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Introducing our Yttrium Oxide (Y2O3) Sputtering Targets – the ultimate solution for your sputtering and deposition needs.
Crafted with utmost precision and cutting-edge technology, our sputtering targets are designed to deliver exceptional performance and reliability. Whether you require efficient sputtering or high-quality evaporation sources, our Yttrium Oxide (Y2O3) Sputtering Targets are here to meet your exact requirements.
As a leading provider of deposition materials, we understand the importance of consistency and uniformity in thin film deposition processes. Our Yttrium Oxide (Y2O3) Sputtering Targets offer excellent stoichiometry control, ensuring precise film composition and thickness. This makes them ideal for a wide range of applications, including semiconductor manufacturing, optical coatings, and research laboratories.
With a professional tone and unwavering commitment to quality, we assure you that our Yttrium Oxide (Y2O3) Sputtering Targets are manufactured to the highest standards. Our team of experts meticulously selects and tests the raw materials to ensure the utmost purity and integrity of the final product.
Experience enhanced performance and efficiency with our Yttrium Oxide (Y2O3) Sputtering Targets. Trust in our expertise and let us be your partner in achieving exceptional thin film deposition results. Contact us today to discuss your specific requirements and discover how our deposition materials can elevate your processes to new heights.
Yttrium Oxide (Y2O3) Specifications：
Material Type | Yttrium Oxide |
Symbol | Y2O3 |
Color/Appearance | White, Crystalline Solid |
Melting Point (°C) | 2,410 |
Theoretical Density (g/cc) | 5.01 |
Z Ratio | **1.00 |
Sputter | RF, RF-R |
Max Power Density (Watts/Square Inch) | 20* |
Type of Bond | Indium, Elastomer |
Comments | Loses oxygen; films smooth and clear. |
Introducing our Yttrium Oxide (Y2O3) Sputtering Targets – the ultimate solution for your sputtering and deposition needs.
Crafted with utmost precision and cutting-edge technology, our sputtering targets are designed to deliver exceptional performance and reliability. Whether you require efficient sputtering or high-quality evaporation sources, our Yttrium Oxide (Y2O3) Sputtering Targets are here to meet your exact requirements.
As a leading provider of deposition materials, we understand the importance of consistency and uniformity in thin film deposition processes. Our Yttrium Oxide (Y2O3) Sputtering Targets offer excellent stoichiometry control, ensuring precise film composition and thickness. This makes them ideal for a wide range of applications, including semiconductor manufacturing, optical coatings, and research laboratories.
With a professional tone and unwavering commitment to quality, we assure you that our Yttrium Oxide (Y2O3) Sputtering Targets are manufactured to the highest standards. Our team of experts meticulously selects and tests the raw materials to ensure the utmost purity and integrity of the final product.
Experience enhanced performance and efficiency with our Yttrium Oxide (Y2O3) Sputtering Targets. Trust in our expertise and let us be your partner in achieving exceptional thin film deposition results. Contact us today to discuss your specific requirements and discover how our deposition materials can elevate your processes to new heights.
Yttrium Oxide (Y2O3) Specifications：
Material Type | Yttrium Oxide |
Symbol | Y2O3 |
Color/Appearance | White, Crystalline Solid |
Melting Point (°C) | 2,410 |
Theoretical Density (g/cc) | 5.01 |
Z Ratio | **1.00 |
Sputter | RF, RF-R |
Max Power Density (Watts/Square Inch) | 20* |
Type of Bond | Indium, Elastomer |
Comments | Loses oxygen; films smooth and clear. |
