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TN-MSP300S-2DC
TN
Introducing our High Vacuum Dual-target Magnetron Sputtering Coater with Stainless Steel Chamber for Alloy Films. This cutting-edge coater is designed to meet the diverse needs of professionals in various industries.
With its dual-target DC magnetron sputtering capability, this coater allows for the precise preparation of single-layer or multi-layer ferroelectric thin films, conductive films, alloy films, and more.
Crafted with a robust stainless steel chamber, this coater ensures durability and longevity, making it a reliable choice for your coating requirements.
The high vacuum technology employed in this coater guarantees an optimal and controlled environment for the deposition process, resulting in high-quality and uniform films.
Equipped with advanced features, our Dual-target Magnetron Sputtering Coater offers exceptional versatility and efficiency. The dual-target system enables the deposition of different materials simultaneously, saving time and enhancing productivity.
The professional-grade performance of this coater is complemented by its user-friendly interface, allowing for easy operation and precise control over various parameters.
Whether you are in the research and development field or engaged in industrial production, our High Vacuum Dual-target Magnetron Sputtering Coater with Stainless Steel Chamber for Alloy Films is the ideal choice for achieving superior coating results. Invest in this state-of-the-art coater and elevate your coating processes to new heights of excellence.
Dual-target DC magnetron sputtering coater technical parameters:
product name | Dual-target magnetron sputtering coater |
Sputtering power supply | power supply×2 power supply：500W |
Vacuum chamber | Chamber size：φ300mm×300mm，Chamber materia：Stainless steel Watch window： φ100mm The cavity opening method adopts top opening, which makes it easier to change the target |
Magnetron Sputtering target head | There are 2 magnetron sputtering heads installed in the instrument, and they are all equipped with a water-cooled interlayer, which can pass in cooling water to cool the target material. The two sputtering heads are connected with a DC power supply, and the main sputtering conductive |
Sample stage | Sample carrier size: 140mm dia. (Maximum 4" substrate can be placed) The sample carrier can be rotated at a speed of: 1-20 rpm (adjustable) The highest heating temperature of the sample carrier is 500℃, and the temperature control accuracy is +/- 1.0 °C |
Gas flow controller | There are 2 mass flow meters installed inside the instrument, the range is: 0-200sccm |
Vacuum pump | Equipped with a set of molecular pump system, using one-button operation 80L/S |
Cooling system | 16L/min. |
Voltage | 220V 50HZ |
Introducing our High Vacuum Dual-target Magnetron Sputtering Coater with Stainless Steel Chamber for Alloy Films. This cutting-edge coater is designed to meet the diverse needs of professionals in various industries.
With its dual-target DC magnetron sputtering capability, this coater allows for the precise preparation of single-layer or multi-layer ferroelectric thin films, conductive films, alloy films, and more.
Crafted with a robust stainless steel chamber, this coater ensures durability and longevity, making it a reliable choice for your coating requirements.
The high vacuum technology employed in this coater guarantees an optimal and controlled environment for the deposition process, resulting in high-quality and uniform films.
Equipped with advanced features, our Dual-target Magnetron Sputtering Coater offers exceptional versatility and efficiency. The dual-target system enables the deposition of different materials simultaneously, saving time and enhancing productivity.
The professional-grade performance of this coater is complemented by its user-friendly interface, allowing for easy operation and precise control over various parameters.
Whether you are in the research and development field or engaged in industrial production, our High Vacuum Dual-target Magnetron Sputtering Coater with Stainless Steel Chamber for Alloy Films is the ideal choice for achieving superior coating results. Invest in this state-of-the-art coater and elevate your coating processes to new heights of excellence.
Dual-target DC magnetron sputtering coater technical parameters:
product name | Dual-target magnetron sputtering coater |
Sputtering power supply | power supply×2 power supply：500W |
Vacuum chamber | Chamber size：φ300mm×300mm，Chamber materia：Stainless steel Watch window： φ100mm The cavity opening method adopts top opening, which makes it easier to change the target |
Magnetron Sputtering target head | There are 2 magnetron sputtering heads installed in the instrument, and they are all equipped with a water-cooled interlayer, which can pass in cooling water to cool the target material. The two sputtering heads are connected with a DC power supply, and the main sputtering conductive |
Sample stage | Sample carrier size: 140mm dia. (Maximum 4" substrate can be placed) The sample carrier can be rotated at a speed of: 1-20 rpm (adjustable) The highest heating temperature of the sample carrier is 500℃, and the temperature control accuracy is +/- 1.0 °C |
Gas flow controller | There are 2 mass flow meters installed inside the instrument, the range is: 0-200sccm |
Vacuum pump | Equipped with a set of molecular pump system, using one-button operation 80L/S |
Cooling system | 16L/min. |
Voltage | 220V 50HZ |
