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TN-PSP180G-3TA-RSH
TN
small plasma sputtering coating machine provides precise and uniform coating on various materials such as Gold, Platinum, and Indium. The compact design of this machine makes it suitable for small lab spaces.
Equipped with a rotary target and a rotary heating stage, this plasma sputtering coating machine ensures efficient and even coating distribution. The two-stage sputtering method enhances the coating quality and allows for better control over the deposition process.
With its low-temperature plasma sputtering technology, this machine offers a gentle coating process, minimizing any potential damage to the substrate. This is particularly important for delicate samples or sensitive materials.
The small lab 3 rotary target compact plasma sputter is designed for SEM sample preparation and metal coating experiments. It is an essential tool for researchers and scientists in various fields such as materials science, nanotechnology, and surface analysis.
In addition to its reliable performance, this machine is user-friendly, with intuitive controls and a user-friendly interface. It is easy to operate, even for those with limited experience in plasma sputtering.
Investing in this small lab 3 rotary target compact plasma sputter with a rotary heating stage is a wise choice for laboratories and research facilities. It offers precise and uniform coating results, ensuring accurate and reproducible experiments. Its compact size and efficient design make it a valuable addition to any lab space.
Choose this plasma sputtering coating machine for your research needs and experience professional-grade coating capabilities.
Technical parameters:
Product model | TN-PSP180G-3TA-RSH | |
Sample stage | Size | 100mm |
Distance from sample stage to target surface | 20~35mm height adjustable | |
Rotating speed | 1~20rpm adjustable | |
Heating temperature | ≤500℃ | |
Temperature control accuracy | ±1℃ PID temperature control | |
Plasma sputtering source | Quantity | 2 inchesx1/2/3 |
Cooling method | Water cooling/Natural cooling | |
Vacuum chamber | Chamber size | φ180mm x 210mm |
Observation window | Omnidirectional visibility | |
Chamber material | High purity quartz | |
Open method | Top cover removable | |
Upper and lower cover material | 304 stainless steel | |
Pumping port | KF16 | |
Intake port | 1/4 inch ferrule connector | |
Power configuration | Quantity | DC power supplyx1 |
Output power | Max. 150W | |
Sputtering power | 1200V | |
Max. sputtering current | 50mA | |
Vacuum system | Vacuum pump type | Dual-stage rotary vane vacuum pump |
Pumping port | KF16 | |
Exhaust interface | KF16 | |
Pumping rate | 1.1L/s(4m3/h) | |
Ultimate vacuum | ≥0.1Pa | |
Vacuum measurement | Resistance vacuum gauge | |
Others | Power supply | AC 220V 50Hz |
Total power | 1.5kW/2kW | |
Dimension | 500mm x 320mm x470mm | |
Weight | 30kg |
small plasma sputtering coating machine provides precise and uniform coating on various materials such as Gold, Platinum, and Indium. The compact design of this machine makes it suitable for small lab spaces.
Equipped with a rotary target and a rotary heating stage, this plasma sputtering coating machine ensures efficient and even coating distribution. The two-stage sputtering method enhances the coating quality and allows for better control over the deposition process.
With its low-temperature plasma sputtering technology, this machine offers a gentle coating process, minimizing any potential damage to the substrate. This is particularly important for delicate samples or sensitive materials.
The small lab 3 rotary target compact plasma sputter is designed for SEM sample preparation and metal coating experiments. It is an essential tool for researchers and scientists in various fields such as materials science, nanotechnology, and surface analysis.
In addition to its reliable performance, this machine is user-friendly, with intuitive controls and a user-friendly interface. It is easy to operate, even for those with limited experience in plasma sputtering.
Investing in this small lab 3 rotary target compact plasma sputter with a rotary heating stage is a wise choice for laboratories and research facilities. It offers precise and uniform coating results, ensuring accurate and reproducible experiments. Its compact size and efficient design make it a valuable addition to any lab space.
Choose this plasma sputtering coating machine for your research needs and experience professional-grade coating capabilities.
Technical parameters:
Product model | TN-PSP180G-3TA-RSH | |
Sample stage | Size | 100mm |
Distance from sample stage to target surface | 20~35mm height adjustable | |
Rotating speed | 1~20rpm adjustable | |
Heating temperature | ≤500℃ | |
Temperature control accuracy | ±1℃ PID temperature control | |
Plasma sputtering source | Quantity | 2 inchesx1/2/3 |
Cooling method | Water cooling/Natural cooling | |
Vacuum chamber | Chamber size | φ180mm x 210mm |
Observation window | Omnidirectional visibility | |
Chamber material | High purity quartz | |
Open method | Top cover removable | |
Upper and lower cover material | 304 stainless steel | |
Pumping port | KF16 | |
Intake port | 1/4 inch ferrule connector | |
Power configuration | Quantity | DC power supplyx1 |
Output power | Max. 150W | |
Sputtering power | 1200V | |
Max. sputtering current | 50mA | |
Vacuum system | Vacuum pump type | Dual-stage rotary vane vacuum pump |
Pumping port | KF16 | |
Exhaust interface | KF16 | |
Pumping rate | 1.1L/s(4m3/h) | |
Ultimate vacuum | ≥0.1Pa | |
Vacuum measurement | Resistance vacuum gauge | |
Others | Power supply | AC 220V 50Hz |
Total power | 1.5kW/2kW | |
Dimension | 500mm x 320mm x470mm | |
Weight | 30kg |