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TN-MS500S-2TA1S
TN
magnetron sputter & thermal evaporation two-in-one coating machine can be used for the coating of electronic products, glass, ceramic samples, metal and other samples, especially suitable for sample preparation of laboratory SEM (scanning electron microscope).
The equipment is mainly composed of stainless steel vacuum chamber, magnetron sputtering target, evaporation source, rotary heating sample table, vacuum pump unit, vacuum measurement gauge, air intake system and control system.
Technical parameter
Model | TN-MS500S-2TA1S | |||
Sample table | Size | Heating | ≤500℃ | |
Rotation speed | 1-20r/min | Temp control | ±1℃ | |
Magnetron sputter head | Quantity | 2-inch ×2 | Cooling mode | Water cooled |
Thermal evaporation | evaporator source | Tungsten wire basket | Max temp | 1500℃ |
Thermocouple | S type | |||
Vacuum chamber | Size | 300mmDia.× 300mmH | Watch window | 100mm Dia. |
Material | 304 SUS | Open mode | Front opening door | |
Vacuum system | Mechanical pump | Rotary vane pump | Extraction interface | KF16 |
Pumping | 1.1L/s | |||
Molecular pump | Turbo molecular pump | Extraction interface | CF150 | |
Pumping | 600L/s | Exhaust interface | KF40 | |
Vacuum gauge | Resistance gauge + ionization gauge | |||
Ultimate vacuum degree | 1.3x10-4Pa | Power supply | AC;220V 50/60Hz | |
DC power supply | 1 set | Output power | ≤1000W | |
Output voltage | ≤600W | Response time | <5ms | |
RF power supply | 1 set | Output power | ≤1000W | |
Power stability | ≤5W | |||
RF frequency | 13.56MHz | RF stability | ±0.005% | |
Film thickness gauge | Resolution | ±0.03Hz | Accuracy | ±0.5% |
Upper range limit | 50000 | Speed | 100~1000ms | |
Water cooled system | Tank volume | 9L | Flow | 10L/min |
Gas system | Flowmeter type | MFC(mass flow meter) | Range | 200sccm |
Gas type | Ar | |||
Other | Input supply | AC220V,50Hz | Size | 1400x750x1300mm |
Total power | 4kw(host+vacuum pump) | Weight | 295kg |
New sample table is available
Sample | Size | For Dia.150mm sample max. | Height | 70mm adjustable |
Rotation speed | 1~20rpm | Heating | 0~500℃ |
magnetron sputter & thermal evaporation two-in-one coating machine can be used for the coating of electronic products, glass, ceramic samples, metal and other samples, especially suitable for sample preparation of laboratory SEM (scanning electron microscope).
The equipment is mainly composed of stainless steel vacuum chamber, magnetron sputtering target, evaporation source, rotary heating sample table, vacuum pump unit, vacuum measurement gauge, air intake system and control system.
Technical parameter
Model | TN-MS500S-2TA1S | |||
Sample table | Size | Heating | ≤500℃ | |
Rotation speed | 1-20r/min | Temp control | ±1℃ | |
Magnetron sputter head | Quantity | 2-inch ×2 | Cooling mode | Water cooled |
Thermal evaporation | evaporator source | Tungsten wire basket | Max temp | 1500℃ |
Thermocouple | S type | |||
Vacuum chamber | Size | 300mmDia.× 300mmH | Watch window | 100mm Dia. |
Material | 304 SUS | Open mode | Front opening door | |
Vacuum system | Mechanical pump | Rotary vane pump | Extraction interface | KF16 |
Pumping | 1.1L/s | |||
Molecular pump | Turbo molecular pump | Extraction interface | CF150 | |
Pumping | 600L/s | Exhaust interface | KF40 | |
Vacuum gauge | Resistance gauge + ionization gauge | |||
Ultimate vacuum degree | 1.3x10-4Pa | Power supply | AC;220V 50/60Hz | |
DC power supply | 1 set | Output power | ≤1000W | |
Output voltage | ≤600W | Response time | <5ms | |
RF power supply | 1 set | Output power | ≤1000W | |
Power stability | ≤5W | |||
RF frequency | 13.56MHz | RF stability | ±0.005% | |
Film thickness gauge | Resolution | ±0.03Hz | Accuracy | ±0.5% |
Upper range limit | 50000 | Speed | 100~1000ms | |
Water cooled system | Tank volume | 9L | Flow | 10L/min |
Gas system | Flowmeter type | MFC(mass flow meter) | Range | 200sccm |
Gas type | Ar | |||
Other | Input supply | AC220V,50Hz | Size | 1400x750x1300mm |
Total power | 4kw(host+vacuum pump) | Weight | 295kg |
New sample table is available
Sample | Size | For Dia.150mm sample max. | Height | 70mm adjustable |
Rotation speed | 1~20rpm | Heating | 0~500℃ |
The Dual Target Magnetron Sputter and Thermal Evaporation Composite Coating Machine is a state-of-the-art solution designed for advanced coating applications. One of its standout features is the intuitive touch screen operation, complemented by a temperature control meter for precise detection. This digital parameter interface and automatic operation mode provide users with an exceptional platform for research and development, streamlining the process of coating materials and enhancing productivity.
Constructed with a vacuum chamber made of 304 stainless steel, this machine boasts an aesthetically pleasing design along with fine craftsmanship. The chamber includes an observation window and a baffle, allowing users to monitor the coating process effectively. The main sealing flange is a CF series high vacuum sealing flange, ensuring superior vacuum performance. Each interface of the vacuum chamber is sealed with a durable rubber seal ring, which significantly contributes to maintaining the vacuum integrity and, consequently, the quality of the coatings produced.
In terms of functionality, the machine features a unique target arrangement where the target is positioned at the bottom of the cavity, facing upwards. This design is paired with a sample table that can heat and rotate, facilitating a more uniform coating effect across different substrates. This capability is essential for achieving consistent results, especially in complex coating processes.
The vacuum acquisition system is another highlight, utilizing a two-stage vacuum pump group. The backing pump is a high-speed mechanical pump that efficiently reduces the time required to transition from atmospheric pressure to low vacuum. The main pump, a turbine molecular pump, enhances this process with its high pumping speed, ensuring rapid vacuum acquisition. Together, these components create a clean and efficient vacuum environment, which is critical for achieving high-quality coatings in various applications. Overall, this machine represents a significant advancement in coating technology, combining user-friendly features with robust performance.
The Dual Target Magnetron Sputter and Thermal Evaporation Composite Coating Machine is a state-of-the-art solution designed for advanced coating applications. One of its standout features is the intuitive touch screen operation, complemented by a temperature control meter for precise detection. This digital parameter interface and automatic operation mode provide users with an exceptional platform for research and development, streamlining the process of coating materials and enhancing productivity.
Constructed with a vacuum chamber made of 304 stainless steel, this machine boasts an aesthetically pleasing design along with fine craftsmanship. The chamber includes an observation window and a baffle, allowing users to monitor the coating process effectively. The main sealing flange is a CF series high vacuum sealing flange, ensuring superior vacuum performance. Each interface of the vacuum chamber is sealed with a durable rubber seal ring, which significantly contributes to maintaining the vacuum integrity and, consequently, the quality of the coatings produced.
In terms of functionality, the machine features a unique target arrangement where the target is positioned at the bottom of the cavity, facing upwards. This design is paired with a sample table that can heat and rotate, facilitating a more uniform coating effect across different substrates. This capability is essential for achieving consistent results, especially in complex coating processes.
The vacuum acquisition system is another highlight, utilizing a two-stage vacuum pump group. The backing pump is a high-speed mechanical pump that efficiently reduces the time required to transition from atmospheric pressure to low vacuum. The main pump, a turbine molecular pump, enhances this process with its high pumping speed, ensuring rapid vacuum acquisition. Together, these components create a clean and efficient vacuum environment, which is critical for achieving high-quality coatings in various applications. Overall, this machine represents a significant advancement in coating technology, combining user-friendly features with robust performance.