| Quantity: | |
|---|---|
TN-PSP180G-3TA-R
TN
ering technology, it provides a precise and uniform coating on various materials. The machine is equipped with a quartz glass chamber, ensuring high visibility during the coating process.
With its compact design, this plasma sputtering coater machine is suitable for small-scale laboratory applications. It offers the capability to coat samples with both gold (Au) and platinum (Pt) materials, making it versatile for a range of research needs.
The two-stage sputtering method employed by this machine guarantees excellent film adhesion and uniformity, resulting in high-quality coatings. It is an ideal choice for SEM sample preparation, allowing researchers to achieve accurate and reliable results.
Additionally, the low-temperature plasma sputtering technology used by this coater machine minimizes the risk of sample damage or distortion, ensuring the integrity of the specimens.
Invest in this three target plasma sputtering coater machine with a quartz glass chamber for Au and Pt coatings, and elevate your research capabilities with its precise and efficient performance.
Technical parameters:
Product model | TN-PSP180G-3TA-R | |
Sample stage | Size | 100mm |
Distance from sample stage to target surface | 20~35mm height adjustable | |
Rotating speed | 1~20rpm adjustable | |
Heating temperature | ≤500℃ | |
Temperature control accuracy | ±1℃ PID temperature control | |
Plasma sputtering source | Quantity | 2 inchesx1/2/3 |
Cooling method | Water cooling/Natural cooling | |
Vacuum chamber | Chamber size | φ180mm x 210mm |
Observation window | Omnidirectional visibility | |
Chamber material | High purity quartz | |
Open method | Top cover removable | |
Upper and lower cover material | 304 stainless steel | |
Pumping port | KF16 | |
Intake port | 1/4 inch ferrule connector | |
Power configuration | Quantity | DC power supplyx1 |
Output power | Max. 150W | |
Sputtering power | 1200V | |
Max. sputtering current | 50mA | |
Vacuum system | Vacuum pump type | Dual-stage rotary vane vacuum pump |
Pumping port | KF16 | |
Exhaust interface | KF16 | |
Pumping rate | 1.1L/s（4m3/h） | |
Ultimate vacuum | ≥0.1Pa | |
Vacuum measurement | Resistance vacuum gauge | |
Others | Power supply | AC 220V 50Hz |
Total power | 1.5kW/2kW | |
Dimension | 500mm x 320mm x470mm | |
Weight | 30kg | |
ering technology, it provides a precise and uniform coating on various materials. The machine is equipped with a quartz glass chamber, ensuring high visibility during the coating process.
With its compact design, this plasma sputtering coater machine is suitable for small-scale laboratory applications. It offers the capability to coat samples with both gold (Au) and platinum (Pt) materials, making it versatile for a range of research needs.
The two-stage sputtering method employed by this machine guarantees excellent film adhesion and uniformity, resulting in high-quality coatings. It is an ideal choice for SEM sample preparation, allowing researchers to achieve accurate and reliable results.
Additionally, the low-temperature plasma sputtering technology used by this coater machine minimizes the risk of sample damage or distortion, ensuring the integrity of the specimens.
Invest in this three target plasma sputtering coater machine with a quartz glass chamber for Au and Pt coatings, and elevate your research capabilities with its precise and efficient performance.
Technical parameters:
Product model | TN-PSP180G-3TA-R | |
Sample stage | Size | 100mm |
Distance from sample stage to target surface | 20~35mm height adjustable | |
Rotating speed | 1~20rpm adjustable | |
Heating temperature | ≤500℃ | |
Temperature control accuracy | ±1℃ PID temperature control | |
Plasma sputtering source | Quantity | 2 inchesx1/2/3 |
Cooling method | Water cooling/Natural cooling | |
Vacuum chamber | Chamber size | φ180mm x 210mm |
Observation window | Omnidirectional visibility | |
Chamber material | High purity quartz | |
Open method | Top cover removable | |
Upper and lower cover material | 304 stainless steel | |
Pumping port | KF16 | |
Intake port | 1/4 inch ferrule connector | |
Power configuration | Quantity | DC power supplyx1 |
Output power | Max. 150W | |
Sputtering power | 1200V | |
Max. sputtering current | 50mA | |
Vacuum system | Vacuum pump type | Dual-stage rotary vane vacuum pump |
Pumping port | KF16 | |
Exhaust interface | KF16 | |
Pumping rate | 1.1L/s（4m3/h） | |
Ultimate vacuum | ≥0.1Pa | |
Vacuum measurement | Resistance vacuum gauge | |
Others | Power supply | AC 220V 50Hz |
Total power | 1.5kW/2kW | |
Dimension | 500mm x 320mm x470mm | |
Weight | 30kg | |
