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Introducing our top-quality Tungsten Carbide (WC) Sputtering Targets, designed to meet the demanding needs of various deposition processes. With our range of sputtering targets, evaporation sources, and other deposition materials, we provide the ideal solution for your thin film coating requirements.
Crafted with utmost precision and using advanced manufacturing techniques, our Tungsten Carbide (WC) Sputtering Targets offer exceptional performance and reliability. These targets are specifically engineered to ensure uniform and efficient film deposition, resulting in superior coating quality.
Our sputtering targets are meticulously designed to withstand high temperatures and intense plasma environments, guaranteeing prolonged durability and consistent performance. With their exceptional purity and controlled grain structure, they enable precise control over the deposition process, allowing you to achieve the desired film properties with utmost accuracy.
In addition to our Tungsten Carbide (WC) Sputtering Targets, we offer a comprehensive range of evaporation sources and other deposition materials. These products are carefully selected and manufactured to ensure compatibility with various deposition techniques, providing you with a complete solution for your thin film coating needs.
With our commitment to quality and customer satisfaction, we strive to deliver products that meet the highest industry standards. Our Tungsten Carbide (WC) Sputtering Targets, along with our extensive range of deposition materials, are trusted by researchers, engineers, and manufacturers worldwide for their exceptional performance and reliability.
Experience the difference of our Tungsten Carbide (WC) Sputtering Targets and other deposition materials, and elevate your thin film coating processes to new heights. Trust in our expertise and rely on our professional-grade products to achieve outstanding results in your deposition applications.
Tungsten Carbide (WC) Specifications:
Material Type | Tungsten Carbide |
Symbol | WC |
Melting Point (°C) | 2,860 |
Theoretical Density (g/cc) | 15.63 |
Z Ratio | 0.151 |
Sputter | RF |
Max Power Density (Watts/Square Inch) | 20* |
Type of Bond | Indium, Elastomer |
Introducing our top-quality Tungsten Carbide (WC) Sputtering Targets, designed to meet the demanding needs of various deposition processes. With our range of sputtering targets, evaporation sources, and other deposition materials, we provide the ideal solution for your thin film coating requirements.
Crafted with utmost precision and using advanced manufacturing techniques, our Tungsten Carbide (WC) Sputtering Targets offer exceptional performance and reliability. These targets are specifically engineered to ensure uniform and efficient film deposition, resulting in superior coating quality.
Our sputtering targets are meticulously designed to withstand high temperatures and intense plasma environments, guaranteeing prolonged durability and consistent performance. With their exceptional purity and controlled grain structure, they enable precise control over the deposition process, allowing you to achieve the desired film properties with utmost accuracy.
In addition to our Tungsten Carbide (WC) Sputtering Targets, we offer a comprehensive range of evaporation sources and other deposition materials. These products are carefully selected and manufactured to ensure compatibility with various deposition techniques, providing you with a complete solution for your thin film coating needs.
With our commitment to quality and customer satisfaction, we strive to deliver products that meet the highest industry standards. Our Tungsten Carbide (WC) Sputtering Targets, along with our extensive range of deposition materials, are trusted by researchers, engineers, and manufacturers worldwide for their exceptional performance and reliability.
Experience the difference of our Tungsten Carbide (WC) Sputtering Targets and other deposition materials, and elevate your thin film coating processes to new heights. Trust in our expertise and rely on our professional-grade products to achieve outstanding results in your deposition applications.
Tungsten Carbide (WC) Specifications:
Material Type | Tungsten Carbide |
Symbol | WC |
Melting Point (°C) | 2,860 |
Theoretical Density (g/cc) | 15.63 |
Z Ratio | 0.151 |
Sputter | RF |
Max Power Density (Watts/Square Inch) | 20* |
Type of Bond | Indium, Elastomer |
