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Tin (Sn) Sputtering Targets

sputtering targets, evaporation sources and other deposition materials
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  • TN

Introducing our premium Tin (Sn) Sputtering Targets, meticulously crafted to meet the highest industry standards. Designed to cater to the diverse needs of professionals in the field of thin film deposition, our sputtering targets offer exceptional performance and reliability.


Crafted with utmost precision, our Tin (Sn) Sputtering Targets are ideal for a wide range of applications, including the production of semiconductors, optical coatings, and thin film solar cells. With their exceptional purity and uniformity, these targets ensure consistent and flawless deposition, allowing for the creation of high-quality thin films.


In addition to our sputtering targets, we also offer a comprehensive range of evaporation sources and other deposition materials. These products are carefully engineered to provide optimal results in various thin film deposition processes. Whether you require materials for thermal evaporation, electron beam evaporation, or magnetron sputtering, our offerings are designed to meet your specific requirements.


At our company, we understand the importance of reliable and high-performance materials in achieving successful thin film deposition. That's why we adhere to stringent quality control measures throughout the manufacturing process. Our team of experts ensures that each sputtering target, evaporation source, and deposition material meets the highest standards of purity, composition, and uniformity.


Choose our Tin (Sn) Sputtering Targets, evaporation sources, and other deposition materials for unrivaled performance and exceptional results in your thin film deposition processes. Trust in our commitment to delivering top-notch products that enable you to push the boundaries of innovation and achieve your desired outcomes.

Tin (Sn) Specifications:

Material Type

Tin

Symbol

Sn

Atomic Weight

118.71

Atomic Number

50

Color/Appearance

Silvery Lustrous Gray,   Metallic

Thermal Conductivity

66.6 W/m.K

Melting Point (°C)

232

Coefficient of Thermal Expansion

22 x 10-6/K

Theoretical Density (g/cc)

7.28

Z Ratio

0.724

Sputter

DC

Max Power Density

(Watts/Square Inch)

10*

Type of Bond

Elastomer

Comments

Wets Mo low sputter power.   Use Ta liner in E-beam guns. Low Melting Point materials not ideal for   sputtering.


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Zhengzhou Tainuo Thin Film Materials Co., Ltd.
Which is a manufacturer specializing in the production of laboratory scientific instruments. Our products are widely used in colleges, research institutions and laboratories.

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