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Desktop Mini Vacuum Plasma Sputter Coater with Quartz Glass Chamber for Coating Conductive Gold Film To SEM Sample

This type of small plasma sputtering coating machine adopts two-stage sputtering method, which is widely used for SEM sample preparation or metal coating experiment. Using low-temperature plasma sputtering process, there is no high temperature during the coating process
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  • TN-PSP180G-2TA-RSH

  • TN

ering technology, it ensures a uniform and high-quality coating of conductive gold film on various substrates. The desktop mini vacuum plasma sputter coater is equipped with a quartz glass chamber, providing excellent visibility and durability. Its compact size and user-friendly design make it suitable for laboratory use or small-scale production.


With the two-stage sputtering method, this machine offers precise control over the coating process, ensuring consistent and reproducible results. The low-temperature plasma sputtering technology enables the deposition of thin films without damaging sensitive samples. This makes it an ideal choice for SEM sample preparation, where a conductive coating is required for imaging and analysis.


The desktop mini vacuum plasma sputter coater is designed to deliver reliable performance and ease of use. It features a user-friendly interface with intuitive controls, allowing for easy operation and parameter adjustment. The quartz glass chamber not only provides excellent visibility during the coating process but also offers exceptional resistance to chemical corrosion and thermal shock.


This sputter coater is compatible with a wide range of substrates, including glass, metal, ceramic, and semiconductor materials. It allows for the deposition of conductive gold films with adjustable thickness, meeting the specific requirements of different applications. The uniform coating achieved by this machine ensures accurate and reliable results in various research fields, such as materials science, nanotechnology, and surface analysis.


In conclusion, the desktop mini vacuum plasma sputter coater with quartz glass chamber is a professional-grade instrument suitable for coating conductive gold films. Its two-stage sputtering method, low-temperature plasma sputtering technology, and user-friendly design make it an excellent choice for SEM sample preparation or metal coating experiments. With its compact size and reliable performance, it is an essential tool for researchers and scientists in various industries.

Technical parameters:

Product model

TN-PSP180G-2TA-RSH

Sample   stage

Size

100mm  

Distance   from sample stage to target surface

20~35mm   height adjustable

Rotating   speed

1~20rpm   adjustable

Heating   temperature

≤500℃

Temperature   control accuracy

±1℃ PID   temperature control

Plasma   sputtering source

Quantity

2   inchesx1/2/3

Cooling   method

Water   cooling/Natural cooling

Vacuum   chamber

Chamber   size

φ180mm x   210mm    

Observation   window

Omnidirectional   visibility

Chamber   material

High   purity quartz

Open   method

Top   cover removable

Upper   and lower cover material

304   stainless steel

Pumping   port

KF16

Intake   port

1/4   inch ferrule connector

Power   configuration

Quantity

DC   power supplyx1

Output   power

Max.   150W

Sputtering   power

1200V

Max.   sputtering current

50mA

Vacuum   system

Vacuum   pump type

Dual-stage   rotary vane vacuum pump

Pumping   port

KF16

Exhaust   interface

KF16

Pumping   rate

1.1L/s(4m3/h)

Ultimate   vacuum

≥0.1Pa

Vacuum   measurement

Resistance   vacuum gauge

Others

Power   supply

AC   220V  50Hz

Total   power

1.5kW/2kW

Dimension

500mm   x 320mm x470mm

Weight

30kg



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Zhengzhou Tainuo Thin Film Materials Co., Ltd.
Which is a manufacturer specializing in the production of laboratory scientific instruments. Our products are widely used in colleges, research institutions and laboratories.

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