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Dual Target Magnetron Sputter And Thermal Evaporation Composite Coating Machine

magnetron sputter & thermal evaporation two-in-one coating machine can be used for the coating of electronic products, glass, ceramic samples, metal and other samples, especially suitable for sample preparation of laboratory SEM (scanning electron microscope).
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  • TN-MS500S-2TA1S

  • TN

magnetron sputter & thermal evaporation two-in-one coating machine can be used for the coating of electronic products, glass, ceramic samples, metal and other samples, especially suitable for sample preparation of laboratory SEM (scanning electron microscope).


The equipment is mainly composed of stainless steel vacuum chamber, magnetron sputtering target, evaporation source, rotary heating sample table, vacuum pump unit, vacuum measurement gauge, air intake system and control system.


Technical parameter

Model

TN-MS500S-2TA1S

Sample table

Size

150mm Dia.

Heating

≤500℃


Rotation speed

1-20r/min

Temp control

±1℃

Magnetron sputter head

Quantity

2-inch ×2

Cooling mode

Water cooled

Thermal evaporation

evaporator source

Tungsten wire basket

Max temp

1500℃

Thermocouple

S type



Vacuum chamber

Size

300mmDia.× 300mmH

Watch window

100mm Dia.

Material

304 SUS

Open mode

Front opening door


Vacuum system

Mechanical pump

Rotary vane pump

Extraction interface

KF16

Pumping

1.1L/s



Molecular pump

Turbo molecular pump

Extraction interface

CF150

Pumping

600L/s

Exhaust interface

KF40

Vacuum gauge

Resistance gauge + ionization gauge



Ultimate vacuum degree

1.3x10-4Pa

Power supply

AC;220V 50/60Hz

Sputter power supply

DC power supply

1 set

Output power

≤1000W

Output voltage

≤600W

Response time

<5ms

RF power supply

1 set

Output power

≤1000W

Power stability

≤5W



RF frequency

13.56MHz

RF stability


±0.005%

Film thickness gauge

Resolution

±0.03Hz

Accuracy

±0.5%

Upper range limit


50000

Speed

100~1000ms

Water cooled system

Tank volume

9L

Flow

10L/min

Gas system

Flowmeter type

MFC(mass flow meter)

Range

200sccm

Gas type

Ar




Other

Input supply

AC220V,50Hz

Size

1400x750x1300mm

Total power

4kw(host+vacuum pump)

Weight

295kg

New sample table is available

Sample

Size

For Dia.150mm sample max.

Height

70mm adjustable


Rotation speed

1~20rpm

Heating

0~500℃


The Dual Target Magnetron Sputter and Thermal Evaporation Composite Coating Machine is a state-of-the-art solution designed for advanced coating applications. One of its standout features is the intuitive touch screen operation, complemented by a temperature control meter for precise detection. This digital parameter interface and automatic operation mode provide users with an exceptional platform for research and development, streamlining the process of coating materials and enhancing productivity.


Constructed with a vacuum chamber made of 304 stainless steel, this machine boasts an aesthetically pleasing design along with fine craftsmanship. The chamber includes an observation window and a baffle, allowing users to monitor the coating process effectively. The main sealing flange is a CF series high vacuum sealing flange, ensuring superior vacuum performance. Each interface of the vacuum chamber is sealed with a durable rubber seal ring, which significantly contributes to maintaining the vacuum integrity and, consequently, the quality of the coatings produced.


In terms of functionality, the machine features a unique target arrangement where the target is positioned at the bottom of the cavity, facing upwards. This design is paired with a sample table that can heat and rotate, facilitating a more uniform coating effect across different substrates. This capability is essential for achieving consistent results, especially in complex coating processes.


The vacuum acquisition system is another highlight, utilizing a two-stage vacuum pump group. The backing pump is a high-speed mechanical pump that efficiently reduces the time required to transition from atmospheric pressure to low vacuum. The main pump, a turbine molecular pump, enhances this process with its high pumping speed, ensuring rapid vacuum acquisition. Together, these components create a clean and efficient vacuum environment, which is critical for achieving high-quality coatings in various applications. Overall, this machine represents a significant advancement in coating technology, combining user-friendly features with robust performance.


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Zhengzhou Tainuo Thin Film Materials Co., Ltd.
Which is a manufacturer specializing in the production of laboratory scientific instruments. Our products are widely used in colleges, research institutions and laboratories.

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