Availability: | |
---|---|
Quantity: | |
TN--MSP300S-3DC
TN
Three target magnetron sputtering coater is equipped with three targets, allowing for simultaneous deposition of different materials, making it highly versatile and efficient. The coater operates on a DC magnetron sputtering principle, ensuring uniform and high-quality film deposition.
With its advanced technology and precise control system, this magnetron sputtering coater offers exceptional film thickness control, ranging from a few nanometers to micrometers. Its adjustable parameters allow for customization of film properties, such as density, composition, and adhesion strength.
The coater's compact design and user-friendly interface make it easy to operate and maintain. It is equipped with safety features, including overcurrent and overvoltage protection, ensuring a secure working environment.
Whether you are in research and development, academia, or industrial production, this three targets magnetron sputtering coater is an indispensable tool for the preparation of high-quality metal films. Its versatility, efficiency, and precise control make it suitable for a wide range of applications, including electronics, optics, energy storage, and more.
Invest in this professional-grade coater and unlock endless possibilities in thin film deposition. Experience superior performance, reliability, and productivity with our three targets magnetron sputtering coater.
Sample stage | Size | Dia.140mm |
Heating temperature | Max 500℃ | |
Temperature accuracy | ±1℃ | |
Rotational speed | 1-20rpm adjustable | |
Magnetron Sputtering head | Quantity | 2”×3 (1”,2” optional) |
Cooling mode | Water cooling | |
Water chiller | Circulating water chiller with flow rate of 10L/min | |
Vacuum chamber | Chamber size | Dia.300mm×300mm |
Chamber material | Stainless steel | |
Watch window | Dia.100mm | |
Opening mode | Top cover open | |
Mass flowmeter | 2 channels; measuring range 100SCCM; 100SCCM (can be customized according to customer needs) | |
Vacuum system | Model | TN-GZK103-A |
Molecular pump | TN-600 | |
Backing pump | Rotary vane pump | |
Ultimate vacuum | 1.0E-5Pa | |
Pumping interface | CF160 | |
Exhaust interface | KF40 | |
Vacuum measurement | Compound vacuum gauge | |
Power supply | AC;220V 50/60Hz | |
Pumping rate | Molecular pump: 600L/S rotary vane pump: 1.1L/S Comprehensive gas pumping performance: vacuum up to 1.0E-3Pa in 20 minutes | |
Power configuration | Quantity | DC power supply x2 RF power supply x1 |
Max output power | DC 500 W, RF 500W | |
Other parameters | Supply voltage | AC220V,50Hz |
Total power | 4KW | |
Overall size | 600mm×650mm×1280mm | |
Total Weight | About 300kg |
Three target magnetron sputtering coater is equipped with three targets, allowing for simultaneous deposition of different materials, making it highly versatile and efficient. The coater operates on a DC magnetron sputtering principle, ensuring uniform and high-quality film deposition.
With its advanced technology and precise control system, this magnetron sputtering coater offers exceptional film thickness control, ranging from a few nanometers to micrometers. Its adjustable parameters allow for customization of film properties, such as density, composition, and adhesion strength.
The coater's compact design and user-friendly interface make it easy to operate and maintain. It is equipped with safety features, including overcurrent and overvoltage protection, ensuring a secure working environment.
Whether you are in research and development, academia, or industrial production, this three targets magnetron sputtering coater is an indispensable tool for the preparation of high-quality metal films. Its versatility, efficiency, and precise control make it suitable for a wide range of applications, including electronics, optics, energy storage, and more.
Invest in this professional-grade coater and unlock endless possibilities in thin film deposition. Experience superior performance, reliability, and productivity with our three targets magnetron sputtering coater.
Sample stage | Size | Dia.140mm |
Heating temperature | Max 500℃ | |
Temperature accuracy | ±1℃ | |
Rotational speed | 1-20rpm adjustable | |
Magnetron Sputtering head | Quantity | 2”×3 (1”,2” optional) |
Cooling mode | Water cooling | |
Water chiller | Circulating water chiller with flow rate of 10L/min | |
Vacuum chamber | Chamber size | Dia.300mm×300mm |
Chamber material | Stainless steel | |
Watch window | Dia.100mm | |
Opening mode | Top cover open | |
Mass flowmeter | 2 channels; measuring range 100SCCM; 100SCCM (can be customized according to customer needs) | |
Vacuum system | Model | TN-GZK103-A |
Molecular pump | TN-600 | |
Backing pump | Rotary vane pump | |
Ultimate vacuum | 1.0E-5Pa | |
Pumping interface | CF160 | |
Exhaust interface | KF40 | |
Vacuum measurement | Compound vacuum gauge | |
Power supply | AC;220V 50/60Hz | |
Pumping rate | Molecular pump: 600L/S rotary vane pump: 1.1L/S Comprehensive gas pumping performance: vacuum up to 1.0E-3Pa in 20 minutes | |
Power configuration | Quantity | DC power supply x2 RF power supply x1 |
Max output power | DC 500 W, RF 500W | |
Other parameters | Supply voltage | AC220V,50Hz |
Total power | 4KW | |
Overall size | 600mm×650mm×1280mm | |
Total Weight | About 300kg |