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Desktop Single Sputter Head Magnetron Sputtering Coater with Stainless Steel Chamber for Depositing Aluminum

Desktop Single Sputter Head Magnetron Sputtering Coater with Stainless Steel Chamber can be used for preparing single-layer or multi-layer ferroelectric thin films, conductive films, alloy films, and the like. Compared with similar equipment, the dual-target magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation, and is an ideal equipment for preparing material films in a laboratory
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  • TN-MSP180G-ALDC

  • TN

Desktop Single Sputter Head Magnetron Sputtering Coater with Stainless Steel Chamber is very suitable for aluminum plating and other materials that are very sensitive to air. This magnetron sputtering coater equipment has compact structure and perfect function and is easy to use, and is very suitable for various coating tests.

This magnetron sputtering coater equipment is a desktop single sputter head magnetron sputtering coating machine. The miniaturized design of the equipment limits the appearance of the equipment to the desktop level, greatly reducing the installation site requirements. The equipment is equipped with a high-performance DC power supply with target refining function, which can effectively remove the oxide layer on the surface of the aluminum target. this magnetron sputtering coater is very suitable for aluminum plating and other materials that are very sensitive to air. This equipment has compact structure and perfect function and is easy to use, and is very suitable for various coating tests.


magnetron sputtering coater technical parameters:

Sample stage

Size

φ100mm

Rotating speed

0-20rpm adjustable

Heating

Max. 500℃

Magnetron sputtering head

Quantity  

2" x1

Vacuum chamber

Chamber size

φ180mm x 215mm

Observation window

Omnidirectional transparent

Chamber material

High purity quartz

Open method

Upper cover   removable

Vacuum system

Mechanical pump

Rotary vane pump

Pumping port

KF16

Exhaust interface

KF16

Molecular pump

Turbomolecular pump

Pumping port

KF40

Exhaust interface

KF40

Vacuum measurement

Resistance gauge + ionization gauge

Ultimate vacuum

1.0E-4Pa

Power supply

AC 220V 50/60Hz

Pumping rate

Mechanical pump 1.1L/s Molecular pump 600L/s

Power configuration

Quantity

DC power supply x1

Max. output power

DC power supply 500W

Supply voltage

AC220V, 50Hz

Others

Total power

2kW

Overall size

550mm x 350mm x 500mm



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Zhengzhou Tainuo Thin Film Materials Co., Ltd.
Which is a manufacturer specializing in the production of laboratory scientific instruments. Our products are widely used in colleges, research institutions and laboratories.

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