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TN-PSP180G-2TA-R
TN
double target plasma sputter coater is able to provide high-quality gold, platinum, indium, and silver coatings on various substrates.
The Double Target Plasma Sputter Coater is designed to meet the demanding requirements of SEM sample preparation and metal coating experiments. With its advanced technology and precise control, this coater ensures consistent and uniform coatings, allowing for accurate analysis and observation under the scanning electron microscope.
Equipped with a vacuum pump, this coater creates a low-pressure environment necessary for the plasma sputtering process. The double target configuration allows for simultaneous coating with different materials, increasing productivity and versatility. Whether you need gold, platinum, indium, or silver coatings, this coater delivers exceptional results.
The low-temperature plasma sputtering process used by this coater offers several advantages. It minimizes the risk of thermal damage to delicate samples, ensuring their integrity throughout the coating process. Additionally, the precise control of deposition parameters allows for fine-tuning of coating thickness, ensuring optimal results for your specific application.
With its professional-grade performance and user-friendly interface, the Double Target Plasma Sputter Coater is the ideal choice for researchers, scientists, and technicians in the field of material science, nanotechnology, and electronics. Its reliability, efficiency, and versatility make it an essential tool for any laboratory or research facility.
Invest in the Double Target Plasma Sputter Coater with Vacuum Pump for Gold, Platinum, Indium, and Silver Coatings, and elevate your sample preparation and metal coating experiments to new heights of precision and quality.
Technical parameters:
Product model | TN-PSP180G-2TA-R | |
Sample stage | Size | 100mm |
Distance from sample stage to target surface | 20~35mm height adjustable | |
Rotating speed | 1~20rpm adjustable | |
Heating temperature | ≤500℃ | |
Temperature control accuracy | ±1℃ PID temperature control | |
Plasma sputtering source | Quantity | 2 inchesx1/2/3 |
Cooling method | Water cooling/Natural cooling | |
Vacuum chamber | Chamber size | φ180mm x 210mm |
Observation window | Omnidirectional visibility | |
Chamber material | High purity quartz | |
Open method | Top cover removable | |
Upper and lower cover material | 304 stainless steel | |
Pumping port | KF16 | |
Intake port | 1/4 inch ferrule connector | |
Power configuration | Quantity | DC power supplyx1 |
Output power | Max. 150W | |
Sputtering power | 1200V | |
Max. sputtering current | 50mA | |
Vacuum system | Vacuum pump type | Dual-stage rotary vane vacuum pump |
Pumping port | KF16 | |
Exhaust interface | KF16 | |
Pumping rate | 1.1L/s(4m3/h) | |
Ultimate vacuum | ≥0.1Pa | |
Vacuum measurement | Resistance vacuum gauge | |
Others | Power supply | AC 220V 50Hz |
Total power | 1.5kW/2kW | |
Dimension | 500mm x 320mm x470mm | |
Weight | 30kg |
double target plasma sputter coater is able to provide high-quality gold, platinum, indium, and silver coatings on various substrates.
The Double Target Plasma Sputter Coater is designed to meet the demanding requirements of SEM sample preparation and metal coating experiments. With its advanced technology and precise control, this coater ensures consistent and uniform coatings, allowing for accurate analysis and observation under the scanning electron microscope.
Equipped with a vacuum pump, this coater creates a low-pressure environment necessary for the plasma sputtering process. The double target configuration allows for simultaneous coating with different materials, increasing productivity and versatility. Whether you need gold, platinum, indium, or silver coatings, this coater delivers exceptional results.
The low-temperature plasma sputtering process used by this coater offers several advantages. It minimizes the risk of thermal damage to delicate samples, ensuring their integrity throughout the coating process. Additionally, the precise control of deposition parameters allows for fine-tuning of coating thickness, ensuring optimal results for your specific application.
With its professional-grade performance and user-friendly interface, the Double Target Plasma Sputter Coater is the ideal choice for researchers, scientists, and technicians in the field of material science, nanotechnology, and electronics. Its reliability, efficiency, and versatility make it an essential tool for any laboratory or research facility.
Invest in the Double Target Plasma Sputter Coater with Vacuum Pump for Gold, Platinum, Indium, and Silver Coatings, and elevate your sample preparation and metal coating experiments to new heights of precision and quality.
Technical parameters:
Product model | TN-PSP180G-2TA-R | |
Sample stage | Size | 100mm |
Distance from sample stage to target surface | 20~35mm height adjustable | |
Rotating speed | 1~20rpm adjustable | |
Heating temperature | ≤500℃ | |
Temperature control accuracy | ±1℃ PID temperature control | |
Plasma sputtering source | Quantity | 2 inchesx1/2/3 |
Cooling method | Water cooling/Natural cooling | |
Vacuum chamber | Chamber size | φ180mm x 210mm |
Observation window | Omnidirectional visibility | |
Chamber material | High purity quartz | |
Open method | Top cover removable | |
Upper and lower cover material | 304 stainless steel | |
Pumping port | KF16 | |
Intake port | 1/4 inch ferrule connector | |
Power configuration | Quantity | DC power supplyx1 |
Output power | Max. 150W | |
Sputtering power | 1200V | |
Max. sputtering current | 50mA | |
Vacuum system | Vacuum pump type | Dual-stage rotary vane vacuum pump |
Pumping port | KF16 | |
Exhaust interface | KF16 | |
Pumping rate | 1.1L/s(4m3/h) | |
Ultimate vacuum | ≥0.1Pa | |
Vacuum measurement | Resistance vacuum gauge | |
Others | Power supply | AC 220V 50Hz |
Total power | 1.5kW/2kW | |
Dimension | 500mm x 320mm x470mm | |
Weight | 30kg |