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Introducing our top-of-the-line Permalloy (NiFeMoMn) Sputtering Targets, designed to meet your precise deposition needs. As a leading provider of sputtering targets, evaporation sources, and other deposition materials, we take pride in delivering exceptional quality and reliability.
Crafted with utmost precision, our Permalloy (NiFeMoMn) Sputtering Targets offer unparalleled performance in thin film deposition processes. These targets are specifically engineered to ensure uniformity, high purity, and excellent adhesion, making them ideal for a wide range of applications.
With our Permalloy (NiFeMoMn) Sputtering Targets, you can achieve exceptional film quality and control, enabling you to enhance the performance and reliability of your thin film devices. Whether you are working in the semiconductor, optical coating, or display industries, our sputtering targets will provide you with the consistency and accuracy you require.
Our commitment to professionalism and excellence is reflected in every aspect of our products. Each Permalloy (NiFeMoMn) Sputtering Target undergoes rigorous quality control measures to ensure it meets the highest industry standards. We understand the importance of reliable deposition materials in achieving your desired results, and we strive to exceed your expectations.
Partner with us and experience the difference our Permalloy (NiFeMoMn) Sputtering Targets can make in your thin film deposition processes. Trust in our expertise, reliability, and dedication to delivering the finest quality products. Contact us today to learn more about our comprehensive range of sputtering targets, evaporation sources, and other deposition materials.
Permalloy (Ni/Fe/Mo/Mn) Specifications：
Material Type | Permalloy® † |
Symbol | Ni/Fe/Mo/Mn |
Melting Point (°C) | 1,395 |
Theoretical Density (g/cc) | 8.7 |
Ferromagnetic | Magnetic Material |
Z Ratio | **1.00 |
Sputter | DC |
Comments | Film low in Ni. |
Introducing our top-of-the-line Permalloy (NiFeMoMn) Sputtering Targets, designed to meet your precise deposition needs. As a leading provider of sputtering targets, evaporation sources, and other deposition materials, we take pride in delivering exceptional quality and reliability.
Crafted with utmost precision, our Permalloy (NiFeMoMn) Sputtering Targets offer unparalleled performance in thin film deposition processes. These targets are specifically engineered to ensure uniformity, high purity, and excellent adhesion, making them ideal for a wide range of applications.
With our Permalloy (NiFeMoMn) Sputtering Targets, you can achieve exceptional film quality and control, enabling you to enhance the performance and reliability of your thin film devices. Whether you are working in the semiconductor, optical coating, or display industries, our sputtering targets will provide you with the consistency and accuracy you require.
Our commitment to professionalism and excellence is reflected in every aspect of our products. Each Permalloy (NiFeMoMn) Sputtering Target undergoes rigorous quality control measures to ensure it meets the highest industry standards. We understand the importance of reliable deposition materials in achieving your desired results, and we strive to exceed your expectations.
Partner with us and experience the difference our Permalloy (NiFeMoMn) Sputtering Targets can make in your thin film deposition processes. Trust in our expertise, reliability, and dedication to delivering the finest quality products. Contact us today to learn more about our comprehensive range of sputtering targets, evaporation sources, and other deposition materials.
Permalloy (Ni/Fe/Mo/Mn) Specifications：
Material Type | Permalloy® † |
Symbol | Ni/Fe/Mo/Mn |
Melting Point (°C) | 1,395 |
Theoretical Density (g/cc) | 8.7 |
Ferromagnetic | Magnetic Material |
Z Ratio | **1.00 |
Sputter | DC |
Comments | Film low in Ni. |
