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TN-PSP180G-2TA-RSH
TN
ering technology, it ensures a uniform and high-quality coating of conductive gold film on various substrates. The desktop mini vacuum plasma sputter coater is equipped with a quartz glass chamber, providing excellent visibility and durability. Its compact size and user-friendly design make it suitable for laboratory use or small-scale production.
With the two-stage sputtering method, this machine offers precise control over the coating process, ensuring consistent and reproducible results. The low-temperature plasma sputtering technology enables the deposition of thin films without damaging sensitive samples. This makes it an ideal choice for SEM sample preparation, where a conductive coating is required for imaging and analysis.
The desktop mini vacuum plasma sputter coater is designed to deliver reliable performance and ease of use. It features a user-friendly interface with intuitive controls, allowing for easy operation and parameter adjustment. The quartz glass chamber not only provides excellent visibility during the coating process but also offers exceptional resistance to chemical corrosion and thermal shock.
This sputter coater is compatible with a wide range of substrates, including glass, metal, ceramic, and semiconductor materials. It allows for the deposition of conductive gold films with adjustable thickness, meeting the specific requirements of different applications. The uniform coating achieved by this machine ensures accurate and reliable results in various research fields, such as materials science, nanotechnology, and surface analysis.
In conclusion, the desktop mini vacuum plasma sputter coater with quartz glass chamber is a professional-grade instrument suitable for coating conductive gold films. Its two-stage sputtering method, low-temperature plasma sputtering technology, and user-friendly design make it an excellent choice for SEM sample preparation or metal coating experiments. With its compact size and reliable performance, it is an essential tool for researchers and scientists in various industries.
Technical parameters:
Product model | TN-PSP180G-2TA-RSH | |
Sample stage | Size | 100mm |
Distance from sample stage to target surface | 20~35mm height adjustable | |
Rotating speed | 1~20rpm adjustable | |
Heating temperature | ≤500℃ | |
Temperature control accuracy | ±1℃ PID temperature control | |
Plasma sputtering source | Quantity | 2 inchesx1/2/3 |
Cooling method | Water cooling/Natural cooling | |
Vacuum chamber | Chamber size | φ180mm x 210mm |
Observation window | Omnidirectional visibility | |
Chamber material | High purity quartz | |
Open method | Top cover removable | |
Upper and lower cover material | 304 stainless steel | |
Pumping port | KF16 | |
Intake port | 1/4 inch ferrule connector | |
Power configuration | Quantity | DC power supplyx1 |
Output power | Max. 150W | |
Sputtering power | 1200V | |
Max. sputtering current | 50mA | |
Vacuum system | Vacuum pump type | Dual-stage rotary vane vacuum pump |
Pumping port | KF16 | |
Exhaust interface | KF16 | |
Pumping rate | 1.1L/s(4m3/h) | |
Ultimate vacuum | ≥0.1Pa | |
Vacuum measurement | Resistance vacuum gauge | |
Others | Power supply | AC 220V 50Hz |
Total power | 1.5kW/2kW | |
Dimension | 500mm x 320mm x470mm | |
Weight | 30kg |
ering technology, it ensures a uniform and high-quality coating of conductive gold film on various substrates. The desktop mini vacuum plasma sputter coater is equipped with a quartz glass chamber, providing excellent visibility and durability. Its compact size and user-friendly design make it suitable for laboratory use or small-scale production.
With the two-stage sputtering method, this machine offers precise control over the coating process, ensuring consistent and reproducible results. The low-temperature plasma sputtering technology enables the deposition of thin films without damaging sensitive samples. This makes it an ideal choice for SEM sample preparation, where a conductive coating is required for imaging and analysis.
The desktop mini vacuum plasma sputter coater is designed to deliver reliable performance and ease of use. It features a user-friendly interface with intuitive controls, allowing for easy operation and parameter adjustment. The quartz glass chamber not only provides excellent visibility during the coating process but also offers exceptional resistance to chemical corrosion and thermal shock.
This sputter coater is compatible with a wide range of substrates, including glass, metal, ceramic, and semiconductor materials. It allows for the deposition of conductive gold films with adjustable thickness, meeting the specific requirements of different applications. The uniform coating achieved by this machine ensures accurate and reliable results in various research fields, such as materials science, nanotechnology, and surface analysis.
In conclusion, the desktop mini vacuum plasma sputter coater with quartz glass chamber is a professional-grade instrument suitable for coating conductive gold films. Its two-stage sputtering method, low-temperature plasma sputtering technology, and user-friendly design make it an excellent choice for SEM sample preparation or metal coating experiments. With its compact size and reliable performance, it is an essential tool for researchers and scientists in various industries.
Technical parameters:
Product model | TN-PSP180G-2TA-RSH | |
Sample stage | Size | 100mm |
Distance from sample stage to target surface | 20~35mm height adjustable | |
Rotating speed | 1~20rpm adjustable | |
Heating temperature | ≤500℃ | |
Temperature control accuracy | ±1℃ PID temperature control | |
Plasma sputtering source | Quantity | 2 inchesx1/2/3 |
Cooling method | Water cooling/Natural cooling | |
Vacuum chamber | Chamber size | φ180mm x 210mm |
Observation window | Omnidirectional visibility | |
Chamber material | High purity quartz | |
Open method | Top cover removable | |
Upper and lower cover material | 304 stainless steel | |
Pumping port | KF16 | |
Intake port | 1/4 inch ferrule connector | |
Power configuration | Quantity | DC power supplyx1 |
Output power | Max. 150W | |
Sputtering power | 1200V | |
Max. sputtering current | 50mA | |
Vacuum system | Vacuum pump type | Dual-stage rotary vane vacuum pump |
Pumping port | KF16 | |
Exhaust interface | KF16 | |
Pumping rate | 1.1L/s(4m3/h) | |
Ultimate vacuum | ≥0.1Pa | |
Vacuum measurement | Resistance vacuum gauge | |
Others | Power supply | AC 220V 50Hz |
Total power | 1.5kW/2kW | |
Dimension | 500mm x 320mm x470mm | |
Weight | 30kg |