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TN-PSP180G-1TA-RSH
TN
Mini Plasma Sputter Coater is able to coat conductive gold film onto various substrates, such as metals, ceramics, and glass. The mini plasma sputter coater is equipped with a quartz glass chamber, ensuring high transparency and excellent visibility during the coating process.
This professional-grade equipment is specifically designed for researchers, scientists, and professionals in the field of materials science, nanotechnology, and surface analysis. Its compact size and user-friendly interface make it suitable for both laboratory and industrial settings.
The two-stage sputtering method employed by this machine ensures uniform and precise coating thickness, resulting in high-quality samples for SEM analysis or metal coating experiments. The low-temperature plasma sputtering process guarantees minimal damage to delicate or heat-sensitive samples, preserving their integrity and accuracy.
With its advanced features and reliable performance, this mini plasma sputter coater is an essential tool for any research or production facility requiring precise and efficient coating of conductive gold film. Invest in this equipment to enhance your research capabilities and achieve superior results in your experiments.
Technical parameters:
Product model | TN-PSP180G-1TA-RSH | |
Sample stage | Size | 100mm |
Distance from sample stage to target surface | 20~35mm height adjustable | |
Rotating speed | 1~20rpm adjustable | |
Heating temperature | ≤500℃ | |
Temperature control accuracy | ±1℃ PID temperature control | |
Plasma sputtering source | Quantity | 2 inchesx1/2/3 |
Cooling method | Water cooling/Natural cooling | |
Vacuum chamber | Chamber size | φ180mm x 210mm |
Observation window | Omnidirectional visibility | |
Chamber material | High purity quartz | |
Open method | Top cover removable | |
Upper and lower cover material | 304 stainless steel | |
Pumping port | KF16 | |
Intake port | 1/4 inch ferrule connector | |
Power configuration | Quantity | DC power supplyx1 |
Output power | Max. 150W | |
Sputtering power | 1200V | |
Max. sputtering current | 50mA | |
Vacuum system | Vacuum pump type | Dual-stage rotary vane vacuum pump |
Pumping port | KF16 | |
Exhaust interface | KF16 | |
Pumping rate | 1.1L/s（4m3/h） | |
Ultimate vacuum | ≥0.1Pa | |
Vacuum measurement | Resistance vacuum gauge | |
Others | Power supply | AC 220V 50Hz |
Total power | 1.5kW/2kW | |
Dimension | 500mm x 320mm x470mm | |
Weight | 30kg | |
Mini Plasma Sputter Coater is able to coat conductive gold film onto various substrates, such as metals, ceramics, and glass. The mini plasma sputter coater is equipped with a quartz glass chamber, ensuring high transparency and excellent visibility during the coating process.
This professional-grade equipment is specifically designed for researchers, scientists, and professionals in the field of materials science, nanotechnology, and surface analysis. Its compact size and user-friendly interface make it suitable for both laboratory and industrial settings.
The two-stage sputtering method employed by this machine ensures uniform and precise coating thickness, resulting in high-quality samples for SEM analysis or metal coating experiments. The low-temperature plasma sputtering process guarantees minimal damage to delicate or heat-sensitive samples, preserving their integrity and accuracy.
With its advanced features and reliable performance, this mini plasma sputter coater is an essential tool for any research or production facility requiring precise and efficient coating of conductive gold film. Invest in this equipment to enhance your research capabilities and achieve superior results in your experiments.
Technical parameters:
Product model | TN-PSP180G-1TA-RSH | |
Sample stage | Size | 100mm |
Distance from sample stage to target surface | 20~35mm height adjustable | |
Rotating speed | 1~20rpm adjustable | |
Heating temperature | ≤500℃ | |
Temperature control accuracy | ±1℃ PID temperature control | |
Plasma sputtering source | Quantity | 2 inchesx1/2/3 |
Cooling method | Water cooling/Natural cooling | |
Vacuum chamber | Chamber size | φ180mm x 210mm |
Observation window | Omnidirectional visibility | |
Chamber material | High purity quartz | |
Open method | Top cover removable | |
Upper and lower cover material | 304 stainless steel | |
Pumping port | KF16 | |
Intake port | 1/4 inch ferrule connector | |
Power configuration | Quantity | DC power supplyx1 |
Output power | Max. 150W | |
Sputtering power | 1200V | |
Max. sputtering current | 50mA | |
Vacuum system | Vacuum pump type | Dual-stage rotary vane vacuum pump |
Pumping port | KF16 | |
Exhaust interface | KF16 | |
Pumping rate | 1.1L/s（4m3/h） | |
Ultimate vacuum | ≥0.1Pa | |
Vacuum measurement | Resistance vacuum gauge | |
Others | Power supply | AC 220V 50Hz |
Total power | 1.5kW/2kW | |
Dimension | 500mm x 320mm x470mm | |
Weight | 30kg | |
