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Introducing our Titanium Dioxide (TiO2) Sputtering Targets, the ultimate solution for your sputtering and deposition needs. Designed to deliver exceptional performance, these targets are meticulously crafted to meet the highest industry standards.
Our Titanium Dioxide (TiO2) Sputtering Targets are specifically engineered for sputtering processes, making them ideal for various applications such as thin film deposition, optical coatings, and semiconductor manufacturing. With their exceptional purity and uniformity, these targets ensure precise and consistent deposition, resulting in superior film quality.
Crafted with utmost precision, our Titanium Dioxide (TiO2) Sputtering Targets offer exceptional thermal conductivity and excellent adhesion properties. This ensures efficient heat dissipation during the sputtering process, preventing target damage and enhancing overall performance.
In addition to sputtering targets, we also provide a comprehensive range of evaporation sources and other deposition materials. Whether you require high-purity materials or custom-made solutions, our products are designed to fulfill your unique requirements.
At [Company Name], we pride ourselves on delivering products of the highest quality. Our Titanium Dioxide (TiO2) Sputtering Targets undergo rigorous testing and quality control measures to ensure their reliability and durability. With our commitment to excellence, you can trust that our products will exceed your expectations.
Choose our Titanium Dioxide (TiO2) Sputtering Targets for your deposition needs and experience unmatched performance, reliability, and precision. Contact us today to discuss your specific requirements and let our team of experts assist you in finding the perfect solution for your applications.
Titanium Dioxide (TiO2) Specifications
Material Type | Titanium (IV) Oxide |
Symbol | TiO2 |
Color/Appearance | White-Beige, Gray-Black |
Melting Point (°C) | 1,830 |
Theoretical Density (g/cc) | 4.23 |
Z Ratio | 0.4 |
Sputter | RF, RF-R |
Max Power Density (Watts/Square Inch) | 20* |
Type of Bond | Indium, Elastomer |
Comments | Suboxide, must be reoxidized to rutile. Ta reduces TiO2 to TiO and Ti. |
Material Type | Titanium (IV) Oxide |
Introducing our Titanium Dioxide (TiO2) Sputtering Targets, the ultimate solution for your sputtering and deposition needs. Designed to deliver exceptional performance, these targets are meticulously crafted to meet the highest industry standards.
Our Titanium Dioxide (TiO2) Sputtering Targets are specifically engineered for sputtering processes, making them ideal for various applications such as thin film deposition, optical coatings, and semiconductor manufacturing. With their exceptional purity and uniformity, these targets ensure precise and consistent deposition, resulting in superior film quality.
Crafted with utmost precision, our Titanium Dioxide (TiO2) Sputtering Targets offer exceptional thermal conductivity and excellent adhesion properties. This ensures efficient heat dissipation during the sputtering process, preventing target damage and enhancing overall performance.
In addition to sputtering targets, we also provide a comprehensive range of evaporation sources and other deposition materials. Whether you require high-purity materials or custom-made solutions, our products are designed to fulfill your unique requirements.
At [Company Name], we pride ourselves on delivering products of the highest quality. Our Titanium Dioxide (TiO2) Sputtering Targets undergo rigorous testing and quality control measures to ensure their reliability and durability. With our commitment to excellence, you can trust that our products will exceed your expectations.
Choose our Titanium Dioxide (TiO2) Sputtering Targets for your deposition needs and experience unmatched performance, reliability, and precision. Contact us today to discuss your specific requirements and let our team of experts assist you in finding the perfect solution for your applications.
Titanium Dioxide (TiO2) Specifications
Material Type | Titanium (IV) Oxide |
Symbol | TiO2 |
Color/Appearance | White-Beige, Gray-Black |
Melting Point (°C) | 1,830 |
Theoretical Density (g/cc) | 4.23 |
Z Ratio | 0.4 |
Sputter | RF, RF-R |
Max Power Density (Watts/Square Inch) | 20* |
Type of Bond | Indium, Elastomer |
Comments | Suboxide, must be reoxidized to rutile. Ta reduces TiO2 to TiO and Ti. |
Material Type | Titanium (IV) Oxide |
