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Introducing our Tungsten (W) Sputtering Targets, the epitome of excellence in the field of thin film deposition. These meticulously crafted products are designed to meet the highest industry standards, making them the ideal choice for sputtering targets, evaporation sources, and other deposition materials.
Our Tungsten (W) Sputtering Targets are engineered with utmost precision, ensuring exceptional performance and durability. These targets are specifically tailored to meet the demanding requirements of various applications, including semiconductor manufacturing, optical coatings, and thin film solar cells.
Crafted from high-quality tungsten, our sputtering targets offer unparalleled purity and uniformity, guaranteeing consistent and reliable results. The exceptional thermal conductivity and excellent adhesion properties of tungsten make our targets highly efficient, enabling precise and controlled deposition processes.
With a wide range of sizes and configurations available, our Tungsten (W) Sputtering Targets can be customized to suit your specific requirements. Our team of experts is dedicated to providing tailored solutions to meet your exacting needs, ensuring maximum efficiency and productivity in your deposition processes.
Choose our Tungsten (W) Sputtering Targets for their outstanding performance, reliability, and longevity. Experience the difference of working with industry-leading deposition materials that are trusted by professionals worldwide.
Invest in excellence with our Tungsten (W) Sputtering Targets. Contact us today to explore our comprehensive range of deposition materials and discover how we can elevate your thin film deposition processes to new heights.
Tungsten (W) Specifications:
Material Type | Tungsten |
Symbol | W |
Atomic Weight | 183.84 |
Atomic Number | 74 |
Color/Appearance | Grayish White, Lustrous, Metallic |
Thermal Conductivity | 174 W/m.K |
Melting Point (°C) | 3,410 |
Coefficient of Thermal Expansion | 4.5 x 10-6/K |
Theoretical Density (g/cc) | 19.25 |
Z Ratio | 0.163 |
Sputter | DC |
Max Power Density (Watts/Square Inch) | 100* |
Type of Bond | Indium, Elastomer |
Comments | Forms volatile oxides. Films hard and adherent. |
Introducing our Tungsten (W) Sputtering Targets, the epitome of excellence in the field of thin film deposition. These meticulously crafted products are designed to meet the highest industry standards, making them the ideal choice for sputtering targets, evaporation sources, and other deposition materials.
Our Tungsten (W) Sputtering Targets are engineered with utmost precision, ensuring exceptional performance and durability. These targets are specifically tailored to meet the demanding requirements of various applications, including semiconductor manufacturing, optical coatings, and thin film solar cells.
Crafted from high-quality tungsten, our sputtering targets offer unparalleled purity and uniformity, guaranteeing consistent and reliable results. The exceptional thermal conductivity and excellent adhesion properties of tungsten make our targets highly efficient, enabling precise and controlled deposition processes.
With a wide range of sizes and configurations available, our Tungsten (W) Sputtering Targets can be customized to suit your specific requirements. Our team of experts is dedicated to providing tailored solutions to meet your exacting needs, ensuring maximum efficiency and productivity in your deposition processes.
Choose our Tungsten (W) Sputtering Targets for their outstanding performance, reliability, and longevity. Experience the difference of working with industry-leading deposition materials that are trusted by professionals worldwide.
Invest in excellence with our Tungsten (W) Sputtering Targets. Contact us today to explore our comprehensive range of deposition materials and discover how we can elevate your thin film deposition processes to new heights.
Tungsten (W) Specifications:
Material Type | Tungsten |
Symbol | W |
Atomic Weight | 183.84 |
Atomic Number | 74 |
Color/Appearance | Grayish White, Lustrous, Metallic |
Thermal Conductivity | 174 W/m.K |
Melting Point (°C) | 3,410 |
Coefficient of Thermal Expansion | 4.5 x 10-6/K |
Theoretical Density (g/cc) | 19.25 |
Z Ratio | 0.163 |
Sputter | DC |
Max Power Density (Watts/Square Inch) | 100* |
Type of Bond | Indium, Elastomer |
Comments | Forms volatile oxides. Films hard and adherent. |
