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Introducing our high-quality Tantalum Oxide (Ta2O5) Sputtering Targets, designed to meet your advanced deposition needs.
Crafted with utmost precision, our sputtering targets offer exceptional performance and reliability in various thin film deposition applications. Whether you require deposition materials for sputtering or evaporation sources, our Tantalum Oxide (Ta2O5) Sputtering Targets are your ideal choice.
With a professional tone of voice, we assure you that our products are manufactured using state-of-the-art technology and adhere to strict quality standards. Our team of experts ensures that each sputtering target is meticulously crafted to deliver consistent and uniform film deposition.
The Tantalum Oxide (Ta2O5) Sputtering Targets boast remarkable features that make them stand out in the industry. These include high purity, excellent thermal stability, and exceptional electrical conductivity. Their superior performance guarantees efficient and precise thin film deposition, enabling you to achieve optimal results in your research or production processes.
Our commitment to providing top-notch products extends to our exceptional customer service. Our knowledgeable team is always ready to assist you in selecting the right sputtering targets, evaporation sources, or other deposition materials that best suit your specific requirements.
Choose our Tantalum Oxide (Ta2O5) Sputtering Targets for outstanding performance, reliability, and durability. Experience the difference in your thin film deposition processes with our high-quality products.
Tantalum Oxide (Ta2O5) Specifications：
Material Type | Tantalum Pentoxide |
Symbol | Ta2O5 |
Color/Appearance | White, Crystalline Solid |
Melting Point (°C) | 1,872 |
Theoretical Density (g/cc) | 8.2 |
Z Ratio | 0.3 |
Sputter | RF, RF-R |
Max Power Density (Watts/Square Inch) | 20* |
Type of Bond | Indium, Elastomer |
Comments | Slight decomposition. Evaporate Ta in 10-3 Torr O2. |
Introducing our high-quality Tantalum Oxide (Ta2O5) Sputtering Targets, designed to meet your advanced deposition needs.
Crafted with utmost precision, our sputtering targets offer exceptional performance and reliability in various thin film deposition applications. Whether you require deposition materials for sputtering or evaporation sources, our Tantalum Oxide (Ta2O5) Sputtering Targets are your ideal choice.
With a professional tone of voice, we assure you that our products are manufactured using state-of-the-art technology and adhere to strict quality standards. Our team of experts ensures that each sputtering target is meticulously crafted to deliver consistent and uniform film deposition.
The Tantalum Oxide (Ta2O5) Sputtering Targets boast remarkable features that make them stand out in the industry. These include high purity, excellent thermal stability, and exceptional electrical conductivity. Their superior performance guarantees efficient and precise thin film deposition, enabling you to achieve optimal results in your research or production processes.
Our commitment to providing top-notch products extends to our exceptional customer service. Our knowledgeable team is always ready to assist you in selecting the right sputtering targets, evaporation sources, or other deposition materials that best suit your specific requirements.
Choose our Tantalum Oxide (Ta2O5) Sputtering Targets for outstanding performance, reliability, and durability. Experience the difference in your thin film deposition processes with our high-quality products.
Tantalum Oxide (Ta2O5) Specifications：
Material Type | Tantalum Pentoxide |
Symbol | Ta2O5 |
Color/Appearance | White, Crystalline Solid |
Melting Point (°C) | 1,872 |
Theoretical Density (g/cc) | 8.2 |
Z Ratio | 0.3 |
Sputter | RF, RF-R |
Max Power Density (Watts/Square Inch) | 20* |
Type of Bond | Indium, Elastomer |
Comments | Slight decomposition. Evaporate Ta in 10-3 Torr O2. |
