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TN-MSH325-III-DCDCRF-SS
TN
Introducing our state-of-the-art three-target magnetron sputtering coater, designed for precision coating applications in various industries. This advanced coater is equipped with the latest technology to produce high-quality multilayer and graded films, complex alloy films, and magnetic alloy films with exceptional accuracy and efficiency.
The three-target magnetron sputtering coater is capable of depositing a wide range of materials, including aluminum-copper alloys, silicon-germanium films, permalloy (nickel-iron), and CoFeB (cobalt-iron-boron). These materials are essential for the production of thin-film solar cells, as well as other electronic and optical devices.
With its versatile capabilities and superior performance, our three-target magnetron sputtering coater is the ideal solution for research and development laboratories, universities, and industrial manufacturers looking to achieve precise and uniform coatings on various substrates. Invest in our cutting-edge coater today and experience the difference in quality and efficiency it can bring to your production processes.
Product name | Automatic program controlled high vacuum three target magnetron sputtering coating instrument for Oxide film | |
Product model | TN-MSH325-III-DCDCRF-SS | |
Power supply voltage | AC220V，50Hz | |
Complete power | 6KW | |
System vacuum | ≦5×10-4Pa | |
Sample stage | Dimensions | φ150mm |
Heating temperature | ≦850℃ | |
Temperature control accuracy | ±1℃ | |
Adjustable speed | ≦20rpm | |
Magnetron Sputtering Target | Target size | Diameter Φ50.8mm, thickness ≦3mm |
Cooling mode | Circulating water cooling | |
Water flow size | Not less than 10L/Min | |
Quantity | 3 | |
Vacuum chamber | Cavity size | Diameter φ325mm |
Cavity material | SUU304 stainless steel | |
Observation window | Diameter φ100mm | |
Opening method | Top opening | |
Gas control | 1 mass flow meter is used to control Ar flow, with a range of 200SCCM | |
Vacuum system | Equipped with 1 molecular pump system, gas pumping speed 600L/S | |
Film thickness measurement | Optional quartz crystal film thickness meter, resolution 0.10 Å | |
Sputtering power supply | Equipped with DC power supply, power 500W*2 RF power supply 300W | |
Control system | CYKY self-developed professional control system | |
Equipment dimensions | 570mm×1040mm×1700mm | |
Equipment weight | 350kg | |
three-target magnetron sputtering coater for alloy thin films is a highly specialized piece of equipment designed for the deposition of complex alloy compositions and multilayer structures. By utilizing three different targets, this system allows for the creation of precise alloy films and layered materials with tailored properties. Here are the primary areas where this type of machine is available and commonly used:
Multilayer and Graded Films: The three-target configuration is ideal for depositing multilayer or graded films, where different materials can be sequentially or simultaneously deposited. This is crucial in the fabrication of advanced semiconductor devices, including transistors, capacitors, and interconnects.
Complex Alloy Films: In microelectronics, alloy films with specific electrical and thermal properties are often required. A three-target system allows for the precise control of the composition of these alloys, such as aluminum-copper alloys or silicon-germanium films.
Anti-Reflective and Reflective Coatings: The machine can deposit complex optical coatings, including those with gradient refractive indices or multi-layer stacks. These coatings are essential for lenses, mirrors, and optical filters in a wide range of applications.
Chirped Mirrors and Beam Splitters: These components often require intricate multi-material layers, which can be efficiently created using three different targets.
Magnetic Alloy Films: Three-target sputtering is used to deposit magnetic alloy films, such as permalloy (nickel-iron) or CoFeB (cobalt-iron-boron), which are critical in the production of magnetic storage devices, sensors, and spintronic components.
Spintronic Structures: The ability to create layered magnetic and non-magnetic materials is key for spintronic devices, which exploit the spin of electrons for data storage and logic operations.
Thin-Film Solar Cells: In the production of thin-film solar cells, such as CIGS (copper indium gallium selenide) or CZTS (copper zinc tin sulfide) cells, a three-target system is essential for depositing complex alloy absorber layers and transparent conductive oxides.
Battery and Fuel Cell Components: Three-target sputtering is used to deposit alloy films for electrode materials in batteries and protective or catalytic layers in fuel cells, improving the efficiency and durability of these devices.
Advanced Tooling Coatings: The coater is used to create hard, wear-resistant alloy coatings, such as titanium-aluminum-nitride (TiAlN) or chromium-aluminum-nitride (CrAlN), which are applied to cutting tools, molds, and other mechanical components to enhance their performance.
Protective Coatings: Alloy coatings that provide corrosion resistance, oxidation resistance, or thermal barriers are deposited using this system for use in aerospace, automotive, and industrial applications.
Aesthetic Coatings: The machine can deposit multi-layer or alloy coatings that provide both decorative finishes and functional properties (such as scratch resistance) on consumer products like electronics, jewelry, and household items.
Architectural Coatings: Three-target sputtering is used to create coatings on architectural glass that enhance energy efficiency, UV protection, and aesthetic appeal.
New Material Development: Researchers use three-target sputtering coaters to develop and explore new alloy materials with specific electronic, magnetic, optical, or mechanical properties. The system's flexibility allows for the rapid prototyping of novel materials.
Nanostructures and Thin-Film Devices: In material science and nanotechnology research, the ability to create complex, multi-component films with precise control over composition and thickness is invaluable for studying and developing new thin-film devices.
Superconducting Materials: The machine is used to deposit superconducting alloy films, such as NbTi (niobium-titanium) or NbN (niobium nitride), for use in superconducting electronics, magnets, and research into high-temperature superconductivity.
Advanced Magnetic Coatings: Three-target sputtering allows for the creation of complex magnetic alloys and multilayers used in advanced data storage devices, magnetic sensors, and spintronic applications.
Biocompatible Coatings: In biomedical engineering, three-target sputtering is used to deposit alloy coatings that are biocompatible and suitable for medical implants, such as titanium alloys or coatings that promote cell growth.
Functional Biomaterials: The system can also be used to create coatings with specific surface properties, such as antimicrobial or hydrophilic surfaces, for medical devices and instruments.
Overall, a three-target magnetron sputtering coater is a versatile and powerful tool used across multiple industries and research fields for the deposition of complex alloy thin films and multilayer structures. Its ability to handle three different materials simultaneously or in sequence allows for the precise control needed to develop advanced materials and devices with tailored properties.
Introducing our state-of-the-art three-target magnetron sputtering coater, designed for precision coating applications in various industries. This advanced coater is equipped with the latest technology to produce high-quality multilayer and graded films, complex alloy films, and magnetic alloy films with exceptional accuracy and efficiency.
The three-target magnetron sputtering coater is capable of depositing a wide range of materials, including aluminum-copper alloys, silicon-germanium films, permalloy (nickel-iron), and CoFeB (cobalt-iron-boron). These materials are essential for the production of thin-film solar cells, as well as other electronic and optical devices.
With its versatile capabilities and superior performance, our three-target magnetron sputtering coater is the ideal solution for research and development laboratories, universities, and industrial manufacturers looking to achieve precise and uniform coatings on various substrates. Invest in our cutting-edge coater today and experience the difference in quality and efficiency it can bring to your production processes.
Product name | Automatic program controlled high vacuum three target magnetron sputtering coating instrument for Oxide film | |
Product model | TN-MSH325-III-DCDCRF-SS | |
Power supply voltage | AC220V，50Hz | |
Complete power | 6KW | |
System vacuum | ≦5×10-4Pa | |
Sample stage | Dimensions | φ150mm |
Heating temperature | ≦850℃ | |
Temperature control accuracy | ±1℃ | |
Adjustable speed | ≦20rpm | |
Magnetron Sputtering Target | Target size | Diameter Φ50.8mm, thickness ≦3mm |
Cooling mode | Circulating water cooling | |
Water flow size | Not less than 10L/Min | |
Quantity | 3 | |
Vacuum chamber | Cavity size | Diameter φ325mm |
Cavity material | SUU304 stainless steel | |
Observation window | Diameter φ100mm | |
Opening method | Top opening | |
Gas control | 1 mass flow meter is used to control Ar flow, with a range of 200SCCM | |
Vacuum system | Equipped with 1 molecular pump system, gas pumping speed 600L/S | |
Film thickness measurement | Optional quartz crystal film thickness meter, resolution 0.10 Å | |
Sputtering power supply | Equipped with DC power supply, power 500W*2 RF power supply 300W | |
Control system | CYKY self-developed professional control system | |
Equipment dimensions | 570mm×1040mm×1700mm | |
Equipment weight | 350kg | |
three-target magnetron sputtering coater for alloy thin films is a highly specialized piece of equipment designed for the deposition of complex alloy compositions and multilayer structures. By utilizing three different targets, this system allows for the creation of precise alloy films and layered materials with tailored properties. Here are the primary areas where this type of machine is available and commonly used:
Multilayer and Graded Films: The three-target configuration is ideal for depositing multilayer or graded films, where different materials can be sequentially or simultaneously deposited. This is crucial in the fabrication of advanced semiconductor devices, including transistors, capacitors, and interconnects.
Complex Alloy Films: In microelectronics, alloy films with specific electrical and thermal properties are often required. A three-target system allows for the precise control of the composition of these alloys, such as aluminum-copper alloys or silicon-germanium films.
Anti-Reflective and Reflective Coatings: The machine can deposit complex optical coatings, including those with gradient refractive indices or multi-layer stacks. These coatings are essential for lenses, mirrors, and optical filters in a wide range of applications.
Chirped Mirrors and Beam Splitters: These components often require intricate multi-material layers, which can be efficiently created using three different targets.
Magnetic Alloy Films: Three-target sputtering is used to deposit magnetic alloy films, such as permalloy (nickel-iron) or CoFeB (cobalt-iron-boron), which are critical in the production of magnetic storage devices, sensors, and spintronic components.
Spintronic Structures: The ability to create layered magnetic and non-magnetic materials is key for spintronic devices, which exploit the spin of electrons for data storage and logic operations.
Thin-Film Solar Cells: In the production of thin-film solar cells, such as CIGS (copper indium gallium selenide) or CZTS (copper zinc tin sulfide) cells, a three-target system is essential for depositing complex alloy absorber layers and transparent conductive oxides.
Battery and Fuel Cell Components: Three-target sputtering is used to deposit alloy films for electrode materials in batteries and protective or catalytic layers in fuel cells, improving the efficiency and durability of these devices.
Advanced Tooling Coatings: The coater is used to create hard, wear-resistant alloy coatings, such as titanium-aluminum-nitride (TiAlN) or chromium-aluminum-nitride (CrAlN), which are applied to cutting tools, molds, and other mechanical components to enhance their performance.
Protective Coatings: Alloy coatings that provide corrosion resistance, oxidation resistance, or thermal barriers are deposited using this system for use in aerospace, automotive, and industrial applications.
Aesthetic Coatings: The machine can deposit multi-layer or alloy coatings that provide both decorative finishes and functional properties (such as scratch resistance) on consumer products like electronics, jewelry, and household items.
Architectural Coatings: Three-target sputtering is used to create coatings on architectural glass that enhance energy efficiency, UV protection, and aesthetic appeal.
New Material Development: Researchers use three-target sputtering coaters to develop and explore new alloy materials with specific electronic, magnetic, optical, or mechanical properties. The system's flexibility allows for the rapid prototyping of novel materials.
Nanostructures and Thin-Film Devices: In material science and nanotechnology research, the ability to create complex, multi-component films with precise control over composition and thickness is invaluable for studying and developing new thin-film devices.
Superconducting Materials: The machine is used to deposit superconducting alloy films, such as NbTi (niobium-titanium) or NbN (niobium nitride), for use in superconducting electronics, magnets, and research into high-temperature superconductivity.
Advanced Magnetic Coatings: Three-target sputtering allows for the creation of complex magnetic alloys and multilayers used in advanced data storage devices, magnetic sensors, and spintronic applications.
Biocompatible Coatings: In biomedical engineering, three-target sputtering is used to deposit alloy coatings that are biocompatible and suitable for medical implants, such as titanium alloys or coatings that promote cell growth.
Functional Biomaterials: The system can also be used to create coatings with specific surface properties, such as antimicrobial or hydrophilic surfaces, for medical devices and instruments.
Overall, a three-target magnetron sputtering coater is a versatile and powerful tool used across multiple industries and research fields for the deposition of complex alloy thin films and multilayer structures. Its ability to handle three different materials simultaneously or in sequence allows for the precise control needed to develop advanced materials and devices with tailored properties.
