| Quantity: | |
|---|---|
TN-PSP180G-2TA-RS
TN
ering technology, it provides precise and uniform coating of Au, Ag, and Cu on various substrates. The rotary heating stage ensures even heating and allows for the deposition of thin films with excellent adhesion. The water chiller maintains a stable temperature during the coating process, ensuring optimal performance and preventing overheating.
With its compact design and user-friendly interface, this small plasma sputtering coater is perfect for research laboratories, universities, and industrial applications. It offers a wide range of coating options, allowing users to achieve desired thickness and composition for their specific requirements. The two-stage sputtering method enhances the coating efficiency and reduces the deposition time, making it a highly efficient and time-saving solution.
Equipped with advanced safety features, including overheat protection and automatic shutdown, this coater ensures a safe working environment. The professional-grade construction and high-quality materials guarantee long-lasting performance and durability.
Whether you need to prepare SEM samples or conduct metal coating experiments, this small plasma sputtering coater with a rotary heating stage and water chiller is the ideal choice. Its precise coating capabilities, efficient operation, and user-friendly design make it an essential tool for any laboratory or research facility. Invest in this reliable and versatile coater to enhance your scientific research and achieve superior coating results.
Technical parameters:
Product model | TN-PSP180G-2TA-RS | |
Sample stage | Size | 100mm |
Distance from sample stage to target surface | 20~35mm height adjustable | |
Rotating speed | 1~20rpm adjustable | |
Heating temperature | ≤500℃ | |
Temperature control accuracy | ±1℃ PID temperature control | |
Plasma sputtering source | Quantity | 2 inchesx1/2/3 |
Cooling method | Water cooling/Natural cooling | |
Vacuum chamber | Chamber size | φ180mm x 210mm |
Observation window | Omnidirectional visibility | |
Chamber material | High purity quartz | |
Open method | Top cover removable | |
Upper and lower cover material | 304 stainless steel | |
Pumping port | KF16 | |
Intake port | 1/4 inch ferrule connector | |
Power configuration | Quantity | DC power supplyx1 |
Output power | Max. 150W | |
Sputtering power | 1200V | |
Max. sputtering current | 50mA | |
Vacuum system | Vacuum pump type | Dual-stage rotary vane vacuum pump |
Pumping port | KF16 | |
Exhaust interface | KF16 | |
Pumping rate | 1.1L/s（4m3/h） | |
Ultimate vacuum | ≥0.1Pa | |
Vacuum measurement | Resistance vacuum gauge | |
Others | Power supply | AC 220V 50Hz |
Total power | 1.5kW/2kW | |
Dimension | 500mm x 320mm x470mm | |
Weight | 30kg | |
ering technology, it provides precise and uniform coating of Au, Ag, and Cu on various substrates. The rotary heating stage ensures even heating and allows for the deposition of thin films with excellent adhesion. The water chiller maintains a stable temperature during the coating process, ensuring optimal performance and preventing overheating.
With its compact design and user-friendly interface, this small plasma sputtering coater is perfect for research laboratories, universities, and industrial applications. It offers a wide range of coating options, allowing users to achieve desired thickness and composition for their specific requirements. The two-stage sputtering method enhances the coating efficiency and reduces the deposition time, making it a highly efficient and time-saving solution.
Equipped with advanced safety features, including overheat protection and automatic shutdown, this coater ensures a safe working environment. The professional-grade construction and high-quality materials guarantee long-lasting performance and durability.
Whether you need to prepare SEM samples or conduct metal coating experiments, this small plasma sputtering coater with a rotary heating stage and water chiller is the ideal choice. Its precise coating capabilities, efficient operation, and user-friendly design make it an essential tool for any laboratory or research facility. Invest in this reliable and versatile coater to enhance your scientific research and achieve superior coating results.
Technical parameters:
Product model | TN-PSP180G-2TA-RS | |
Sample stage | Size | 100mm |
Distance from sample stage to target surface | 20~35mm height adjustable | |
Rotating speed | 1~20rpm adjustable | |
Heating temperature | ≤500℃ | |
Temperature control accuracy | ±1℃ PID temperature control | |
Plasma sputtering source | Quantity | 2 inchesx1/2/3 |
Cooling method | Water cooling/Natural cooling | |
Vacuum chamber | Chamber size | φ180mm x 210mm |
Observation window | Omnidirectional visibility | |
Chamber material | High purity quartz | |
Open method | Top cover removable | |
Upper and lower cover material | 304 stainless steel | |
Pumping port | KF16 | |
Intake port | 1/4 inch ferrule connector | |
Power configuration | Quantity | DC power supplyx1 |
Output power | Max. 150W | |
Sputtering power | 1200V | |
Max. sputtering current | 50mA | |
Vacuum system | Vacuum pump type | Dual-stage rotary vane vacuum pump |
Pumping port | KF16 | |
Exhaust interface | KF16 | |
Pumping rate | 1.1L/s（4m3/h） | |
Ultimate vacuum | ≥0.1Pa | |
Vacuum measurement | Resistance vacuum gauge | |
Others | Power supply | AC 220V 50Hz |
Total power | 1.5kW/2kW | |
Dimension | 500mm x 320mm x470mm | |
Weight | 30kg | |
