You are here: Home / Products / Plasma Sputter Coater / Three Target Plasma Sputtering Coater Machine with Quartz Glass Chamber for Au And Pt

Three Target Plasma Sputtering Coater Machine with Quartz Glass Chamber for Au And Pt

This type of small plasma sputtering coating machine adopts two-stage sputtering method, which is widely used for SEM sample preparation or metal coating experiment. Using low-temperature plasma sputtering process, there is no high temperature during the coating process
Availability:
Quantity:
facebook sharing button
twitter sharing button
line sharing button
wechat sharing button
linkedin sharing button
pinterest sharing button
whatsapp sharing button
sharethis sharing button
  • TN-PSP180G-3TA-R

  • TN

ering technology, it provides a precise and uniform coating on various materials. The machine is equipped with a quartz glass chamber, ensuring high visibility during the coating process.


With its compact design, this plasma sputtering coater machine is suitable for small-scale laboratory applications. It offers the capability to coat samples with both gold (Au) and platinum (Pt) materials, making it versatile for a range of research needs.


The two-stage sputtering method employed by this machine guarantees excellent film adhesion and uniformity, resulting in high-quality coatings. It is an ideal choice for SEM sample preparation, allowing researchers to achieve accurate and reliable results.


Additionally, the low-temperature plasma sputtering technology used by this coater machine minimizes the risk of sample damage or distortion, ensuring the integrity of the specimens.


Invest in this three target plasma sputtering coater machine with a quartz glass chamber for Au and Pt coatings, and elevate your research capabilities with its precise and efficient performance.

Technical parameters:

Product model

TN-PSP180G-3TA-R

Sample   stage

Size

100mm  

Distance   from sample stage to target surface

20~35mm   height adjustable

Rotating   speed

1~20rpm   adjustable

Heating   temperature

≤500℃

Temperature   control accuracy

±1℃ PID   temperature control

Plasma   sputtering source

Quantity

2   inchesx1/2/3

Cooling   method

Water   cooling/Natural cooling

Vacuum   chamber

Chamber   size

φ180mm x   210mm    

Observation   window

Omnidirectional   visibility

Chamber   material

High   purity quartz

Open   method

Top   cover removable

Upper   and lower cover material

304   stainless steel

Pumping   port

KF16

Intake   port

1/4   inch ferrule connector

Power   configuration

Quantity

DC   power supplyx1

Output   power

Max.   150W

Sputtering   power

1200V

Max.   sputtering current

50mA

Vacuum   system

Vacuum   pump type

Dual-stage   rotary vane vacuum pump

Pumping   port

KF16

Exhaust   interface

KF16

Pumping   rate

1.1L/s(4m3/h)

Ultimate   vacuum

≥0.1Pa

Vacuum   measurement

Resistance   vacuum gauge

Others

Power   supply

AC   220V  50Hz

Total   power

1.5kW/2kW

Dimension

500mm   x 320mm x470mm

Weight

30kg



Previous: 
Next: 
PRODUCT INQUIRE
Zhengzhou Tainuo Thin Film Materials Co., Ltd.
Which is a manufacturer specializing in the production of laboratory scientific instruments. Our products are widely used in colleges, research institutions and laboratories.

QUICK LINKS

PRODUCTS CATEGORY

CONTACT US

 +86-371-5536-5392 
 +86-185-3800-8121
 Room 401, 4th Floor, Building 5, Zhengzhou Yida Technology New City, Jinzhan Street, High-tech Zone, Zhengzhou City
Copyright ©2023 Zhengzhou Tainuo Thin Film Materials Co., Ltd. | Support By leadong.com