You are here: Home / Products / Vacuum Components / Magnetron Target / 1 Magnetron Sputtering Source with Flexible Head for DIY RF & DC Sputtering Coater for Magnetron Sputtering Coater

1 Magnetron Sputtering Source with Flexible Head for DIY RF & DC Sputtering Coater for Magnetron Sputtering Coater

1 Magnetron Sputtering Source with Flexible Head for DIY RF & DC Sputtering Coater for Magnetron Sputtering Coater

The TN-HVMSS-SPC-1-LD is a magnetron sputtering gun with a flexible head capable of accommodating a wide range of 1" Dia. sputtering sources. Its compatibility with DC, pulsed DC and RF power supplies ensures maximum versatility and extends its usage to various sputtering targets

Quantity:
Availability:





Inquire Add to Basket

Model:
TN-HVMSS-SPC-1-LD
Brand:
TN

Product Description

The TN-HVMSS-SPC-1-LD is a magnetron sputtering gun with a flexible head capable of accommodating a wide range of 1" Dia. sputtering sources. Its compatibility with DC, pulsed DC and RF power supplies ensures maximum versatility and extends its usage to various sputtering targets (e.g. metallic, electrically insulating, magnetic or non-magnetic, and etc). Furthermore, its high vacuum design makes the use of Argon under low-pressure levels improves the quality of coating through reducing gas collisions inside the chamber.

Circular rare-earth Nd-Fe-B magnets isolated from cooling water are implemented into the design for minimizing water-to-vacuum interfaces that are typically found in other sputtering sources. These magnets are field replaceable and make the sputtering gun easy to operate and maintain. The installation of this apparatus is straight forward and it also offers simple target changes that do not require any target bonding.

SPECIFICATIONS

Features	High field strength and uniform field profile achieved via use of electromagnetic finite element calculations in the design of the permanent magnetic assembly Low impedance sputtering head and standard RF connector easily match and interface with a wide range of DC and RF sputtering power supplies. Easy installation with common tools. Magnets are isolated from cooling water with the protective coating against corrosion to maximize durability. Sputtering source is bakeable up to 200°C 1" Copper Backing Plate (EQ-CBP-1) is included. Standard ¾” OD Shaft Accepts 1/8” (3 mm) thick targets; 1 piece of copper target is included as standard accessory
Sputtering Gun	Sputtering Head Diameter: 1.82" (46.3mm) Target Diameter: 1.0 ± 0.02" (25.4mm) Maximum Target Thickness: 1/8" (3mm) Magnets: NdFeB Rare Earth Magnet Shaft Diameter: 3/4" O.D.
Electrical Connector	Standard SL16 cable Connector ( Pic.1 ) Optional 148 cm RF cable with SL6 connector (click Pic. 2 to order)
Power Requirement	DC (Max.) 250 W RF (Max.)100 W
Cathode Sputtering Current	3 Amp (Max.)
Cathode Sputtering Voltage	200 - 1,000 V
Operating Pressure Range	~1 mTorr to 1 Torr
Sputtering Thickness Uniformity Curve	NOTE: The Normalized Film Thickness graph above was obtained from depositing a ~200-nm thick film with a PVD HV Magnetron sputtering gun using a 1-inch Cu target. Measurements were performed using a 4-point probe in two mutually perpendicular directions (X, Y) across the wafer surface. The film was deposited onto an oxidized non-rotating Si wafer under the following conditions: 1. 150 Watts DC in 10 mTorr (Ar) 2. Distance of 3-inches (75-mm) from target to substrate
Water Cooling (Required)	Flow Rate requirement: 1/2 GPM, filtered Water Inlet Temperature: <20 C Water hook up: 0.25" O.D. quick disconnects
Electrical & Mounting Fittings	Electrical Connector: Standard HN type (DC and RF) High Vacuum Quick Disconnect is included. High vacuum Quick Disconnect with 0.75" ID (compatible with HVMSS-SPC-1-LD). Use this component to install the HVMSS-SPC-1-LD sputtering tool onto the baseplate (up to 1” thick) of a vacuum chamber with 1” diameter through-hole
Vacuum Flange with Feedthrough (Optional)	6" CF flange with a high vacuum feedthrough is available upon request at extra cost. The sputtering head can be easily installed on the 6'' CF vacuum flange through the quick vacuum clamp. The height position of the sputtering gun can be manually adjusted inside the vacuum chamber.
Overall Length	14 inches
Net Weight	3 lbs
Tilt Assembly	The sputtering head can be tilted +/- 45 degrees for adjusting the incidence angle of bombardments to improve the sputtering yield. Scribe lines on the tilt assembly offer precise angle adjustments.
Optional Accessories	Digital Temperature Controlled circulating Water Chiller with 6 Liters Tank, 16L / min Flow is available at extra cost, please order separately. MTI offers various sputtering accessories designed to be used with the HVMSS-SPC-1 magnetron sputtering gun for customers interested in creating custom DIY Magnetron Sputtering Coaters: