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Compact Mini Plasma Sputtering Coater with Quartz Cavity for Gold

This type of small plasma sputtering coating machine adopts two-stage sputtering method, which is widely used for SEM sample preparation or metal coating experiment. Using low-temperature plasma sputtering process, there is no high temperature during the coating process
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  • TN-PSP180G-1TA-RS

  • TN

ering technology, it provides a precise and uniform gold coating on various samples. The compact design of this coater makes it ideal for limited laboratory space.


With its quartz cavity, this mini plasma sputtering coater ensures high purity and stability during the coating process. The quartz material offers excellent resistance to heat and corrosion, ensuring long-lasting performance.


Equipped with a two-stage sputtering method, this coater allows for better control over the coating thickness and uniformity. It is suitable for SEM sample preparation, enabling researchers to achieve optimal imaging results. Additionally, it is also perfect for metal coating experiments, providing a reliable and efficient solution.


The low-temperature plasma sputtering technology utilized in this coater ensures minimal damage to delicate samples. It offers a gentle yet effective coating process, preserving the integrity of the samples while achieving a high-quality gold coating.


This compact mini plasma sputtering coater is designed with convenience in mind. It features user-friendly controls and a simple operation interface, making it easy for users to set and adjust the coating parameters. Its compact size allows for easy installation and mobility within the laboratory.


In summary, the Compact Mini Plasma Sputtering Coater with Quartz Cavity for Gold is a professional-grade machine that offers precise and uniform gold coating for SEM sample preparation and metal coating experiments. Its two-stage sputtering method, low-temperature plasma technology, and quartz cavity ensure high-quality results and long-lasting performance. With its compact design and user-friendly controls, it is a versatile and convenient tool for laboratories with limited space.

Technical parameters:

Product model

TN-PSP180G-1TA-RS

Sample   stage

Size

100mm  

Distance   from sample stage to target surface

20~35mm   height adjustable

Rotating   speed

1~20rpm   adjustable

Heating   temperature

≤500℃

Temperature   control accuracy

±1℃ PID   temperature control

Plasma   sputtering source

Quantity

2   inchesx1/2/3

Cooling   method

Water   cooling/Natural cooling

Vacuum   chamber

Chamber   size

φ180mm x   210mm    

Observation   window

Omnidirectional   visibility

Chamber   material

High   purity quartz

Open   method

Top   cover removable

Upper   and lower cover material

304   stainless steel

Pumping   port

KF16

Intake   port

1/4   inch ferrule connector

Power   configuration

Quantity

DC   power supplyx1

Output   power

Max.   150W

Sputtering   power

1200V

Max.   sputtering current

50mA

Vacuum   system

Vacuum   pump type

Dual-stage   rotary vane vacuum pump

Pumping   port

KF16

Exhaust   interface

KF16

Pumping   rate

1.1L/s(4m3/h)

Ultimate   vacuum

≥0.1Pa

Vacuum   measurement

Resistance   vacuum gauge

Others

Power   supply

AC   220V  50Hz

Total   power

1.5kW/2kW

Dimension

500mm   x 320mm x470mm

Weight

30kg



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