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Introducing our top-of-the-line Titanium Nitride (TiN) Sputtering Targets, designed to meet the demanding requirements of various deposition processes. With our extensive expertise in thin film technology, we offer a range of high-quality sputtering targets, evaporation sources, and other deposition materials to cater to your specific needs.
Our Titanium Nitride Sputtering Targets are meticulously engineered using premium-grade materials, ensuring exceptional performance and long-lasting durability. With a professional tone of voice, we assure you that our products meet the highest industry standards, making them ideal for applications in semiconductor, optical, and decorative coatings.
These sputtering targets are designed to deliver precise and uniform deposition, allowing for the creation of thin films with excellent adhesion and uniformity. The Titanium Nitride coating produced by our targets exhibits remarkable hardness, wear resistance, and corrosion resistance, making it an ideal choice for applications requiring enhanced surface properties.
Our comprehensive range of evaporation sources and other deposition materials further enhances the versatility of our product line. Whether you require materials for thermal evaporation, electron beam evaporation, or magnetron sputtering, we have you covered.
At [Company Name], we take pride in our commitment to providing reliable and high-performance solutions for your thin film deposition needs. Our Titanium Nitride Sputtering Targets, along with our extensive range of deposition materials, are backed by our team of experts who are readily available to assist you in achieving your desired results.
Choose our Titanium Nitride Sputtering Targets for their exceptional quality, reliability, and performance. Experience the difference in your deposition processes with our professional-grade products. Contact us today to discuss your specific requirements and let us help you find the perfect solution for your thin film deposition needs.
Titanium Nitride (TiN) Specifications：
Material Type | Titanium Nitride |
Symbol | TiN |
Color/Appearance | Yellow-Brown, Crystalline Solid |
Melting Point (°C) | 2,930 |
Theoretical Density (g/cc) | 5.4 |
Z Ratio | **1.00 |
Sputter | RF, RF-R |
Max Power Density (Watts/Square Inch) | 20* |
Type of Bond | Indium, Elastomer |
Comments | Sputtering preferred. Decomposes with thermal evaporation. |
Introducing our top-of-the-line Titanium Nitride (TiN) Sputtering Targets, designed to meet the demanding requirements of various deposition processes. With our extensive expertise in thin film technology, we offer a range of high-quality sputtering targets, evaporation sources, and other deposition materials to cater to your specific needs.
Our Titanium Nitride Sputtering Targets are meticulously engineered using premium-grade materials, ensuring exceptional performance and long-lasting durability. With a professional tone of voice, we assure you that our products meet the highest industry standards, making them ideal for applications in semiconductor, optical, and decorative coatings.
These sputtering targets are designed to deliver precise and uniform deposition, allowing for the creation of thin films with excellent adhesion and uniformity. The Titanium Nitride coating produced by our targets exhibits remarkable hardness, wear resistance, and corrosion resistance, making it an ideal choice for applications requiring enhanced surface properties.
Our comprehensive range of evaporation sources and other deposition materials further enhances the versatility of our product line. Whether you require materials for thermal evaporation, electron beam evaporation, or magnetron sputtering, we have you covered.
At [Company Name], we take pride in our commitment to providing reliable and high-performance solutions for your thin film deposition needs. Our Titanium Nitride Sputtering Targets, along with our extensive range of deposition materials, are backed by our team of experts who are readily available to assist you in achieving your desired results.
Choose our Titanium Nitride Sputtering Targets for their exceptional quality, reliability, and performance. Experience the difference in your deposition processes with our professional-grade products. Contact us today to discuss your specific requirements and let us help you find the perfect solution for your thin film deposition needs.
Titanium Nitride (TiN) Specifications：
Material Type | Titanium Nitride |
Symbol | TiN |
Color/Appearance | Yellow-Brown, Crystalline Solid |
Melting Point (°C) | 2,930 |
Theoretical Density (g/cc) | 5.4 |
Z Ratio | **1.00 |
Sputter | RF, RF-R |
Max Power Density (Watts/Square Inch) | 20* |
Type of Bond | Indium, Elastomer |
Comments | Sputtering preferred. Decomposes with thermal evaporation. |
