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TN-MSP180G-1T-B
TN
Product introduction：This equipment is a single-target magnetron sputtering coater instrument, which can be used for the preparation of general metal thin films. At the same time, the equipment is equipped with a bias power supply, which can be used for plasma cleaning before sputtering and exerting bias during sputtering.
This single-target magnetron sputtering coater is equipped with high vacuum stainless steel cavity, the cavity is set with a quartz observation window baffle, which is easy to observe and record the experiment; The cavity design with excellent vacuum performance and small shape makes it very suitable for laboratory use. At the same time, the equipment is equipped with a rotating heating sample table, which can effectively improve the film uniformity and film quality. The machine adopts modular design, simple operation logic, intuitive operation interface, easy to get started.
Desktop single target magnetron sputtering coater Technical Parameters:
Product Name | Desktop single-target magnetron sputtering coater with bias voltage |
Product Model | TN-MSP180G-1T-B （Bias voltage） |
Installation Condition | 1,Working environment temperature: 25℃±15℃，humidity: 55%Rh±10%Rh； 2,Equipment power supply：AC220V，50Hz， must be well grounded； 3,Rated power：1000w； 4,Equipment for gas：The equipment chamber should be filled with argon gas for cleaning. The customer should prepare argon gas with purity ≥99.99%. 5,Table size requirements: 600mm×600mm×850mm，bearing capacity ≥ 50kg； 6,The position should be well ventilated and cooled. |
Technical Indicators | 1、 Sputtering power supply：DC power supply 300W；maximum output voltage 600V，limited current output 500mA 2、 Magnetron target：2 inch balance target，magnetic coupling baffle； 3、 Bias power supply: output voltage <1000V, type: high-frequency pulse DC power supply 4、 Suitable target material： φ50mm x 3mm in thickness 5、 Cavity size ：outside diameter194,inside diameter186mm x height 230mm 6、 Cavity material： 304 stainless steel 7、 Rotating heating sample table：rotate speed 1~20rpm continuously adjustable；maximum heating temperature 500℃，the lowest recommended heating rate 10℃/min，the highest recommended heating rate 20℃/min. 8、 Cooling mode ：magnetic target and molecular pump require circulating water cooler 9、 Water-cooling machine：the tank volume 9L，flow rate 10L/min 10、 Gas supply system：mass flow meter， type of gas Argon，flow 1~30sccm（customizable） 11、 Accuracy of flow meter ：±1.5% measuring range 12、 The air pumping interface of the vacuum chamber is KF25 13、 Air intake interface is 1/4 inch double ferrule joint 14、 Touch screen is 7inch color touch screen 15、 Adjustable sputtering current，sputtering safety current value and safety vacuum value can be set； 16、 safety protection: over current, vacuum is too low automatically cut off the sputtering current 17、 Ultimate vacuum：5E-4Pa(matching molecular pump)； 18、 Vacuum measurement is Parana vacuum gauge ，the range is：1～105Pa |
Notice | 1,Magnetron sputtering has a high working vacuum, generally within 2Pa, and needs to be used with molecular pump. 2,In order to achieve a high oxygen free environment, the vacuum chamber should be cleaned at least 3 times with high purity inert gas。 3,Magnetron sputtering is sensitive to the air intake, so mass flow meter is needed to control the air intake |
Optional Accessory | |
Film thickness monitor | 1,Film thickness resolution：0.0136Å（aluminum） 2,Accuracy of film thickness ：±0.5%，it depends on process conditions, especially sensor position, material stress, temperature and density 3,Measuring speed：100ms-1s/times，measurement range can be set ：500000Å（aluminum） 4,Standard sensor crystal：6MHz 5,Suitable for wafer frequency：6MHz suitable for wafer size：Φ14mm mounting flange：CF35 |
Another accessory | · 1,CY-CZK103 series high performance molecular pump set(including composite vacuum gauge, measuring range 10-5Pa~105Pa) CY-GZK60 series small molecular pump set(including composite vacuum gauge, measuring range 10-5Pa~102Pa) VRD-4 bipolar rotary vane vacuum pump 2,KF25 Vacuum bellows; The length can be 0.5m, 1m or 1.5m. KF40 clamp bracket 3,Film thickness meter crystal oscillator; |
Product introduction：This equipment is a single-target magnetron sputtering coater instrument, which can be used for the preparation of general metal thin films. At the same time, the equipment is equipped with a bias power supply, which can be used for plasma cleaning before sputtering and exerting bias during sputtering.
This single-target magnetron sputtering coater is equipped with high vacuum stainless steel cavity, the cavity is set with a quartz observation window baffle, which is easy to observe and record the experiment; The cavity design with excellent vacuum performance and small shape makes it very suitable for laboratory use. At the same time, the equipment is equipped with a rotating heating sample table, which can effectively improve the film uniformity and film quality. The machine adopts modular design, simple operation logic, intuitive operation interface, easy to get started.
Desktop single target magnetron sputtering coater Technical Parameters:
Product Name | Desktop single-target magnetron sputtering coater with bias voltage |
Product Model | TN-MSP180G-1T-B （Bias voltage） |
Installation Condition | 1,Working environment temperature: 25℃±15℃，humidity: 55%Rh±10%Rh； 2,Equipment power supply：AC220V，50Hz， must be well grounded； 3,Rated power：1000w； 4,Equipment for gas：The equipment chamber should be filled with argon gas for cleaning. The customer should prepare argon gas with purity ≥99.99%. 5,Table size requirements: 600mm×600mm×850mm，bearing capacity ≥ 50kg； 6,The position should be well ventilated and cooled. |
Technical Indicators | 1、 Sputtering power supply：DC power supply 300W；maximum output voltage 600V，limited current output 500mA 2、 Magnetron target：2 inch balance target，magnetic coupling baffle； 3、 Bias power supply: output voltage <1000V, type: high-frequency pulse DC power supply 4、 Suitable target material： φ50mm x 3mm in thickness 5、 Cavity size ：outside diameter194,inside diameter186mm x height 230mm 6、 Cavity material： 304 stainless steel 7、 Rotating heating sample table：rotate speed 1~20rpm continuously adjustable；maximum heating temperature 500℃，the lowest recommended heating rate 10℃/min，the highest recommended heating rate 20℃/min. 8、 Cooling mode ：magnetic target and molecular pump require circulating water cooler 9、 Water-cooling machine：the tank volume 9L，flow rate 10L/min 10、 Gas supply system：mass flow meter， type of gas Argon，flow 1~30sccm（customizable） 11、 Accuracy of flow meter ：±1.5% measuring range 12、 The air pumping interface of the vacuum chamber is KF25 13、 Air intake interface is 1/4 inch double ferrule joint 14、 Touch screen is 7inch color touch screen 15、 Adjustable sputtering current，sputtering safety current value and safety vacuum value can be set； 16、 safety protection: over current, vacuum is too low automatically cut off the sputtering current 17、 Ultimate vacuum：5E-4Pa(matching molecular pump)； 18、 Vacuum measurement is Parana vacuum gauge ，the range is：1～105Pa |
Notice | 1,Magnetron sputtering has a high working vacuum, generally within 2Pa, and needs to be used with molecular pump. 2,In order to achieve a high oxygen free environment, the vacuum chamber should be cleaned at least 3 times with high purity inert gas。 3,Magnetron sputtering is sensitive to the air intake, so mass flow meter is needed to control the air intake |
Optional Accessory | |
Film thickness monitor | 1,Film thickness resolution：0.0136Å（aluminum） 2,Accuracy of film thickness ：±0.5%，it depends on process conditions, especially sensor position, material stress, temperature and density 3,Measuring speed：100ms-1s/times，measurement range can be set ：500000Å（aluminum） 4,Standard sensor crystal：6MHz 5,Suitable for wafer frequency：6MHz suitable for wafer size：Φ14mm mounting flange：CF35 |
Another accessory | · 1,CY-CZK103 series high performance molecular pump set(including composite vacuum gauge, measuring range 10-5Pa~105Pa) CY-GZK60 series small molecular pump set(including composite vacuum gauge, measuring range 10-5Pa~102Pa) VRD-4 bipolar rotary vane vacuum pump 2,KF25 Vacuum bellows; The length can be 0.5m, 1m or 1.5m. KF40 clamp bracket 3,Film thickness meter crystal oscillator; |
