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TN-MSP210S-DC-D
TN
This equipment is a double target magnetron sputtering coater, which can be used in the preparation of metal films, in the fields of electronics, optics, special ceramics, etc. it can also be used to prepare SEM samples in laboratory.
It adopts high vacuum stainless steel chamber, front door opening design, and quartz observation window on the door, which is convenient for the observation and recording of the experiment. At the same time, the equipment is equipped with a rotary heating sample table, which can effectively improve the film uniformity and film quality. A set of baffle plate is installed on the top cover, and the two targets can be switched by rotating the baffle plate to realize multilayer coating.
This equipment needs to be used together with high vacuum molecular pump group. Users can choose imported brand small molecular pump to further save installation area.
At the same time, the model can be equipped with film thickness meter components, which can monitor the film thickness in real time and provide reliable parameters for the experimental process.
double target magnetron sputtering coater Technical parameter:
Sample stage | Size | 100mm | Heating | ≤500℃ |
Rotation speed | 1-20r/min | Temp control | ±1℃ | |
Magnetron sputter head | Quantity | 2” x2 | Cooling mode | Water cooled |
Vacuum chamber | Size | Dia 210mm× 260mm | Watch window | φ40mm |
Material | SUS | Open mode | Front opening | |
Sputter power supply | DC power supply | 1 set | Output power | ≤300W |
Output voltage | ≤600V | response time | ＜5ms | |
Water cooling | Tank capacity | 9L | Flow | 10 L/min |
Film thickness gauge | Accuracy | 0.1angstrom | Cooling mode | Water cooling |
Other | Power supply | AC220V,50Hz | Total power | 4kw |
Molecular pump system | Backing pump | Rotary vane pump | Pumping | 1.1L/s |
Secondary pump | turbo molecular pump（domestic） | Pumping | 600L/s | |
Extraction interface | KF40 | Air outlet | KF16 |
This equipment is a double target magnetron sputtering coater, which can be used in the preparation of metal films, in the fields of electronics, optics, special ceramics, etc. it can also be used to prepare SEM samples in laboratory.
It adopts high vacuum stainless steel chamber, front door opening design, and quartz observation window on the door, which is convenient for the observation and recording of the experiment. At the same time, the equipment is equipped with a rotary heating sample table, which can effectively improve the film uniformity and film quality. A set of baffle plate is installed on the top cover, and the two targets can be switched by rotating the baffle plate to realize multilayer coating.
This equipment needs to be used together with high vacuum molecular pump group. Users can choose imported brand small molecular pump to further save installation area.
At the same time, the model can be equipped with film thickness meter components, which can monitor the film thickness in real time and provide reliable parameters for the experimental process.
double target magnetron sputtering coater Technical parameter:
Sample stage | Size | 100mm | Heating | ≤500℃ |
Rotation speed | 1-20r/min | Temp control | ±1℃ | |
Magnetron sputter head | Quantity | 2” x2 | Cooling mode | Water cooled |
Vacuum chamber | Size | Dia 210mm× 260mm | Watch window | φ40mm |
Material | SUS | Open mode | Front opening | |
Sputter power supply | DC power supply | 1 set | Output power | ≤300W |
Output voltage | ≤600V | response time | ＜5ms | |
Water cooling | Tank capacity | 9L | Flow | 10 L/min |
Film thickness gauge | Accuracy | 0.1angstrom | Cooling mode | Water cooling |
Other | Power supply | AC220V,50Hz | Total power | 4kw |
Molecular pump system | Backing pump | Rotary vane pump | Pumping | 1.1L/s |
Secondary pump | turbo molecular pump（domestic） | Pumping | 600L/s | |
Extraction interface | KF40 | Air outlet | KF16 |
