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TN-MSP180G-1T-A
TN
This equipment is a desktop single target magnetron sputtering coater is specifically designed for use with scanning microscopes.
This magnetron sputtering coater is equipped with a quartz cavity, which ensures high uniformity and stability during the coating process. The quartz cavity also provides excellent visibility, allowing users to closely monitor the deposition process.
With its desktop size, this coater is perfect for laboratories and research facilities with limited space. Its compact design does not compromise its performance, as it is capable of achieving high-quality thin films with precise control over film thickness and composition.
The single target configuration allows for easy target replacement and enables the deposition of different materials without the need for complex setup procedures. This makes the coater highly versatile and suitable for a wide range of applications.
The magnetron sputtering technique employed by this coater ensures efficient and uniform deposition, resulting in films with excellent adhesion and high density. The adjustable power supply allows for precise control of the sputtering process, ensuring optimal film properties.
In addition, this coater is equipped with advanced safety features, including overcurrent protection and an interlock system, ensuring the safety of both the user and the equipment.
Overall, the desktop single target magnetron sputtering coater with quartz cavity for scanning microscope is a reliable and efficient tool for researchers and scientists in the field of thin film deposition. Its compact size, versatile capabilities, and advanced features make it an ideal choice for various applications in materials science, nanotechnology, and surface engineering.
Product Name | Desktop single-target magnetron sputtering coater |
Product Model | TN-MSP180G-1T-A |
Installation Condition | 1、Working environment temperature: 25℃±15℃，humidity: 55%Rh±10%Rh； 2、Equipment power supply：AC220V，50Hz， must be well grounded； 3、Rated power：1000w； 4、Equipment for gas：The equipment chamber should be filled with argon gas for cleaning. The customer should prepare argon gas with purity ≥99.99%. 5、Table size requirements: 600mm×600mm×700mm，bearing capacity ≥ 50kg； 6、The position should be well ventilated and cooled. |
Technical Indicators | 1、 Sputtering power supply：DC power supply 300W；maximum output voltage 600V，limited current output 500mA 2、 Magnetron target：2 inch balance target，magnetic coupling baffle； 3、 Suitable target material： φ50mm x 3mm in thickness 4、 Cavity size ：φ180mm x 200mm 5、 Cavity material： high purity quartz 6、 Rotating heating sample table：rotate speed 1~20rpm continuously adjustable；maximum heating temperature 500℃，the lowest recommended heating rate 10℃/min，the highest recommended heating rate 20℃/min. 7、 Cooling mode ：magnetic target and molecular pump require circulating water cooler 8、 Water-cooling machine：the tank volume 9L，flow rate 10L/min 9、 Gas supply system：mass flow meter， type of gas Argon，flow 1~30sccm（customizable） 10、 Accuracy of flow meter ：±1.5% measuring range 11、 The air pumping interface of the vacuum chamber is KF25 12、 Air intake interface is 1/4 inch double ferrule joint 13、 Touch screen is 7inch color touch screen 14、 Adjustable sputtering current，sputtering safety current value and safety vacuum value can be set； 15、 safety protection: over current, vacuum is too low automatically cut off the sputtering current 16、 Ultimate vacuum：5E-4Pa(matching molecular pump)； 17、 Vacuum measurement is Parana vacuum gauge ，the range is：1～105Pa |
Notice | 1、Magnetron sputtering has a high working vacuum, generally within 2Pa, and needs to be used with molecular pump. 2、In order to achieve a high oxygen free environment, the vacuum chamber should be cleaned at least 3 times with high purity inert gas。 3、Magnetron sputtering is sensitive to the air intake, so mass flow meter is needed to control the air intake |
Optional accessory | |
Film thickness Monitor | 1、Film thickness resolution：0.0136Å（aluminum） 2、Accuracy of film thickness ：±0.5%，it depends on process conditions, especially sensor position, material stress, temperature and density 3、Measuring speed：100ms-1s/times，measurement range can be set ：500000Å（aluminum） 4、Standard sensor crystal：6MHz 5、Suitable for wafer frequency：6MHz suitable for wafer size：Φ14mm mounting flange：CF35 |
Another Accessory | · 1、CY-CZK103 series high performance molecular pump set(including composite vacuum gauge, measuring range 10-5Pa~105Pa) CY-GZK60 series small molecular pump set(including composite vacuum gauge, measuring range 10-5Pa~102Pa) VRD-4 bipolar rotary vane vacuum pump 2、KF25 Vacuum bellows; The length can be 0.5m, 1m or 1.5m. KF25 clamp bracket 3、Film thickness meter crystal oscillator; 4、Stainless steel fine-tuning valve (only suitable for low coating requirements) |
This equipment is a desktop single target magnetron sputtering coater is specifically designed for use with scanning microscopes.
This magnetron sputtering coater is equipped with a quartz cavity, which ensures high uniformity and stability during the coating process. The quartz cavity also provides excellent visibility, allowing users to closely monitor the deposition process.
With its desktop size, this coater is perfect for laboratories and research facilities with limited space. Its compact design does not compromise its performance, as it is capable of achieving high-quality thin films with precise control over film thickness and composition.
The single target configuration allows for easy target replacement and enables the deposition of different materials without the need for complex setup procedures. This makes the coater highly versatile and suitable for a wide range of applications.
The magnetron sputtering technique employed by this coater ensures efficient and uniform deposition, resulting in films with excellent adhesion and high density. The adjustable power supply allows for precise control of the sputtering process, ensuring optimal film properties.
In addition, this coater is equipped with advanced safety features, including overcurrent protection and an interlock system, ensuring the safety of both the user and the equipment.
Overall, the desktop single target magnetron sputtering coater with quartz cavity for scanning microscope is a reliable and efficient tool for researchers and scientists in the field of thin film deposition. Its compact size, versatile capabilities, and advanced features make it an ideal choice for various applications in materials science, nanotechnology, and surface engineering.
Product Name | Desktop single-target magnetron sputtering coater |
Product Model | TN-MSP180G-1T-A |
Installation Condition | 1、Working environment temperature: 25℃±15℃，humidity: 55%Rh±10%Rh； 2、Equipment power supply：AC220V，50Hz， must be well grounded； 3、Rated power：1000w； 4、Equipment for gas：The equipment chamber should be filled with argon gas for cleaning. The customer should prepare argon gas with purity ≥99.99%. 5、Table size requirements: 600mm×600mm×700mm，bearing capacity ≥ 50kg； 6、The position should be well ventilated and cooled. |
Technical Indicators | 1、 Sputtering power supply：DC power supply 300W；maximum output voltage 600V，limited current output 500mA 2、 Magnetron target：2 inch balance target，magnetic coupling baffle； 3、 Suitable target material： φ50mm x 3mm in thickness 4、 Cavity size ：φ180mm x 200mm 5、 Cavity material： high purity quartz 6、 Rotating heating sample table：rotate speed 1~20rpm continuously adjustable；maximum heating temperature 500℃，the lowest recommended heating rate 10℃/min，the highest recommended heating rate 20℃/min. 7、 Cooling mode ：magnetic target and molecular pump require circulating water cooler 8、 Water-cooling machine：the tank volume 9L，flow rate 10L/min 9、 Gas supply system：mass flow meter， type of gas Argon，flow 1~30sccm（customizable） 10、 Accuracy of flow meter ：±1.5% measuring range 11、 The air pumping interface of the vacuum chamber is KF25 12、 Air intake interface is 1/4 inch double ferrule joint 13、 Touch screen is 7inch color touch screen 14、 Adjustable sputtering current，sputtering safety current value and safety vacuum value can be set； 15、 safety protection: over current, vacuum is too low automatically cut off the sputtering current 16、 Ultimate vacuum：5E-4Pa(matching molecular pump)； 17、 Vacuum measurement is Parana vacuum gauge ，the range is：1～105Pa |
Notice | 1、Magnetron sputtering has a high working vacuum, generally within 2Pa, and needs to be used with molecular pump. 2、In order to achieve a high oxygen free environment, the vacuum chamber should be cleaned at least 3 times with high purity inert gas。 3、Magnetron sputtering is sensitive to the air intake, so mass flow meter is needed to control the air intake |
Optional accessory | |
Film thickness Monitor | 1、Film thickness resolution：0.0136Å（aluminum） 2、Accuracy of film thickness ：±0.5%，it depends on process conditions, especially sensor position, material stress, temperature and density 3、Measuring speed：100ms-1s/times，measurement range can be set ：500000Å（aluminum） 4、Standard sensor crystal：6MHz 5、Suitable for wafer frequency：6MHz suitable for wafer size：Φ14mm mounting flange：CF35 |
Another Accessory | · 1、CY-CZK103 series high performance molecular pump set(including composite vacuum gauge, measuring range 10-5Pa~105Pa) CY-GZK60 series small molecular pump set(including composite vacuum gauge, measuring range 10-5Pa~102Pa) VRD-4 bipolar rotary vane vacuum pump 2、KF25 Vacuum bellows; The length can be 0.5m, 1m or 1.5m. KF25 clamp bracket 3、Film thickness meter crystal oscillator; 4、Stainless steel fine-tuning valve (only suitable for low coating requirements) |
