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2 High Vacuum Magnetron Sputter Source with Flexible Head & Quick Connector

The TN-HVMSS-SPC-2 is a 2" diam. circular magnetron sputtering gun which can accommodate a wide range of sputtering targets, such as metallic/insulating or magneticon-magnetic
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  • TN-HVMSS-SPC-2

  • TN

The TN-HVMSS-SPC-2 is a 2" diam. circular magnetron sputtering gun which can accommodate a wide range of sputtering targets, such as metallic/insulating or magneticon-magnetic. The circular rare-earth NdFeB permanent magnet is implemented to ensure excellent film uniformity and target utilization. Such a sputtering gun is easy to operate and maintain. Installation is straight forward and it can be operated with either DC or RF power supply.

SPECIFICATIONS:

Features

  • The sputtering head can be tilted +/- 25 degrees for adjusting the        incidence angle of bombardments to improve the sputtering yield.
           
           

  • Made of high-quality materials of stainless steel and        ceramics.

  • Electromagnetic finite element calculations are used in the design        of the permanent magnetic assembly to achieve high field strength and        uniform field profile.

  • The magnet is coated with protective material against cooling water        corrosion to maximize durability.

  • Standard RF connector, which matches with a wide range of DC and RF        sputtering power supplies.

  • The low impedance sputtering heads are easily interfaceable        with an external power supply.

  • Easy to install a standard fitting with included quick        connector

  • 2" Copper Backing Plate  (EQ-CBP-2) is included.

  • Target replacement is easy and no need to adjust the gun to fit        targets with different height.

Power Requirement

  • DC (Max.) 500 W

  • RF (Max.)  300 W

Electrical Connection Type
 
 

  • Standard SL16 cable Connector   ( Pic.1 )

  • Optional 148 cm RF cable with SL6 connector (click Pic. 2 to order)

Sputtering Current (Max.)

5 Amp

Sputtering Voltage

200-1000 V

Sputtering Pressure

1-1000 mTorr

Dimensions

  • Anode Shield Diameter: 86mm                    


 
  Sputtering Target

  • Diameter:                                2.0" (50.8mm),

  • Thickness:                              up to 1/4" for non-magnetic target; up         to 1/16" for magnetic target

  • Utilization:                               up to 30%

  • Magnet:                                   NdFeB Rare Earth Magnet


  Cooling Water Requirement

  • Flow Rate:                                0.8 GPM, filtered

  • Water Inlet Temperature:     <20 C

  • Water tubing:                            6mm quick disconnect.

Mounting

  • Feedthrough:                             3/4" O.D.tube

Net Weight

3.5 lbs


 
 
  Accessories
 
 

  • High vacuum Quick connector with 0.75" ID is included. Use        this component to install the sputtering source onto the baseplate (up        to 1” thick) of a vacuum chamber with 1” diameter through-hole at easy (        click pic below left to see detail )

  • 6" CF flange with a high vacuum feedthrough is        available upon request at extra cost. The sputtering head can be easily        installed on the 6'' CF vacuum flange through the quick disconnector.        The height position of the sputtering gun can be manually adjusted        inside the vacuum chamber.   ( Pls click Pic below 3 &4         to see detail )

  • Digital Temperature Controlled circulating Water Chiller with        6 Liters Tank, 16L / min Flow is available at extra cost, please click        the picture below right to order.


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Zhengzhou Tainuo Thin Film Materials Co., Ltd.
Which is a manufacturer specializing in the production of laboratory scientific instruments. Our products are widely used in colleges, research institutions and laboratories.

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