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Three targets magnetron sputtering coater with 500W DC power supply for the preparation of metal film

DC Magnetron Sputtering Coater can be used for preparing single-layer or multi-layer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, oxide films, hard films, PTFE films, and the like. Compared with similar equipment, this three-target magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation, and is an ideal equipment for preparing material films in a laboratory.
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  • TN--MSP300S-3DC

  • TN

Three target magnetron sputtering coater is equipped with three targets, allowing for simultaneous deposition of different materials, making it highly versatile and efficient. The coater operates on a DC magnetron sputtering principle, ensuring uniform and high-quality film deposition.


With its advanced technology and precise control system, this magnetron sputtering coater offers exceptional film thickness control, ranging from a few nanometers to micrometers. Its adjustable parameters allow for customization of film properties, such as density, composition, and adhesion strength.


The coater's compact design and user-friendly interface make it easy to operate and maintain. It is equipped with safety features, including overcurrent and overvoltage protection, ensuring a secure working environment.


Whether you are in research and development, academia, or industrial production, this three targets magnetron sputtering coater is an indispensable tool for the preparation of high-quality metal films. Its versatility, efficiency, and precise control make it suitable for a wide range of applications, including electronics, optics, energy storage, and more.


Invest in this professional-grade coater and unlock endless possibilities in thin film deposition. Experience superior performance, reliability, and productivity with our three targets magnetron sputtering coater.

Sample stage

Size

Dia.140mm

Heating temperature

Max 500℃

Temperature accuracy

±1℃

Rotational speed

1-20rpm adjustable

Magnetron Sputtering head

Quantity

2”×3 (1”,2” optional)

Cooling mode

Water cooling

Water chiller

Circulating water chiller with flow rate of 10L/min

Vacuum chamber

Chamber size

Dia.300mm×300mm

Chamber material

Stainless steel

Watch window

Dia.100mm

Opening mode

Top cover open

Mass flowmeter

2 channels; measuring range 100SCCM; 100SCCM (can   be customized according to customer needs)

Vacuum system

Model

TN-GZK103-A

Molecular pump

TN-600

Backing pump

Rotary vane pump

Ultimate vacuum

1.0E-5Pa

Pumping interface

CF160

Exhaust interface

KF40

Vacuum measurement

Compound vacuum gauge

Power supply

AC;220V   50/60Hz

Pumping rate

Molecular pump: 600L/S rotary vane pump:   1.1L/S  

Comprehensive gas pumping performance: vacuum up to   1.0E-3Pa in 20 minutes

Power configuration

Quantity

DC power supply x2

RF power supply x1

Max output power

DC 500 W, RF 500W

Other parameters

Supply voltage

AC220V,50Hz

Total power

4KW

Overall size

600mm×650mm×1280mm

Total Weight

About 300kg



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Zhengzhou Tainuo Thin Film Materials Co., Ltd.
Which is a manufacturer specializing in the production of laboratory scientific instruments. Our products are widely used in colleges, research institutions and laboratories.

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