Availability: | |
---|---|
Quantity: | |
TN-PSP180G-1TA-RS
TN
ering technology, it provides a precise and uniform gold coating on various samples. The compact design of this coater makes it ideal for limited laboratory space.
With its quartz cavity, this mini plasma sputtering coater ensures high purity and stability during the coating process. The quartz material offers excellent resistance to heat and corrosion, ensuring long-lasting performance.
Equipped with a two-stage sputtering method, this coater allows for better control over the coating thickness and uniformity. It is suitable for SEM sample preparation, enabling researchers to achieve optimal imaging results. Additionally, it is also perfect for metal coating experiments, providing a reliable and efficient solution.
The low-temperature plasma sputtering technology utilized in this coater ensures minimal damage to delicate samples. It offers a gentle yet effective coating process, preserving the integrity of the samples while achieving a high-quality gold coating.
This compact mini plasma sputtering coater is designed with convenience in mind. It features user-friendly controls and a simple operation interface, making it easy for users to set and adjust the coating parameters. Its compact size allows for easy installation and mobility within the laboratory.
In summary, the Compact Mini Plasma Sputtering Coater with Quartz Cavity for Gold is a professional-grade machine that offers precise and uniform gold coating for SEM sample preparation and metal coating experiments. Its two-stage sputtering method, low-temperature plasma technology, and quartz cavity ensure high-quality results and long-lasting performance. With its compact design and user-friendly controls, it is a versatile and convenient tool for laboratories with limited space.
Technical parameters:
Product model | TN-PSP180G-1TA-RS | |
Sample stage | Size | 100mm |
Distance from sample stage to target surface | 20~35mm height adjustable | |
Rotating speed | 1~20rpm adjustable | |
Heating temperature | ≤500℃ | |
Temperature control accuracy | ±1℃ PID temperature control | |
Plasma sputtering source | Quantity | 2 inchesx1/2/3 |
Cooling method | Water cooling/Natural cooling | |
Vacuum chamber | Chamber size | φ180mm x 210mm |
Observation window | Omnidirectional visibility | |
Chamber material | High purity quartz | |
Open method | Top cover removable | |
Upper and lower cover material | 304 stainless steel | |
Pumping port | KF16 | |
Intake port | 1/4 inch ferrule connector | |
Power configuration | Quantity | DC power supplyx1 |
Output power | Max. 150W | |
Sputtering power | 1200V | |
Max. sputtering current | 50mA | |
Vacuum system | Vacuum pump type | Dual-stage rotary vane vacuum pump |
Pumping port | KF16 | |
Exhaust interface | KF16 | |
Pumping rate | 1.1L/s(4m3/h) | |
Ultimate vacuum | ≥0.1Pa | |
Vacuum measurement | Resistance vacuum gauge | |
Others | Power supply | AC 220V 50Hz |
Total power | 1.5kW/2kW | |
Dimension | 500mm x 320mm x470mm | |
Weight | 30kg |
ering technology, it provides a precise and uniform gold coating on various samples. The compact design of this coater makes it ideal for limited laboratory space.
With its quartz cavity, this mini plasma sputtering coater ensures high purity and stability during the coating process. The quartz material offers excellent resistance to heat and corrosion, ensuring long-lasting performance.
Equipped with a two-stage sputtering method, this coater allows for better control over the coating thickness and uniformity. It is suitable for SEM sample preparation, enabling researchers to achieve optimal imaging results. Additionally, it is also perfect for metal coating experiments, providing a reliable and efficient solution.
The low-temperature plasma sputtering technology utilized in this coater ensures minimal damage to delicate samples. It offers a gentle yet effective coating process, preserving the integrity of the samples while achieving a high-quality gold coating.
This compact mini plasma sputtering coater is designed with convenience in mind. It features user-friendly controls and a simple operation interface, making it easy for users to set and adjust the coating parameters. Its compact size allows for easy installation and mobility within the laboratory.
In summary, the Compact Mini Plasma Sputtering Coater with Quartz Cavity for Gold is a professional-grade machine that offers precise and uniform gold coating for SEM sample preparation and metal coating experiments. Its two-stage sputtering method, low-temperature plasma technology, and quartz cavity ensure high-quality results and long-lasting performance. With its compact design and user-friendly controls, it is a versatile and convenient tool for laboratories with limited space.
Technical parameters:
Product model | TN-PSP180G-1TA-RS | |
Sample stage | Size | 100mm |
Distance from sample stage to target surface | 20~35mm height adjustable | |
Rotating speed | 1~20rpm adjustable | |
Heating temperature | ≤500℃ | |
Temperature control accuracy | ±1℃ PID temperature control | |
Plasma sputtering source | Quantity | 2 inchesx1/2/3 |
Cooling method | Water cooling/Natural cooling | |
Vacuum chamber | Chamber size | φ180mm x 210mm |
Observation window | Omnidirectional visibility | |
Chamber material | High purity quartz | |
Open method | Top cover removable | |
Upper and lower cover material | 304 stainless steel | |
Pumping port | KF16 | |
Intake port | 1/4 inch ferrule connector | |
Power configuration | Quantity | DC power supplyx1 |
Output power | Max. 150W | |
Sputtering power | 1200V | |
Max. sputtering current | 50mA | |
Vacuum system | Vacuum pump type | Dual-stage rotary vane vacuum pump |
Pumping port | KF16 | |
Exhaust interface | KF16 | |
Pumping rate | 1.1L/s(4m3/h) | |
Ultimate vacuum | ≥0.1Pa | |
Vacuum measurement | Resistance vacuum gauge | |
Others | Power supply | AC 220V 50Hz |
Total power | 1.5kW/2kW | |
Dimension | 500mm x 320mm x470mm | |
Weight | 30kg |