-1Pa | ||
Molecular pump | Molecular pumping speed | 600L/S | |
Rated speed | 24000rpm | ||
Ultimate vacuum | 5*10-5Pa | ||
Vibration value | ≦0.1um | ||
Start Time | ≦4.5min | ||
Downtime | <7min | ||
cooling method | Water cooling + air cooling | ||
Water cooler | Cooling water temperature | ≦37℃ | |
Cooling water flow rate | 10L/min | ||
Supply voltage | AC220V 50Hz | ||
