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Introducing our Tungsten Oxide (WO3) Sputtering Targets, the epitome of high-quality deposition materials. Designed for professional applications, our sputtering targets are meticulously crafted to provide exceptional performance and reliability.
Crafted with utmost precision, our Tungsten Oxide (WO3) Sputtering Targets are ideal for use in various sputtering and evaporation processes. These targets are specifically engineered to deliver consistent and uniform film deposition, ensuring optimal results in thin film applications.
Our Tungsten Oxide (WO3) Sputtering Targets are manufactured using advanced techniques and superior quality tungsten oxide materials. This guarantees the highest purity levels, resulting in minimal impurities and enhanced film quality. With our sputtering targets, you can achieve precise control over film thickness and composition, enabling you to meet even the most demanding requirements of your deposition processes.
In addition to sputtering targets, we also offer a wide range of evaporation sources and other deposition materials. These materials are carefully selected to provide excellent thermal stability and compatibility with various deposition techniques. Whether you require materials for thermal evaporation, electron beam evaporation, or magnetron sputtering, our comprehensive selection ensures that you can find the perfect solution for your specific needs.
Choose our Tungsten Oxide (WO3) Sputtering Targets and deposition materials for unparalleled performance, reliability, and consistency in your thin film applications. Trust our professional-grade products to elevate your deposition processes to new heights of excellence.
Tungsten Oxide (WO3) Specifications：
Material Type | Tungsten Oxide |
Symbol | WO3 |
Color/Appearance | Lemon Yellow, Solid |
Melting Point (°C) | 1,473 |
Theoretical Density (g/cc) | 7.16 |
Z Ratio | **1.00 |
Sputter | RF-R |
Type of Bond | Indium, Elastomer |
Comments | Preheat gently to outgas. W reduces oxide slightly. |
Introducing our Tungsten Oxide (WO3) Sputtering Targets, the epitome of high-quality deposition materials. Designed for professional applications, our sputtering targets are meticulously crafted to provide exceptional performance and reliability.
Crafted with utmost precision, our Tungsten Oxide (WO3) Sputtering Targets are ideal for use in various sputtering and evaporation processes. These targets are specifically engineered to deliver consistent and uniform film deposition, ensuring optimal results in thin film applications.
Our Tungsten Oxide (WO3) Sputtering Targets are manufactured using advanced techniques and superior quality tungsten oxide materials. This guarantees the highest purity levels, resulting in minimal impurities and enhanced film quality. With our sputtering targets, you can achieve precise control over film thickness and composition, enabling you to meet even the most demanding requirements of your deposition processes.
In addition to sputtering targets, we also offer a wide range of evaporation sources and other deposition materials. These materials are carefully selected to provide excellent thermal stability and compatibility with various deposition techniques. Whether you require materials for thermal evaporation, electron beam evaporation, or magnetron sputtering, our comprehensive selection ensures that you can find the perfect solution for your specific needs.
Choose our Tungsten Oxide (WO3) Sputtering Targets and deposition materials for unparalleled performance, reliability, and consistency in your thin film applications. Trust our professional-grade products to elevate your deposition processes to new heights of excellence.
Tungsten Oxide (WO3) Specifications：
Material Type | Tungsten Oxide |
Symbol | WO3 |
Color/Appearance | Lemon Yellow, Solid |
Melting Point (°C) | 1,473 |
Theoretical Density (g/cc) | 7.16 |
Z Ratio | **1.00 |
Sputter | RF-R |
Type of Bond | Indium, Elastomer |
Comments | Preheat gently to outgas. W reduces oxide slightly. |
