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Introducing our Titanium (Ti) Sputtering Targets, the epitome of excellence in the field of deposition materials. Designed to meet the highest industry standards, our sputtering targets are meticulously crafted to deliver exceptional performance in various applications.
With a focus on precision and reliability, our Titanium (Ti) Sputtering Targets are the ideal choice for sputtering and evaporation processes. These targets are engineered to provide consistent and uniform film deposition, ensuring superior results every time.
Crafted from high-quality titanium material, our sputtering targets offer excellent thermal conductivity and exceptional resistance to corrosion. This makes them highly durable and long-lasting, reducing the need for frequent replacements and minimizing downtime.
Our Titanium (Ti) Sputtering Targets are available in a wide range of sizes and configurations, allowing for compatibility with different deposition systems. Whether you are working in research and development or industrial production, our targets will seamlessly integrate into your existing setup, enhancing efficiency and productivity.
With our commitment to quality, you can trust that our Titanium (Ti) Sputtering Targets will meet your exact specifications. Each target undergoes rigorous testing and quality control procedures to ensure optimal performance and adherence to industry standards.
Partner with us and experience the difference our Titanium (Ti) Sputtering Targets can make in your deposition processes. Elevate your projects to new heights with our reliable and high-performance sputtering targets, evaporation sources, and other top-notch deposition materials.
Titanium (Ti) Specifications:
Material Type | Titanium |
Symbol | Ti |
Atomic Weight | 47.867 |
Atomic Number | 22 |
Color/Appearance | Silvery Metallic |
Thermal Conductivity | 21.9 W/m.K |
Melting Point (°C) | 1,660 |
Coefficient of Thermal Expansion | 8.6 x 10-6/K |
Theoretical Density (g/cc) | 4.5 |
Z Ratio | 0.628 |
Sputter | DC |
Max Power Density (Watts/Square Inch) | 50* |
Type of Bond | Indium, Elastomer |
Comments | Alloys with W/Ta/Mo; evolves gas on first heating. |
Introducing our Titanium (Ti) Sputtering Targets, the epitome of excellence in the field of deposition materials. Designed to meet the highest industry standards, our sputtering targets are meticulously crafted to deliver exceptional performance in various applications.
With a focus on precision and reliability, our Titanium (Ti) Sputtering Targets are the ideal choice for sputtering and evaporation processes. These targets are engineered to provide consistent and uniform film deposition, ensuring superior results every time.
Crafted from high-quality titanium material, our sputtering targets offer excellent thermal conductivity and exceptional resistance to corrosion. This makes them highly durable and long-lasting, reducing the need for frequent replacements and minimizing downtime.
Our Titanium (Ti) Sputtering Targets are available in a wide range of sizes and configurations, allowing for compatibility with different deposition systems. Whether you are working in research and development or industrial production, our targets will seamlessly integrate into your existing setup, enhancing efficiency and productivity.
With our commitment to quality, you can trust that our Titanium (Ti) Sputtering Targets will meet your exact specifications. Each target undergoes rigorous testing and quality control procedures to ensure optimal performance and adherence to industry standards.
Partner with us and experience the difference our Titanium (Ti) Sputtering Targets can make in your deposition processes. Elevate your projects to new heights with our reliable and high-performance sputtering targets, evaporation sources, and other top-notch deposition materials.
Titanium (Ti) Specifications:
Material Type | Titanium |
Symbol | Ti |
Atomic Weight | 47.867 |
Atomic Number | 22 |
Color/Appearance | Silvery Metallic |
Thermal Conductivity | 21.9 W/m.K |
Melting Point (°C) | 1,660 |
Coefficient of Thermal Expansion | 8.6 x 10-6/K |
Theoretical Density (g/cc) | 4.5 |
Z Ratio | 0.628 |
Sputter | DC |
Max Power Density (Watts/Square Inch) | 50* |
Type of Bond | Indium, Elastomer |
Comments | Alloys with W/Ta/Mo; evolves gas on first heating. |
