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Introducing our high-quality Yttrium (Y) Sputtering Targets, designed to meet the demanding requirements of various deposition processes. These targets are meticulously manufactured to ensure exceptional performance and reliability, making them the ideal choice for a wide range of applications.
Our Yttrium Sputtering Targets are specifically engineered for sputtering applications, providing excellent material utilization and uniform film deposition. With their superior purity and composition, they enable precise control over thin film growth, ensuring consistent results and minimizing defects.
In addition to sputtering targets, we also offer a comprehensive range of evaporation sources and other deposition materials. These products are meticulously crafted using advanced techniques, guaranteeing optimal performance and compatibility with various deposition systems.
Our commitment to quality is unwavering, as we adhere to strict manufacturing standards and conduct rigorous quality control measures. This ensures that our products consistently meet or exceed industry specifications, allowing you to achieve exceptional results in your deposition processes.
Whether you are involved in research, development, or large-scale production, our Yttrium Sputtering Targets, evaporation sources, and other deposition materials are the perfect choice for your thin film coating needs. Trust in our expertise and experience to deliver the highest level of quality and performance, enabling you to stay at the forefront of your field.
Invest in our Yttrium Sputtering Targets and related deposition materials today, and experience the difference in performance and reliability that sets us apart from the competition.
Yttrium (Y) Specifications:
Material Type | Yttrium |
Symbol | Y |
Atomic Weight | 88.90585 |
Atomic Number | 39 |
Color/Appearance | Silvery White, Metallic |
Thermal Conductivity | 17.2 W/m.K |
Melting Point (°C) | 1,522 |
Coefficient of Thermal Expansion | 10.6 x 10-6/K |
Theoretical Density (g/cc) | 4.47 |
Z Ratio | 0.835 |
Sputter | RF, DC |
Max Power Density (Watts/Square Inch) | 30* |
Type of Bond | Indium, Elastomer |
Comments | High Ta solubility. |
Introducing our high-quality Yttrium (Y) Sputtering Targets, designed to meet the demanding requirements of various deposition processes. These targets are meticulously manufactured to ensure exceptional performance and reliability, making them the ideal choice for a wide range of applications.
Our Yttrium Sputtering Targets are specifically engineered for sputtering applications, providing excellent material utilization and uniform film deposition. With their superior purity and composition, they enable precise control over thin film growth, ensuring consistent results and minimizing defects.
In addition to sputtering targets, we also offer a comprehensive range of evaporation sources and other deposition materials. These products are meticulously crafted using advanced techniques, guaranteeing optimal performance and compatibility with various deposition systems.
Our commitment to quality is unwavering, as we adhere to strict manufacturing standards and conduct rigorous quality control measures. This ensures that our products consistently meet or exceed industry specifications, allowing you to achieve exceptional results in your deposition processes.
Whether you are involved in research, development, or large-scale production, our Yttrium Sputtering Targets, evaporation sources, and other deposition materials are the perfect choice for your thin film coating needs. Trust in our expertise and experience to deliver the highest level of quality and performance, enabling you to stay at the forefront of your field.
Invest in our Yttrium Sputtering Targets and related deposition materials today, and experience the difference in performance and reliability that sets us apart from the competition.
Yttrium (Y) Specifications:
Material Type | Yttrium |
Symbol | Y |
Atomic Weight | 88.90585 |
Atomic Number | 39 |
Color/Appearance | Silvery White, Metallic |
Thermal Conductivity | 17.2 W/m.K |
Melting Point (°C) | 1,522 |
Coefficient of Thermal Expansion | 10.6 x 10-6/K |
Theoretical Density (g/cc) | 4.47 |
Z Ratio | 0.835 |
Sputter | RF, DC |
Max Power Density (Watts/Square Inch) | 30* |
Type of Bond | Indium, Elastomer |
Comments | High Ta solubility. |